Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.52 |
| ▸ | RAB9A | P51151 | 2/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | TP53 | P04637 | 1/20 | 0.52 |
| ▸ | PKM | P14618 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 6/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | GSK3B | P49841 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | ACACB | O00763 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylamine SCHEMBL20534296 | 0.96 | NPC1 (0.52) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL28927708 | 0.95 | MAPT (0.51) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL30670623 | 0.91 | MAPT (0.57) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL28110430 | 0.89 | MAPT (0.46) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL13892504 | 0.89 | SMN1; SMN2 (0.49) | NPC1RAB9ATP53L3MBTL1MAPT | |
| SCHEMBL23610466 | 0.89 | NPC1 (0.46) | NPC1RAB9AMAPK1TP53PKM | |
| Dimethylamine SCHEMBL28251025 | 0.86 | SMN1; SMN2 (0.49) | RAB9AL3MBTL1MAPTLMNASMN1; SMN2 | |
| SCHEMBL22721391 | 0.86 | GSK3B (0.56) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL11033548 | 0.85 | NPC1 (0.47) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL30419781 | 0.83 | NPC1 (0.58) | NPC1RAB9AMAPK1TP53PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024204175-A1 | MICROWELL FILM FOR BIOASSAY, METHOD FOR PRODUCING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MICROWELL FILM FOR BIOASSAY | 旭化成株式会社 | 2024-10-03 | — | — | WO | disclosed |
| WO-2024053471-A1 | PHOTOCURABLE COMPOSITION, FILM, LIGHT SENSOR, AND METHOD FOR PRODUCING LIGHT SENSOR | 富士フイルム株式会社 | 2024-03-14 | — | — | WO | disclosed |
| WO-2024024370-A1 | PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, AND COATED ARTICLE | 信越化学工業株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2023190161-A1 | POLYMERIZATION INITIATOR, POLYMERIZABLE COMPOSITION, CURED PRODUCT AND HYDROPEROXIDE HAVING THIOXANTHONE SKELETON | 日油株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023182245-A1 | LIQUID CRYSTAL DISPLAY ELEMENT SEALANT AND LIQUID CRYSTAL DISPLAY ELEMENT | 積水化学工業株式会社 | 2023-09-28 | — | — | WO | disclosed |
| WO-2023176778-A1 | CURABLE RESIN COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR COMPONENT | 積水化学工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| WO-2023054225-A1 | TRIAZINE PEROXIDE DERIVATIVE AND PRODUCTION METHOD THEREOF, POLYMERIZABLE COMPOSITION, AND CURED PRODUCT AND PRODUCTION METHOD THEREOF | 日油株式会社 | 2023-04-06 | — | — | WO | disclosed |
| WO-2022270357-A1 | PHOTOSENSITIVE COLORED RESIN COMPOSITION, CURED PRODUCT, COLOR FILTER AND DISPLAY DEVICE | 株式会社ＤＮＰファインケミカル | 2022-12-29 | — | — | WO | disclosed |
| CN-114685723-A | Resin composition and display device | 三星显示有限公司 | 2022-07-01 | — | — | CN | disclosed |
| WO-2022107692-A1 | SEALING MATERIAL FOR ORGANIC EL DISPLAY ELEMENT, CURED PRODUCT OF SAID SEALING MATERIAL, AND ORGANIC EL DISPLAY DEVICE | 三井化学株式会社 | 2022-05-27 | — | — | WO | disclosed |
| US-20170058134-A1 | ACTINIC RAY-CURABLE OFFSET INK COMPOSITION AND PRINTED ITEM OBTAINED THEREWITH | TOYO INK SC HOLDINGS CO., LTD. (JP) | 2017-03-02 | — | — | US | disclosed |
| CN-104039898-B | Curable liquids and inkjet inks for food packaging applications | 爱克发印艺公司 | 2016-07-06 | — | — | CN | disclosed |
| US-20150077481-A1 | ACTIVE ENERGY RAY-CURABLE INK, INK CARTRIDGE CONTAINING INK, IMAGE OR CURED PRODUCT FORMING METHOD, AND IMAGE OR CURED PRODUCT FORMING DEVICE | RICOH COMPANY, LTD. (JP) | 2015-03-19 | — | — | US | disclosed |
| US-8926084-B2 | Polymerizable ink composition, ink cartridge containing the same, and inkjet printer | RICOH COMPANY, LTD. (JP) | 2015-01-06 | — | — | US | disclosed |
| CN-103387765-B | Photosensitive composition for solder resist printing ink or photoresist | INSIGHT HIGH TECHNOLOGY BEIJING CO LTD | 2014-12-24 | — | — | CN | disclosed |
| US-20140139597-A1 | POLYMERIZABLE INK COMPOSITION, INK CARTRIDGE CONTAINING THE SAME, AND INKJET PRINTER | RICOH COMPANY, LTD. (JP) | 2014-05-22 | — | — | US | disclosed |
| CN-103387765-A | Photosensitive composition for solder resist printing ink or photoresist | BEIJING INSIGHT HIGH TECHNOLOGY CO LTD | 2013-11-13 | — | — | CN | disclosed |
| WO-2012121418-A2 | NANOIMPRINTING METHOD AND NANOIMPRINTING APPARATUS FOR EXECUTING THE NANOIMPRINTING METHOD | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | WO | disclosed |
| US-7820731-B2 | Curable monomer or oligomer such as acrylated epoxidized polyetheramide copolymer; a curable wax such as acrylated polyethylene wax; a colorant; photoinitiator; and gellant | XEROX CORPORATION (US) | 2010-10-26 | — | — | US | disclosed |
| US-20070142492-A1 | Curable monomer or oligomer such as acrylated epoxidized polyetheramide copolymer; a curable wax such as acrylated polyethylene wax; a colorant; photoinitiator; and gellant | XEROX CORPORATION (US) | 2007-06-21 | — | — | US | disclosed |