Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18560088 | 1.00 | CYP19A1 (0.35) | CYP19A1HSD11B1 | |
| SCHEMBL9908352 | 0.79 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL75233 | 0.79 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL17070182 | 0.79 | CYP19A1 (0.30) | CYP19A1 | |
| SCHEMBL14527514 | 0.79 | CYP19A1 (0.36) | CYP19A1 | |
| SCHEMBL9934752 | 0.79 | CYP19A1 (0.38) | CYP19A1HSD11B1 | |
| SCHEMBL5194124 | 0.79 | CYP19A1 (0.38) | CYP19A1HSD11B1 | |
| SCHEMBL3435218 | 0.79 | CYP19A1 (0.32) | CYP19A1 | |
| SCHEMBL5194757 | 0.79 | CYP19A1 (0.38) | CYP19A1HSD11B1 | |
| SCHEMBL9908335 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 342 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20110045387-A1 | Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| EP-2105794-A1 | Novel photoacid generator, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20090226843-A1 | MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-7550247-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-06-23 | — | — | US | disclosed |
| US-20080311514-A1 | SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKING METHODS, RESIST COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080311514-A1 | SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKING METHODS, RESIST COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080038664-A1 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080038664-A1 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-7265234-B2 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-04 | — | — | US | disclosed |
| US-7265234-B2 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080311514-A1 | SILSESQUIOXANE COMPOUND MIXTURE, HYDROLYZABLE SILANE COMPOUND, MAKING METHODS, RESIST COMPOSITION, PATTERNING PROCESS, AND SUBSTRATE PROCESSING | STS, LSS, SRMS | CYP19A1 134/4885HSD11B1 221/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | CYP19A1 4640/4885HSD11B1 2019/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.