⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL346123 | 1.00 | — | — | |
| SCHEMBL9246390 | 0.87 | — | — | |
| SCHEMBL30509662 | 0.87 | — | — | |
| SCHEMBL31474654 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL31476313 | 0.87 | — | — | |
| SCHEMBL1470889 | 0.82 | — | — | |
| SCHEMBL8685824 | 0.82 | — | — | |
| SCHEMBL869255 | 0.82 | — | — | |
| SCHEMBL9278969 | 0.82 | — | — | |
| SCHEMBL23710 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250113517-A1 | EPITAXIAL REGIONS IN SEMICONDUCTOR DEVICES | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2025-04-03 | — | — | US | disclosed |
| CN-119421430-A | Method for forming semiconductor device | 台湾积体电路制造股份有限公司 | 2025-02-11 | — | — | CN | disclosed |
| CN-110729189-B | Semiconductor device and method for manufacturing the same | 中芯国际集成电路制造（天津）有限公司 | 2023-06-30 | — | — | CN | disclosed |
| US-8546873-B2 | Integrated circuit and method of fabrication thereof | GLOBALFOUNDRIES SINGAPORE PTE. LTD. (SG) | 2013-10-01 | — | — | US | disclosed |
| US-20120012940-A1 | INTEGRATED CIRCUIT AND METHOD OF FABRICATION THEREOF | GLOBALFOUNDRIES SINGAPORE PTE. LTD. (SG) | 2012-01-19 | — | — | US | disclosed |
| US-8058123-B2 | Integrated circuit and method of fabrication thereof | GLOBALFOUNDRIES SINGAPORE PTE. LTD. (SG) | 2011-11-15 | — | — | US | disclosed |
| US-20090140292-A1 | INTEGRATED CIRCUIT AND METHOD OF FABRICATION THEREOF | CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. (SG) | 2009-06-04 | — | — | US | disclosed |