Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | BLM | P54132 | 2/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | CA5A | P35218 | 2/20 | 0.40 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | NT5E | P21589 | 1/20 | 0.35 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | CA6 | P23280 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL6018155 | 0.82 | BLM (0.56) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| SCHEMBL215024 | 0.82 | — | — | |
| Sulfuric Acid SCHEMBL10751111 | 0.81 | KDM4E (0.50) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Hydrochloric Acid SCHEMBL442651 | 0.78 | — | — | |
| Water SCHEMBL5014877 | 0.78 | — | — | |
| Sulfuric Acid SCHEMBL28148838 | 0.78 | BLM (0.59) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Sulfuric Acid SCHEMBL1318239 | 0.78 | BLM (0.59) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Sulfuric Acid SCHEMBL170524 | 0.78 | — | — | |
| Sulfuric Acid SCHEMBL1025495 | 0.78 | KDM4E (0.52) | KDM4EBLMCYP2D6CYP2C19NPSR1 | |
| Sulfuric Acid SCHEMBL724776 | 0.78 | KDM4E (0.52) | KDM4EBLMCYP2D6CYP2C19NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120195845-A1 | DEODORANT AND DEODORIZING PRODUCT | TOAGOSEI CO., LTD. (JP) | 2012-08-02 | — | — | US | claimed |
| EP-4511413-A1 | ADDITIVE COMPOSITION AND METHOD FOR USING THE SAME | Milliken & Company (US) | 2025-02-26 | — | — | EP | disclosed |
| US-12042777-B2 | Deodorant composition suitable for aldehyde-based gas or ketone-based gas | TOAGOSEI CO., LTD. (JP) | 2024-07-23 | — | — | US | disclosed |
| WO-2023205070-A1 | ADDITIVE COMPOSITION AND METHOD FOR USING THE SAME | MILLIKEN & COMPANY (US) | 2023-10-26 | — | — | WO | disclosed |
| US-20230331947-A1 | ADDITIVE COMPOSITION AND METHOD FOR USING THE SAME | MILLIKEN & CO (US) | 2023-10-19 | — | — | US | disclosed |
| US-20220040353-A1 | DEODORANT-CONTAINING WORKING FLUID, METHOD FOR MANUFACTURING DEODORIZING PRODUCT, DEODORIZING FILTER MEDIUM, DEODORIZING FILTER UNIT, AND DEODORIZING DEVICE | TOAGOSEI CO., LTD. (JP) | 2022-02-10 | — | — | US | disclosed |
| US-20210387160-A1 | DEODORANT COMPOSITION SUITABLE FOR ALDEHYDE-BASED GAS OR KETONE-BASED GAS | TOAGOSEI CO., LTD. (JP) | 2021-12-16 | — | — | US | disclosed |
| EP-3896195-A1 | DEODORANT COMPOSITION SUITABLE FOR ALDEHYDE-BASED GAS OR KETONE-BASED GAS | Toagosei Co., Ltd. (JP) | 2021-10-20 | — | — | EP | disclosed |
| CN-112639168-A | Deodorant composition suitable for aldehyde-based gas or ketone-based gas | 东亚合成株式会社 | 2021-04-09 | — | — | CN | disclosed |
| US-20200297886-A1 | DEODORANT-CONTAINING WORKING FLUID, METHOD FOR MANUFACTURING DEODORIZING PRODUCT, DEODORIZING FILTER MEDIUM, DEODORIZING FILTER UNIT, AND DEODORIZING DEVICE | TOAGOSEI CO., LTD. (JP) | 2020-09-24 | — | — | US | disclosed |
| US-20180177906-A1 | KETONE-BASED GAS ADSORBENT, GAS ADSORBENT COMPOSITION, AND DEODORANT PROCESSED GOODS | TOAGOSEI CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| EP-3308853-A1 | KETONE-BASED GAS ADSORBENT, GAS ADSORBENT COMPOSITION, AND DEODORANT PROCESSED GOODS | Toagosei Co., Ltd. (JP) | 2018-04-18 | — | — | EP | disclosed |
| CN-107708855-A | Ketone system adsorbent, adsorbent composition and deodorization processed goods | 东亚合成株式会社 | 2018-02-16 | — | — | CN | disclosed |
| CN-107075175-A | modified rubber, rubber composition and tire | 三菱瓦斯化学株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-106432192-A | Preparation method and performance of high-energy insensitive N-(3,5-binitro-1H-pyrazol-4-yl)-1H-tetrazole-5-amine ionic salt structure | 北京理工大学 | 2017-02-22 | — | — | CN | disclosed |
| CN-101378788-B | Deodorants and deodorized articles | TOAGOSEI CO LTD | 2013-04-10 | — | — | CN | disclosed |
| US-20120195845-A1 | DEODORANT AND DEODORIZING PRODUCT | TOAGOSEI CO., LTD. (JP) | 2012-08-02 | — | — | US | disclosed |
| US-20100297053-A1 | DEODERANT AND DEODERIZING PRODUCT | TOAGOSEI CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| CN-101378788-A | Deodorants and deodorized articles | TOAGOSEI CO LTD (JP) | 2009-03-04 | — | — | CN | disclosed |
| CN-101222944-A | Deodorant | TOAGOSEI CO LTD (JP) | 2008-07-16 | — | — | CN | disclosed |