Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL737596 | 0.85 | ALDH1A1 (0.35) | DPP4 | |
| SCHEMBL12170588 | 0.85 | DPP4 (0.33) | DPP4 | |
| SCHEMBL28713506 | 0.85 | TSHR (0.31) | — | |
| SCHEMBL3452470 | 0.84 | — | — | |
| SCHEMBL76543 | 0.84 | DPP4 (0.38) | DPP4 | |
| SCHEMBL4108243 | 0.82 | TSHR (0.32) | — | |
| SCHEMBL4108442 | 0.81 | ALDH1A1 (0.30) | — | |
| SCHEMBL13799955 | 0.81 | TSHR (0.33) | — | |
| SCHEMBL18417857 | 0.81 | DPP8 (0.32) | DPP4 | |
| SCHEMBL1070898 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7820360-B2 | Polymer compound, negative resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-26 | — | — | US | disclosed |
| US-7820360-B2 | Polymer compound, negative resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-26 | — | — | US | disclosed |
| US-20090162785-A1 | POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |
| US-20090162785-A1 | POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-06-25 | — | — | US | disclosed |