Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL6946786 | 0.87 | — | — | |
| Bromide SCHEMBL433673 | 0.87 | — | — | |
| Bromide SCHEMBL7937591 | 0.75 | — | — | |
| Bromide SCHEMBL8904552 | 0.75 | — | — | |
| Bromide SCHEMBL23326424 | 0.71 | — | — | |
| Bromide SCHEMBL3454710 | 0.71 | — | — | |
| Bromide SCHEMBL2144385 | 0.71 | — | — | |
| Bromide SCHEMBL11661793 | 0.71 | — | — | |
| Bromide SCHEMBL1524665 | 0.71 | — | — | |
| SCHEMBL458250 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1912720-B1 | PROCESS FOR REMOVING CARBON AND/OR PHOSPHORUS IMPURITIES FROM A SILICON PRODUCTION FACILITY | LORD LTD LP (US) | 2014-05-14 | — | — | EP | disclosed |
| US-7790129-B2 | Set of processes for removing impurities from a silcon production facility | LORD LTD., LP (US) | 2010-09-07 | — | — | US | disclosed |
| EP-1912720-A2 | A SET OF PROCESSES FOR REMOVING IMPURITIES FROM A SILICON PRODUCTION FACILITY | Lord, Stephen M. (US) | 2008-04-23 | — | — | EP | disclosed |
| US-20070098612-A1 | Set of processes for removing impurities from a silcon production facility | XSI INTERNATIONAL CORPORATION, A BRITISH VIRGIN ISLANDS COMPANY (VG) | 2007-05-03 | — | — | US | disclosed |
| WO-2007015721-A2 | A SET OF PROCESSES FOR REMOVING IMPURITIES FROM A SILICON PRODUCTION FACILITY | LORD STEPHEN M (US) | 2007-02-08 | — | — | WO | disclosed |