Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 5/20 | 0.36 |
| ▸ | CA1 | P00915 | 4/20 | 0.34 |
| ▸ | MMP1 | P03956 | 2/20 | 0.34 |
| ▸ | MMP2 | P08253 | 2/20 | 0.34 |
| ▸ | MMP9 | P14780 | 2/20 | 0.34 |
| ▸ | MMP8 | P22894 | 2/20 | 0.34 |
| ▸ | MMP13 | P45452 | 2/20 | 0.34 |
| ▸ | F2 | P00734 | 2/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.31 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.31 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3436096 | 1.00 | CA2 (0.36) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3434749 | 0.95 | CA2 (0.39) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3433951 | 0.92 | CA2 (0.34) | CA2CA1MMP1MMP2MMP9 | |
| Lithium SCHEMBL30173171 | 0.92 | CA2 (0.37) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL2634598 | 0.89 | CA2 (0.37) | CA2CA1CA7CA13 | |
| SCHEMBL2610225 | 0.86 | CA2 (0.48) | CA2CA1MMP1MMP2MMP9 | |
| Lithium SCHEMBL30173170 | 0.86 | CA1 (0.35) | CA2CA1CA7CA13 | |
| SCHEMBL13219679 | 0.85 | CA2 (0.43) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL21405565 | 0.84 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL21405563 | 0.84 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120094235-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20080081292-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |