Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.35 |
| ▸ | HMGCR | P04035 | 3/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.31 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131566 | 0.90 | CYP19A1 (0.42) | CYP19A1HMGCRFKBP1ASLCO1B1 | |
| SCHEMBL3435204 | 0.86 | EPHX1 (0.43) | CYP19A1HMGCREPHX1NAAAFKBP1A | |
| SCHEMBL18198986 | 0.84 | CHRM2 (0.34) | CYP19A1HMGCREPHX1NAAAFKBP1A | |
| SCHEMBL13201521 | 0.84 | CNR2 (0.36) | CYP19A1HMGCREPHX1NAAAFKBP1A | |
| SCHEMBL132134 | 0.83 | EPHX1 (0.47) | RAB9ACYP19A1HMGCREPHX1NAAA | |
| SCHEMBL18253368 | 0.81 | CYP2D6 (0.34) | RAB9ACYP19A1HMGCREPHX1NAAA | |
| SCHEMBL20388945 | 0.81 | EPHX1 (0.50) | RAB9ACYP19A1HMGCREPHX1NAAA | |
| SCHEMBL3434643 | 0.81 | EPHX1 (0.50) | RAB9ACYP19A1HMGCREPHX1NAAA | |
| SCHEMBL108478 | 0.81 | EPHX1 (0.50) | RAB9ACYP19A1HMGCREPHX1NAAA | |
| SCHEMBL131561 | 0.81 | EPHX1 (0.50) | RAB9ACYP19A1HMGCREPHX1NAAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11073763-B2 | Photoresist and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2021-07-27 | — | — | US | disclosed |
| US-20200133125-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2020-04-30 | — | — | US | disclosed |
| US-20190346766-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2019-11-14 | — | — | US | disclosed |
| US-10365561-B2 | Photoresist and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2019-07-30 | — | — | US | disclosed |
| US-20190041749-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2019-02-07 | — | — | US | disclosed |
| US-9551931-B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160004157-A1 | METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-07 | — | — | US | disclosed |
| US-20150160552-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-06-11 | — | — | US | disclosed |
| US-20150160552-A1 | Photoresist and Method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-06-11 | — | — | US | disclosed |
| US-20130015562-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130015562-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20120094235-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |