SCHEMBL3454889

SCHEMBL3454889

CCCCCCC(=O)OCC(F)(F)S(=O)(=O)O.Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
HSD17B3 P37058 6/20 0.40
PAM P19021 2/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
KMT2A Q03164 1/20 0.36
DGKA P23743 1/20 0.35
ELANE P08246 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3454657 0.86 ELANE (0.38) PAMKMT2AELANE
SCHEMBL18785845 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785848 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785735 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL11917862 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785847 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785732 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785733 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785736 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA
SCHEMBL18785850 0.80 DGKA (0.53) PAMMEN1ALDH1A1KMT2ADGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283102-B2 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-10-09 US disclosed
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION POLL, PARG, POLH HSD17B3 4121/4885PAM 65/4885MEN1 3950/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.