SCHEMBL3435218

SCHEMBL3435218

CC(F)(F)C1CC2CCC1C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.32
CNR2 P34972 2/20 0.31
CNR1 P21554 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14707479 0.84 CYP19A1 (0.31) CYP19A1CNR2
SCHEMBL131032 0.82 CYP19A1 (0.30) CYP19A1CNR2
SCHEMBL9908352 0.82 CYP19A1 (0.30) CYP19A1CNR2
SCHEMBL17070182 0.82 CYP19A1 (0.30) CYP19A1CNR2
SCHEMBL9908335 0.80
SCHEMBL4741902 0.80 CYP19A1 (0.33) CYP19A1
SCHEMBL19865846 0.80 CYP19A1 (0.33) CYP19A1
SCHEMBL17070171 0.79
SCHEMBL438933 0.79 CYP19A1 (0.35) CYP19A1
SCHEMBL18560088 0.79 CYP19A1 (0.35) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120094235-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-04-19 US disclosed
EP-1835343-A1 Positive resist composition and pattern formation method using the positive resist composition FUJIFILM Corporation (JP) 2007-09-19 EP disclosed