Sulfuric Acid

Sulfuric Acid

SCHEMBL6018155

N=C(N)N.O=S(=O)(O)O.[Fe]

nearest known ligand 0.56

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BLM P54132 4/20 0.56
KDM4E B2RXH2 2/20 0.56
CYP2C19 P33261 2/20 0.56
CYP2D6 P10635 1/20 0.56
NPSR1 Q6W5P4 1/20 0.56
CA5A P35218 2/20 0.50
CA5B Q9Y2D0 2/20 0.50
TSHR P16473 4/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
NT5E P21589 1/20 0.43
CA4 P22748 1/20 0.43
CA6 P23280 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
ALOX15 P16050 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
MEN1 O00255 1/20 0.31
ALDH1A1 P00352 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL170524 0.96
Sulfuric Acid SCHEMBL1318239 0.96 BLM (0.59) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL28148838 0.96 BLM (0.59) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL4162831 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL9797137 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL9703220 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL5014255 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL4167092 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL22127325 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1
Sulfuric Acid SCHEMBL7093064 0.92 BLM (0.56) BLMKDM4ECYP2C19CYP2D6NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5273872-A Silver chlorobromide grains, an iron compound and a tellerium compounds FUJI PHOTO FILM CO. LTD. (JP) 1993-12-28 US claimed
US-20060068338-A1 Silver halide color photographic light-sensitive material FUJI PHOTO FILM B.V. (NL) 2006-03-30 US disclosed
EP-1604245-A1 SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL Fuji Photo Film B.V. (NL) 2005-12-14 EP disclosed
WO-2004081661-A1 SILVER HALIDE COLOR PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL FUJI PHOTO FILM B.V. (NL) 2004-09-23 WO disclosed
US-6562556-B2 Ratio between density and exposure FUJI PHOTO FILM CO., LTD. (JP) 2003-05-13 US disclosed
CN-1090339-C Heat-developable light-sensitive material FUJI PHOTO FILM CO LTD (JP) 2002-09-04 CN disclosed
EP-0709724-B1 Silver halide emulsions with doped epitaxy EASTMAN KODAK CO (US) 2002-05-08 EP disclosed
US-20020001783-A1 Silver halide color photographic light-sensitive material FUJIFILM CORPORATION (JP) 2002-01-03 US disclosed
US-6245496-B1 SUPPORT COATED WITH SILVER HALIDE EMULSION LAYERS CONTAINING A YELLOW, MAGENTA AND CYAN DYE FORMING COUPLER RESPECTIVELY WHEREBY RESULTING COLORS ARE DEPENDENT UPON A LOGARITHMIC EXPOSURE; QUICK PROCESSING, SHARPNESS FUJI PHOTO FILM CO., LTD. (JP) 2001-06-12 US disclosed
EP-0785463-B1 Heat-developable light-sensitive material FUJI PHOTO FILM CO LTD (JP) 2001-02-21 EP disclosed
EP-0514675-A1 Silver halide photographic materials and method for processing the same FUJI PHOTO FILM CO., LTD. (JP) 1992-11-25 EP disclosed
EP-0476604-A1 A silver halide color photograhic material Fuji Photo Film Co., Ltd. (JP) 1992-03-25 EP disclosed
EP-0474047-A1 Silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1992-03-11 EP disclosed
EP-0457307-A1 Silver halide photographic material and processing method thereof FUJI PHOTO FILM CO., LTD. (JP) 1991-11-21 EP disclosed
EP-0457298-A1 Silver halide photographic material and process for the development thereof FUJI PHOTO FILM CO., LTD. (JP) 1991-11-21 EP disclosed
US-5057402-A High speed, sensitivity FUJI PHOTO FILM CO., LTD. (JP) 1991-10-15 US disclosed
US-5043256-A Good color reproduction; nonstaining FUJI PHOTO FILM CO., LTD. (JP) 1991-08-27 US disclosed
EP-0361427-A2 Color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1990-04-04 EP disclosed
EP-0350046-A2 Method of forming a color image FUJI PHOTO FILM CO., LTD. (JP) 1990-01-10 EP disclosed
EP-0325235-A1 Silver halide photographic materials FUJI PHOTO FILM CO., LTD. (JP) 1989-07-26 EP disclosed