SCHEMBL3466974

SCHEMBL3466974

CCN(CC)CC.[CH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL124190 0.94
SCHEMBL1736341 0.94 ALDH1A1 (0.40)
SCHEMBL30 0.94
SCHEMBL1334883 0.89
Water SCHEMBL20920097 0.89 ALDH1A1 (0.36)
Methane SCHEMBL9112044 0.89
Hydrochloric Acid SCHEMBL5047658 0.89 ALDH1A1 (0.36)
Fluoride SCHEMBL22345959 0.89 ALDH1A1 (0.36)
Water SCHEMBL812317 0.89 ALDH1A1 (0.36)
Bromide SCHEMBL328981 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8598266-B2 Flocculation agents for nanoparticle pollutants EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2013-12-03 US claimed
WO-2012134432-A1 FLOCCULATION AGENTS FOR NANOPARTICLE POLLUTANTS EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2012-10-04 WO claimed
US-20120244052-A1 FLOCCULATION AGENTS FOR NANOPARTICLE POLLUTANTS CRESTLINE DIRECT FINANCE, L.P. 2012-09-27 US claimed
CN-1144527-A Process for preparing (1H-tetrazol-5-yl) tetrazolo [1,5-a] quinolines and naphthyridines MERRELL DOW PHARMA (US) 1997-03-05 CN claimed
EP-3579313-B1 USE OF A BINDER AGENT COMPOSITION FOR LITHIUM BATTERY, SLURRY COMPOSITION FOR LITHIUM BATTERIES COMPRISING THE BINDER COMPOSITION, AND ELECTRODE USING THE BINDER COMPOSITION FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2022-07-27 EP disclosed
US-11258066-B2 Binder agent composition for lithium battery FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2022-02-22 US disclosed
US-10913855-B2 Silicon-containing heterocyclic compound, and quencher FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2021-02-09 US disclosed
US-20200235396-A1 BINDER AGENT COMPOSITION FOR LITHIUM BATTERY FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-07-23 US disclosed
US-10696898-B2 Reverse photochromic compound FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-06-30 US disclosed
US-20190233651-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-08-01 US disclosed
EP-3476901-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER FUJIFILM Wako Pure Chemical Corporation (JP) 2019-05-01 EP disclosed
EP-3444304-A1 POLYFUNCTIONAL POLYMERIZABLE COMPOUND AND COLORED COMPOSITION FUJIFILM Wako Pure Chemical Corporation (JP) 2019-02-20 EP disclosed
CN-102822159-B High-purity epoxy compound and manufacture method thereof TORAY FINE CHEMICALS CO.,LTD. (JP) 2016-02-24 CN disclosed
US-8598266-B2 Flocculation agents for nanoparticle pollutants EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2013-12-03 US disclosed
CN-102822159-A High-purity epoxy compound and method for producing same TORAY FINECHEMICALS CO LTD 2012-12-12 CN disclosed
WO-2012134432-A1 FLOCCULATION AGENTS FOR NANOPARTICLE POLLUTANTS EMPIRE TECHNOLOGY DEVELOPMENT LLC (US) 2012-10-04 WO disclosed
US-20120244052-A1 FLOCCULATION AGENTS FOR NANOPARTICLE POLLUTANTS CRESTLINE DIRECT FINANCE, L.P. 2012-09-27 US disclosed
CN-101910235-B Epoxy compound and method for producing same TORAY FINECHEMICALS CO LTD 2012-06-13 CN disclosed
CN-101910235-A Epoxy compound and method for producing same TORAY FINECHEMICALS CO LTD 2010-12-08 CN disclosed
WO-2010069514-A1 RELATIVE PERMEABILITY MODIFIERS BASED ON HYDROPHOBICALLY MODIFIED CATIONIC COPOLYMERS ENI S.P.A. (IT) 2010-06-24 WO disclosed