SCHEMBL346772

SCHEMBL346772

O=C(O)c1cc2c3cccc4c(C(=O)O)c(C(=O)O)cc(c5cccc(c1C(=O)O)c52)c43

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 4/20 0.44
HPGD P15428 3/20 0.44
ALDH1A1 P00352 3/20 0.44
CYP1A2 P05177 2/20 0.44
KDM4E B2RXH2 2/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
NR4A1 P22736 1/20 0.44
NR4A2 P43354 1/20 0.44
NR4A3 Q92570 1/20 0.44
GLA P06280 1/20 0.44
CYP2C19 P33261 1/20 0.44
CDC25B P30305 2/20 0.43
PARP1 P09874 1/20 0.41
GPR35 Q9HC97 1/20 0.41
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL436827 0.91 CYP1A2 (0.47) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL9353923 0.88 HPGD (0.37) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL9135098 0.87 MEN1 (0.42) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL28774731 0.84 PTPN1 (0.44) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL10350465 0.83 TYMS (0.44) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL15844184 0.83 TYMS (0.44) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL19253277 0.82 GPR35 (0.47) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL29549755 0.82 NR4A1 (0.47) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL22996 0.82 NR4A1 (0.47) HSD17B10HPGDALDH1A1CYP1A2KDM4E
SCHEMBL29054769 0.82 HSD17B10 (0.44) HSD17B10HPGDALDH1A1CYP1A2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 149 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021118671-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY (US) 2021-06-17 WO claimed
US-20210179800-A1 DISPENSABLE POLYIMIDE AEROGEL PREPOLYMER, METHOD OF MAKING THE SAME, METHOD OF USING THE SAME, AND SUBSTRATE COMPRISING PATTERNED POLYIMIDE AEROGEL RAYTHEON COMPANY 2021-06-17 US claimed
CN-118063769-A Polyimide resin 住友化学株式会社 2024-05-24 CN disclosed
WO-2024071066-A1 METAL-CLAD LAMINATED PLATE 日鉄ケミカル&マテリアル株式会社 2024-04-04 WO disclosed
CN-117794048-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2024-03-29 CN disclosed
CN-111746080-B Metal-clad laminate and circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-115971017-B Method for producing polyimide film, method for producing metal-clad laminate, and method for producing circuit board 日铁化学材料株式会社 2024-01-16 CN disclosed
CN-117279198-A Metal-clad laminate, circuit board, electronic device, and electronic apparatus 日铁化学材料株式会社 2023-12-22 CN disclosed
CN-117210002-A Resin film, coverlay film, circuit board, resin-coated copper foil, metal-clad laminate, and multilayer circuit board 日铁化学材料株式会社 2023-12-12 CN disclosed
CN-117067718-A Metal-clad laminate and circuit board 日铁化学材料株式会社 2023-11-17 CN disclosed
CN-117048152-A Method for manufacturing metal-clad laminate 日铁化学材料株式会社 2023-11-14 CN disclosed
EP-0571899-B1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF LACKE & FARBEN (DE) 1994-11-02 EP disclosed
US-5350663-A Construction of electrical circuits and protective or insulating layers for electronic components BASF LACKE+ FARBEN AKTIENGESELLSCHAFT (DE) 1994-09-27 US disclosed
EP-0573866-A1 Method for forming patterned layers of heat-resistant polycondensates BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-15 EP disclosed
EP-0571899-A1 Radiation-curable mixture and its' use for producing high temperature-resistant relief structures BASF Lacke + Farben Aktiengesellschaft (DE) 1993-12-01 EP disclosed
US-5238784-A PHOTOSENSITIVE RESIN COMPOSITION WITH POLYAMIC ACID POLYMER SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-08-24 US disclosed
US-5206337-A Heat resistance, moldability, workability SUMITOMO BAKELITE COMPANY LIMITED (JP) 1993-04-27 US disclosed
EP-0456512-A2 Polyimidesiloxane oligomer SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-11-13 EP disclosed
EP-0430220-A2 Photosensitive resin composition and semiconductor apparatus using it SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed
EP-0430221-A2 Photosensitive resin composition SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-06-05 EP disclosed