Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | CTSK | P43235 | 4/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PRKCA | P17252 | 5/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2846730 | 0.90 | ALDH1A1 (0.39) | TSHRALDH1A1HSD17B10LMNAPRKCA | |
| SCHEMBL7087659 | 0.86 | ALDH1A1 (0.38) | TSHRALDH1A1HSD17B10LMNAPRKCA | |
| SCHEMBL1813100 | 0.86 | TSHR (0.47) | TSHRALDH1A1HSD17B10MEN1KMT2A | |
| SCHEMBL3462881 | 0.85 | ALDH1A1 (0.37) | TSHRALDH1A1HSD17B10LMNAPRKCA | |
| SCHEMBL17451609 | 0.85 | TSHR (0.44) | TSHRHSD17B10MEN1KMT2ACTSK | |
| SCHEMBL9838034 | 0.84 | EPHX1 (0.41) | TSHRALDH1A1HSD17B10LMNAPRKCA | |
| SCHEMBL1813102 | 0.84 | TSHR (0.46) | TSHRHSD17B10MEN1KMT2ACTSK | |
| SCHEMBL17123534 | 0.84 | TSHR (0.48) | TSHRALDH1A1HSD17B10LMNAMEN1 | |
| SCHEMBL24931680 | 0.83 | ALDH1A1 (0.35) | TSHRALDH1A1HSD17B10LMNAPRKCA | |
| SCHEMBL12263773 | 0.82 | TSHR (0.48) | TSHRHSD17B10MEN1KMT2ACTSK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11737345-B2 | Organic electronic material, ink composition containing same, and organic thin film, organic electronic element, organic electroluminescent element, lighting device, and display device formed therewith | RESONAC CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| US-20180145257-A1 | ORGANIC ELECTRONIC MATERIAL, INK COMPOSITION CONTAINING SAME, AND ORGANIC THIN FILM, ORGANIC ELECTRONIC ELEMENT, ORGANIC ELETROLUMINESCENT ELEMENT, LIGHTING DEVICE, AND DISPLAY DEVICE FORMED THEREWITH | RESONAC CORPORATION (JP) | 2018-05-24 | — | — | US | disclosed |
| US-9929346-B2 | Organic electronic material, ink composition containing same, and organic thin film, organic electronic element, organic electroluminescent element, lighting device, and display device formed therewith | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20170174807-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2017-06-22 | — | — | US | disclosed |
| WO-2017097401-A1 | POLYMERISABLE COMPOUNDS AND THE USE THEREOF IN LIQUID-CRYSTAL DISPLAYS | MERCK PATENT GMBH (DE) | 2017-06-15 | — | — | WO | disclosed |
| US-9638849-B2 | Liquid crystal compound, optical film, and method for producing optical film | FUJIFILM CORPORATION (JP) | 2017-05-02 | — | — | US | disclosed |
| US-9638849-B2 | Liquid crystal compound, optical film, and method for producing optical film | FUJIFILM CORPORATION (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20170088672-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2017-03-30 | — | — | US | disclosed |
| US-9605207-B2 | Orthoester derivative, liquid crystal composition and liquid crystal display device | JNC CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| US-20170044308-A1 | POLYMER OR OLIGOMER, HOLE TRANSPORT MATERIAL COMPOSITION, AND ORGANIC ELECTRONIC ELEMENT USING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-02-16 | — | — | US | disclosed |
| EP-2204388-A1 | PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS | Sumitomo Seika Chemicals CO. LTD. (JP) | 2010-07-07 | — | — | EP | disclosed |
| EP-1406956-B1 | SURFACE TREATMENT OF PLASTIC MATERIAL WITH AN ORGANIC POLYMERISABLE AND/OR CROSSLINKABLE COMPOSITION HAVING REACTIVE FUNCTIONS | RHODIA CHIMIE SA (FR) | 2008-03-26 | — | — | EP | disclosed |
| US-20070031759-A1 | Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor | NDSU RESEARCH FOUNDATION | 2007-02-08 | — | — | US | disclosed |
| US-20060014918-A1 | COMPOSITIONS FOR USE IN GOLF BALLS | ACUSHNET COMPANY (US) | 2006-01-19 | — | — | US | disclosed |
| US-4237250-A | Polyurethanes containing aryl sulfonic acid alkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-12-02 | — | — | US | disclosed |
| US-4211850-A | Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-07-08 | — | — | US | disclosed |
| US-4201852-A | Polyurethanes based on modified polyisocyanates containing sulphonic acid ester groups and process for the production thereof | BAYER AKTIENGESELLSCHAFT (DE) | 1980-05-06 | — | — | US | disclosed |
| US-4189562-A | Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| EP-0000722-A1 | Process for the preparation of polyurethanes containing arylsulfonic acid alkyl ester groups | BAYER AG (DE) | 1979-02-21 | — | — | EP | disclosed |
| EP-0000723-A1 | Polyhydroxy compounds containing urethane-aryl-sulfonic acid-hydroxyalkyl ester groups, process for their preparation and their use as reaction components for the preparation of polyurethane resins | BAYER AG (DE) | 1979-02-21 | — | — | EP | disclosed |