SCHEMBL9908352

SCHEMBL9908352

CC(C1CC2CCC1C2)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.30
CNR2 P34972 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908364 0.89
SCHEMBL17070182 0.83 CYP19A1 (0.30) CYP19A1CNR2
SCHEMBL3435218 0.82 CYP19A1 (0.32) CYP19A1CNR2
SCHEMBL9908335 0.81
SCHEMBL14707479 0.80 CYP19A1 (0.31) CYP19A1CNR2
SCHEMBL438933 0.79 CYP19A1 (0.35) CYP19A1
SCHEMBL17070171 0.79
SCHEMBL18560088 0.79 CYP19A1 (0.35) CYP19A1
SCHEMBL131032 0.78 CYP19A1 (0.30) CYP19A1CNR2
SCHEMBL19865846 0.77 CYP19A1 (0.33) CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed
US-7189493-B2 Polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-13 US disclosed