Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.62 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.41 |
| ▸ | SCN1A | P35498 | 2/20 | 0.41 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.41 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | APEX1 | P27695 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | HTR1A | P08908 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | DRD3 | P35462 | 1/20 | 0.41 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.41 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21925341 | 0.95 | TSHR (0.66) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL868944 | 0.93 | TSHR (0.68) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL28346965 | 0.93 | TSHR (0.60) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL28432695 | 0.91 | TSHR (0.71) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL21714569 | 0.89 | TSHR (0.56) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL345460 | 0.89 | TSHR (0.56) | TSHRTHRBKMT2ASCN1ASCN2A | |
| SCHEMBL2830555 | 0.88 | TSHR (0.71) | TSHRTHRBCHRM2SCN1ASCN2A | |
| SCHEMBL346151 | 0.87 | TSHR (0.59) | TSHRTHRBKMT2ACHRM2SCN1A | |
| SCHEMBL1336680 | 0.86 | TSHR (0.80) | TSHRTHRBCHRM2SCN1ASCN2A | |
| SCHEMBL11223664 | 0.86 | TSHR (0.80) | TSHRTHRBCHRM2SCN1ASCN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0472204-B1 | Surface treated materials of excellent adhesion for painting layer, corrosion resistance after painting, and press formability, as well as a method of manufacturing them | KOBE STEEL LTD (JP) | 1996-04-24 | — | — | EP | claimed |
| JP-60028666-A | — | — | None | — | — | JP | disclosed |
| US-20200308327-A1 | Antistatic Material, Method for Manufacturing the Same, and Antistatic Method Using the Same | BORON LABORATORY CO., LTD. (JP) | 2020-10-01 | — | — | US | disclosed |
| US-20200171214-A1 | BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION | DREI LILIEN PVG GMBH & CO. KG (DE) | 2020-06-04 | — | — | US | disclosed |
| EP-3648806-A1 | BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION | Drei Lilien PVG GmbH & Co. KG (DE) | 2020-05-13 | — | — | EP | disclosed |
| US-8399579-B2 | Process for preparing an aqueous composite-particle dispersion | BASF SE (DE) | 2013-03-19 | — | — | US | disclosed |
| US-8268912-B2 | Process for preparing an aqueous composite-particle dispersion | BASF SE (DE) | 2012-09-18 | — | — | US | disclosed |
| US-8258234-B2 | Process for preparing an aqueous composite-particle dispersion | BASF SE (DE) | 2012-09-04 | — | — | US | disclosed |
| US-20120142838-A1 | METHOD FOR IMPROVING THE STORAGE STABILITY OF AQUEOUS COMPOSITE-PARTICLE DISPERSIONS | BASF SE (DE) | 2012-06-07 | — | — | US | disclosed |
| US-8142971-B2 | Electrostatic charge developer, electrostatic charge image developer cartridge, process cartridge, and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2012-03-27 | — | — | US | disclosed |
| US-6376703-B1 | STAINLESS STEEL CONTAINER | NIPPON SHOKUBAI CO., LTD. (JP) | 2002-04-23 | — | — | US | disclosed |
| EP-0735426-B1 | Radiation curable polymers and method of producing the same | DAINIPPON INK & CHEMICALS (JP) | 2000-10-11 | — | — | EP | disclosed |
| EP-0982290-A2 | Method for handling alkylamino (meth)acrylates | Nippon Shokubai Co., Ltd. (JP) | 2000-03-01 | — | — | EP | disclosed |
| US-5847022-A | Radiation curable resin composition and method therefor | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5770347-A | CONSISTS OF PHOTOPOLYMERIZABLE RESIN CONTAINING APROTIC ACRYLIC ESTER WITH AMMONIUM SALT, A PHOTOPOLYMERIZABLE INITIATOR, A THERMOSETTING COMPOUND SELECTED FROM AMINO RESIN, CYCLOCARBONATES, BLOCKED ISOCYANATES AND EPOXY RESINS | TAIYO INK MANUFACTURING CO., LTD. (JP) | 1998-06-23 | — | — | US | disclosed |
| EP-0735426-A1 | Radiation curable polymers and method of producing the same | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1996-10-02 | — | — | EP | disclosed |
| EP-0472204-B1 | Surface treated materials of excellent adhesion for painting layer, corrosion resistance after painting, and press formability, as well as a method of manufacturing them | KOBE STEEL LTD (JP) | 1996-04-24 | — | — | EP | disclosed |
| EP-0472204-A2 | Surface treated materials of excellent adhesion for painting layer, corrosion resistance after painting, and press formability, as well as a method of manufacturing them | KABUSHIKI KAISHA KOBE SEIKO SHO (JP) | 1992-02-26 | — | — | EP | disclosed |
| JP-S6028666-A | POSITIVELY CHARGEABLE ELECTROPHOTOGRAPHIC TONER | CANON INC | 1985-02-13 | — | — | JP | disclosed |
| US-4271230-A | HEAT AND AGING RESISTANCE | SUMITOMO NAUGATUCK CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |