Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | TP53 | P04637 | 3/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA7 | P43166 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1723604 | 1.00 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL14129276 | 0.94 | TSHR (0.52) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL95157 | 0.93 | TSHR (0.64) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL16606946 | 0.92 | TSHR (0.50) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL9418348 | 0.92 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL12702903 | 0.92 | TSHR (0.53) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL12629198 | 0.92 | TSHR (0.57) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| 1,4-Butanediol SCHEMBL2466524 | 0.91 | TSHR (0.48) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL12277858 | 0.91 | TSHR (0.58) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL13230684 | 0.90 | TSHR (0.61) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 748 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020058116-A1 | FLAME RETARDANT POLYPROPYLENE COMPOSITION | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2020-03-26 | — | — | WO | claimed |
| US-6906120-B1 | Poly(arylene ether) adhesive compositions | GENERAL ELECTRIC (US) | 2005-06-14 | — | — | US | claimed |
| US-20050079442-A1 | Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating thereto | DUEBER THOMAS E (US) | 2005-04-14 | — | — | US | claimed |
| US-20040058276-A1 | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-03-25 | — | — | US | claimed |
| EP-1400545-A2 | Halo resistant photoimagable coverlay compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-03-24 | — | — | EP | claimed |
| EP-1154322-A1 | Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. | ERMINIO ROSSINI S.P.A. (IT) | 2001-11-14 | — | — | EP | claimed |
| US-6218074-B1 | BLEND OF BROMOPOLYMER AND OTHER ADDITION POLYMER | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-04-17 | — | — | US | claimed |
| EP-0740212-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-09-13 | — | — | EP | claimed |
| EP-0740211-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-08-18 | — | — | EP | claimed |
| EP-0628180-B1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | DU PONT (US) | 1998-09-16 | — | — | EP | claimed |
| US-5643657-A | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-07-01 | — | — | US | claimed |
| EP-0676669-B1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1997-06-18 | — | — | EP | claimed |
| EP-0740211-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | claimed |
| EP-0740212-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | claimed |
| EP-0676669-A1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-10-11 | — | — | EP | claimed |
| EP-0628180-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-12-14 | — | — | EP | claimed |
| US-5288589-A | Storage stability | E.I. DU PONT DE NEMOURS AND COMPANY | 1994-02-22 | — | — | US | claimed |
| WO-1993017368-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-09-02 | — | — | WO | claimed |
| US-4548895-A | Process for the production of images using a heating step prior to imaging | CIBA GEIGY CORPORATION (US) | 1985-10-22 | — | — | US | claimed |
| US-12635688-B2 | Process and solution for preparing a surface with bacteriostatic and bactericidal activity, surface thus prepared and uses thereof | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2026-05-26 | — | — | US | disclosed |
| WO-2026046610-A1 | FIRE RETARDANT WOVEN CONTINUOUS FIBER THERMOPLASTIC COMPOSITES AND ARTICLES | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2026-03-05 | — | — | WO | disclosed |
| US-20250312966-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2025-10-09 | — | — | US | disclosed |
| US-12365132-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2025-07-22 | — | — | US | disclosed |
| US-20250154349-A1 | FLAME RETARDANT PROPYLENE COMPOSITION | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2025-05-15 | — | — | US | disclosed |
| US-20250137199-A1 | PURIFIED MEDICINAL CANNABIS NON-HEMP HURD FIBER, AND ARTICLES CONTAINING THE SAME | PAUWELS DAVID (US) | 2025-05-01 | — | — | US | disclosed |
| WO-2025070813-A1 | QUANTUM DOTS, QUANTUM DOT-CONTAINING SHEET AND METHOD FOR MANUFACTURING SAME, AND BACKLIGHT DEVICE OR DISPLAY DEVICE | ＴＯＰＰＡＮホールディングス株式会社 | 2025-04-03 | — | — | WO | disclosed |
| US-20250058553-A1 | ARTICLE COMPRISING A LAYER WITH DISPERSED GLASS FIBERS AND A LAYER WITH CONTINUOUS GLASS FIBERS | SABIC GLOBAL TECHNOLOGIES BV (NL) | 2025-02-20 | — | — | US | disclosed |
| US-12188180-B2 | Purified medicinal cannabis non-hemp hurd fiber, and articles containing the same | PAUWELS DAVID (US) | 2025-01-07 | — | — | US | disclosed |
| CN-119173600-A | Insulating adhesive tape | 爱天思株式会社 | 2024-12-20 | — | — | CN | disclosed |
| EP-4448284-A1 | ARTICLE COMPRISING A LAYER WITH DISPERSED GLASS FIBERS AND A LAYER WITH CONTINUOUS GLASS FIBERS | SABIC Global Technologies B.V. (NL) | 2024-10-23 | — | — | EP | disclosed |
| US-20230398731-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-12-14 | — | — | US | disclosed |
| US-11820071-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2023-11-21 | — | — | US | disclosed |
| WO-2023219047-A1 | INSULATIVE ADHESIVE TAPE | 東洋インキＳＣホールディングス株式会社 | 2023-11-16 | — | — | WO | disclosed |
| EP-3976878-B1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-07-05 | — | — | EP | disclosed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| WO-2023117729-A1 | FLAME RETARDANT PROPYLENE COMPOSITION | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2023-06-29 | — | — | WO | disclosed |
| WO-2023110955-A1 | ARTICLE COMPRISING A LAYER WITH DISPERSED GLASS FIBERS AND A LAYER WITH CONTINUOUS GLASS FIBERS | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2023-06-22 | — | — | WO | disclosed |
| US-20230180744-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | INSTITUT NATIONAL DES SCIENCES ET INDUSTRIES DU VIVANT ET DE L'ENVIRONNEMENT (FR) | 2023-06-15 | — | — | US | disclosed |
| CN-110050356-B | Composition for organic electronic element encapsulation and encapsulation formed by using composition | 莫门蒂夫性能材料韩国株式会社 | 2023-06-13 | — | — | CN | disclosed |
| US-20230166446-A1 | METHODS OF MAKING A DEFLECTION MEMBER | PROCTER & GAMBLE (US) | 2023-06-01 | — | — | US | disclosed |
| CN-109983595-B | Composition for organic electronic device encapsulant and encapsulant formed using the same | 莫门蒂夫性能材料韩国株式会社 | 2023-04-04 | — | — | CN | disclosed |
| CN-109791978-B | Composition for organic electronic element encapsulant and encapsulant formed using the same | 莫门蒂夫性能材料韩国株式会社 | 2023-04-04 | — | — | CN | disclosed |
| EP-3522241-B1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2023-03-22 | — | — | EP | disclosed |
| US-11590694-B2 | Methods of making a deflection member | THE PROCTER & GAMBLE COMPANY (US) | 2023-02-28 | — | — | US | disclosed |
| EP-4136175-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | Commissariat à l'énergie atomique et aux énergies alternatives (FR) | 2023-02-22 | — | — | EP | disclosed |
| EP-3505344-B1 | ANTIFOG LAMINATE | MITSUI CHEMICALS INC (JP) | 2022-08-03 | — | — | EP | disclosed |
| CN-110032042-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2022-05-27 | — | — | CN | disclosed |
| US-11338562-B2 | Antifogging laminate | MITSUI CHEMICALS, INC. (JP) | 2022-05-24 | — | — | US | disclosed |
| EP-3976878-A1 | METHODS OF MAKING A DEFLECTION MEMBER | The Procter & Gamble Company (US) | 2022-04-06 | — | — | EP | disclosed |
| EP-3553840-B1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2022-01-05 | — | — | EP | disclosed |
| WO-2021234290-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2021-11-25 | — | — | WO | disclosed |
| EP-3511774-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | MERCK PATENT GMBH (DE) | 2021-10-27 | — | — | EP | disclosed |
| EP-3456785-B1 | COMPOSITION FOR ORGANIC ELECTRONIC DEVICE ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2021-10-20 | — | — | EP | disclosed |
| CN-108139670-B | Negative photoresist composition for laser ablation and method of use thereof | 默克专利有限公司 | 2021-07-09 | — | — | CN | disclosed |
| US-20210155758-A1 | OPTICAL TRANSPARENT RESIN AND ELECTRONIC ELEMENT FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2021-05-27 | — | — | US | disclosed |
| US-10995215-B2 | Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same | EWHA University—Industry Collaboration Foundation (KR) | 2021-05-04 | — | — | US | disclosed |
| WO-2021044642-A1 | QUANTUM DOT-CONTAINING COMPOSITION, QUANTUM DOT-CONTAINING MEMBER USING QUANTUM DOT-CONTAINING COMPOSITION, BACKLIGHT DEVICE, DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY ELEMENT | ＮＳマテリアルズ株式会社 | 2021-03-11 | — | — | WO | disclosed |
| US-10858517-B2 | Composition for organic electronic element encapsulant and encapsulant formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-12-08 | — | — | US | disclosed |
| WO-2020243748-A1 | METHODS OF MAKING A DEFLECTION MEMBER | THE PROCTER & GAMBLE COMPANY (US) | 2020-12-03 | — | — | WO | disclosed |
| US-20200378067-A1 | METHODS OF MAKING A DEFLECTION MEMBER | THE PROCTER & GAMBLE COMPANY | 2020-12-03 | — | — | US | disclosed |
| US-10836907-B2 | Composition for organic electronic element encapsulant and encapsulant formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-11-17 | — | — | US | disclosed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| US-10822523-B2 | Composition for organic electronic element encapsulant, and encapsulant formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-11-03 | — | — | US | disclosed |
| US-10705424-B2 | Negative-working photoresist compositions for laser ablation and use thereof | MERCK PATENT GMBH (DE) | 2020-07-07 | — | — | US | disclosed |
| EP-3394674-B1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-05-06 | — | — | EP | disclosed |
| EP-2539072-B1 | ION EXCHANGE MEDIUM | DIONEX CORP (US) | 2020-04-29 | — | — | EP | disclosed |
| US-10618997-B2 | Composition for organic electronic device encapsulant and encapsulant formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-04-14 | — | — | US | disclosed |
| US-10619048-B2 | Composition for organic electronic element encapsulant, and encapsulant formed by using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-04-14 | — | — | US | disclosed |
| WO-2020058116-A1 | FLAME RETARDANT POLYPROPYLENE COMPOSITION | SABIC GLOBAL TECHNOLOGIES B.V. (NL) | 2020-03-26 | — | — | WO | disclosed |
| EP-3626762-A2 | OPTICAL TRANSPARENT RESIN AND ELECTRONIC ELEMENT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2020-03-25 | — | — | EP | disclosed |
| US-20200062962-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-02-27 | — | — | US | disclosed |
| US-20200056041-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2020-02-20 | — | — | US | disclosed |
| US-10553824-B2 | Encapsulation composition for organic electronic device, and encapsulation formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-02-04 | — | — | US | disclosed |
| CN-110621724-A | Optically transparent resin and electronic component formed using the same | 莫门蒂夫性能材料韩国株式会社 | 2019-12-27 | — | — | CN | disclosed |
| US-20190341579-A1 | ENCAPSULATION COMPOSITION FOR ORGANIC ELECTRONIC DEVICE, AND ENCAPSULATION FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2019-11-07 | — | — | US | disclosed |
| EP-3565014-A1 | ENCAPSULATION COMPOSITION FOR ORGANIC ELECTRONIC DEVICE, AND ENCAPSULATION FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-11-06 | — | — | EP | disclosed |
| EP-3327472-B1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | KONICA MINOLTA INC (JP) | 2019-10-30 | — | — | EP | disclosed |
| EP-3553840-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-10-16 | — | — | EP | disclosed |
| EP-3550624-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-10-09 | — | — | EP | disclosed |
| EP-3522241-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-08-07 | — | — | EP | disclosed |
| EP-3511774-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2019-07-17 | — | — | EP | disclosed |
| US-20190194492-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS INC. | 2019-06-27 | — | — | US | disclosed |
| EP-3456784-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED BY USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-03-20 | — | — | EP | disclosed |
| EP-3456785-A1 | COMPOSITION FOR ORGANIC ELECTRONIC DEVICE ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2019-03-20 | — | — | EP | disclosed |
| US-20190071531-A1 | COMPOSITION FOR ORGANIC ELECTRONIC DEVICE ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. | 2019-03-07 | — | — | US | disclosed |
| US-20190058125-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED BY USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2019-02-21 | — | — | US | disclosed |
| US-20190048119-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT, AND ENCAPSULANT FORMED BY USING SAME | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2019-02-14 | — | — | US | disclosed |
| US-20190016887-A1 | FLUOROMONOMER AND FLUOROOLIGOMER COMPOUNDS, PHOTOPOLYMERIZABLE COMPOSITION, AND HYDROPHOBIC FILM USING THE SAME | EWHA UNIVERSITY - INDUSTRY COLLABORATON FOUNDATON (KR) | 2019-01-17 | — | — | US | disclosed |
| EP-2861638-B1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2018-11-14 | — | — | EP | disclosed |
| EP-3394674-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM | AZ Electronic Materials Luxembourg S.à.r.l. (LU) | 2018-10-31 | — | — | EP | disclosed |
| US-20180217312-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR PRODUCING THE SAME | Konica Minolta, Inc. (JP) | 2018-08-02 | — | — | US | disclosed |
| US-20180217311-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND METHOD FOR PRODUCING THE SAME | Konica Minolta, Inc. (JP) | 2018-08-02 | — | — | US | disclosed |
| EP-3333603-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | Konica Minolta, Inc. (JP) | 2018-06-13 | — | — | EP | disclosed |
| EP-3327472-A1 | HOLOGRAPHIC OPTICAL ELEMENT AND PRODUCTION METHOD THEREFOR | Konica Minolta, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-2683480-B1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING TERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | DIONEX CORP (US) | 2018-05-23 | — | — | EP | disclosed |
| US-20170352836-A1 | COMPOSITION FOR ORGANIC ELECTRONIC DEVICE ENCAPSULANT AND ENCAPSULANT FORMED USING THE SAME | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2017-12-07 | — | — | US | disclosed |
| EP-3252107-A1 | COMPOSITION FOR ORGANIC ELECTRONIC ELEMENT ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | Momentive Performance Materials Korea Co., Ltd. (KR) | 2017-12-06 | — | — | EP | disclosed |
| EP-2182411-B1 | Method for preparing a printing form from a photopolymerizable element | DU PONT (US) | 2017-11-22 | — | — | EP | disclosed |
| US-20170285475-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-10-05 | — | — | US | disclosed |
| EP-3201690-A1 | A MICROFLUIDIC DEVICE AND A METHOD FOR PREPARING THE MICROFLUIDIC DEVICE FROM A PHOTOSENSITIVE ELEMENT | E. I. du Pont de Nemours and Company (US) | 2017-08-09 | — | — | EP | disclosed |
| US-20170176856-A1 | NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND USE THEREOF | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2017-06-22 | — | — | US | disclosed |
| EP-1783548-B1 | Method of forming a patterned layer on a substrate | ROHM & HAAS ELECT MAT (US) | 2017-03-08 | — | — | EP | disclosed |
| CN-106414461-A | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | 和光纯药工业株式会社 | 2017-02-15 | — | — | CN | disclosed |
| CN-105246638-B | Bismuth oxide-based additive for laser marking | 东罐材料科技株式会社 | 2017-01-25 | — | — | CN | disclosed |
| EP-3018118-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2016-05-11 | — | — | EP | disclosed |
| US-20160089672-A1 | MICROFLUIDIC DEVICE AND A METHOD FOR PREPARING THE MICROFLUIDIC DEVICE FROM A PHOTOSENSITIVE ELEMENT | DU PONT (US) | 2016-03-31 | — | — | US | disclosed |
| CN-105339340-A | Base generator, base-reactive composition containing said base generator, and base generation method | WAKO PURE CHEM IND LTD | 2016-02-17 | — | — | CN | disclosed |
| CN-105246638-A | Bismuth oxide-based additive for laser marking | TOKAN MATERIAL TECHNOLOGY CO LTD | 2016-01-13 | — | — | CN | disclosed |
| US-20150329730-A1 | UV-CURABLE DIELECTRIC INKS FOR PHOTOVOLTAIC MODULES | E. I. DU PONT DE NEMOURS AND COMPANY | 2015-11-19 | — | — | US | disclosed |
| CN-104910644-A | Method for producing pigment dispersion, pigment dispersion and colored resin composition for color filter | DNP FINE CHEMICALS CO LTD | 2015-09-16 | — | — | CN | disclosed |
| US-9132364-B2 | High capacity ion chromatography stationary phases and method of forming | DIONEX CORPORATION (US) | 2015-09-15 | — | — | US | disclosed |
| US-9034447-B2 | Electrostatically bound hyperbranched anion exchange surface coating prepared via condensation polymerization using ditertiary amine linkers for improved divalent anion selectivity | DIONEX CORPORATION (US) | 2015-05-19 | — | — | US | disclosed |
| EP-2861638-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2015-04-22 | — | — | EP | disclosed |
| EP-1353228-B1 | Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method | ROHM & HAAS ELECT MAT (US) | 2015-01-28 | — | — | EP | disclosed |
| US-8906594-B2 | Negative-working thick film photoresist | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-12-09 | — | — | US | disclosed |
| US-8883393-B2 | Printing form precursor for use as a recording element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-11-11 | — | — | US | disclosed |
| EP-1873588-B1 | Imaging element having a photoluminescent tag and method to form a recording element using it | DU PONT (US) | 2014-09-10 | — | — | EP | disclosed |
| US-8790862-B2 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-07-29 | — | — | US | disclosed |
| US-8715908-B2 | Process of using an imaging element having a photoluminescent tag | E I DU PONT DE NEMOURS AND COMPANY (US) | 2014-05-06 | — | — | US | disclosed |
| EP-2045660-B1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | DU PONT (US) | 2014-03-12 | — | — | EP | disclosed |
| EP-2683480-A1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING TERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | Dionex Corporation (US) | 2014-01-15 | — | — | EP | disclosed |
| WO-2013185990-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2013-12-19 | — | — | WO | disclosed |
| US-20130337381-A1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2013-12-19 | — | — | US | disclosed |
| EP-1779196-B1 | BINDER-FREE PHOTOPOLYMERIZABLE COMPOSITIONS | XETOS AG (DE) | 2013-10-09 | — | — | EP | disclosed |
| US-8470518-B2 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-06-25 | — | — | US | disclosed |
| US-8465904-B2 | Method for preparing a printing form from a photopolymerizable element | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-06-18 | — | — | US | disclosed |
| US-8455175-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-06-04 | — | — | US | disclosed |
| US-20130137043-A1 | PHOTOSENSITIVE ELEMENT HAVING REINFORCING PARTICLES AND METHOD FOR PREPARING A PRINTING FORM FROM THE ELEMENT | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-05-30 | — | — | US | disclosed |
| EP-1679549-B1 | Flexographic imaging element for use as a recording element and process of making a recording element | DU PONT (US) | 2013-03-27 | — | — | EP | disclosed |
| EP-2539072-A2 | HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASE AND METHOD OF FORMING | Dionex Corporation (US) | 2013-01-02 | — | — | EP | disclosed |
| EP-1832611-B1 | Processes for making polymer solutions and thick film compositions | DU PONT (US) | 2012-12-12 | — | — | EP | disclosed |
| WO-2012125493-A1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING TERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | DIONEX CORPORATION (US) | 2012-09-20 | — | — | WO | disclosed |
| US-20120231195-A1 | ELECTROSTATICALLY BOUND HYPERBRANCHED ANION EXCHANGE SURFACE COATING PREPARED VIA CONDENSATION POLYMERIZATION USING DITERTIARY AMINE LINKERS FOR IMPROVED DIVALENT ANION SELECTIVITY | DIONEX CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-8263316-B2 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-09-11 | — | — | US | disclosed |
| US-8202932-B2 | Alkylated borohydride or tetraalkyl borane metal or ammonium salt and a polymerizable (meth)acrylated siloxane, low energy bonding surface, for example, the polyolefins, polyethylene, and polypropylene | LOCTITE (R&D) LIMITED (IE) | 2012-06-19 | — | — | US | disclosed |
| US-8158735-B2 | Adhesive bonding system having adherence to low energy surfaces | LOCTITE (R&D) LIMITED (IE) | 2012-04-17 | — | — | US | disclosed |
| US-20120015294-A1 | IMAGING ELEMENT HAVING A PHOTOLUMINESCENT TAG AND PROCESS OF USING THE IMAGING ELEMENT TO FORM A RECORDING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2012-01-19 | — | — | US | disclosed |
| US-20110262861-A1 | PHOTOSENSITIVE COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-10-27 | — | — | US | disclosed |
| US-8034444-B2 | Porous membranes and recording media comprising same | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2011-10-11 | — | — | US | disclosed |
| EP-1632281-B1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM & HAAS (US) | 2011-09-14 | — | — | EP | disclosed |
| US-20110210055-A1 | HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASES AND METHOD OF FORMING | DIONEX CORPORATION (US) | 2011-09-01 | — | — | US | disclosed |
| WO-2011106720-A2 | THE INTERNATIONAL BUREAU ACKNOWLEDGES RECEIPT, ON [DATE], OF AMENDMENTS TO THE CLAIMS UNDER PCT ARTICLE 19(1). HOWEVER, THE APPLICANT IS URGENTLY REQUESTED TO SUBMIT REPLACEMENT SHEET(S) CONTAINING A COMPLETE SET OF CLAIMS IN REPLACEMENT OF ALL THE CLAIMS ORIGINALLY FILED, IN CONFORMITY WITH PCT RULE 46.5(A). HIGH CAPACITY ION CHROMATOGRAPHY STATIONARY PHASE AND METHOD OF FORMING | DIONEX CORPORATION (US) | 2011-09-01 | — | — | WO | disclosed |
| US-8002603-B2 | Co-processable photoimageable silver and corbon nanotube compositions and method for field emission devices | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-08-23 | — | — | US | disclosed |
| CN-102113080-A | Co-processable photoimageable silver and carbon nanotube compositions and method for field emission devices | DU PONT | 2011-06-29 | — | — | CN | disclosed |
| CN-1848303-B | Black conductive compositions, black electrodes, and product using same | DU PONT | 2011-05-04 | — | — | CN | disclosed |
| US-7932016-B2 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-04-26 | — | — | US | disclosed |
| EP-2283507-A2 | CO-PROCESSABLE PHOTOIMAGEABLE SILVER AND CARBON NANOTUBE COMPOSITIONS AND METHOD FOR FIELD EMISSION DEVICES | E. I. du Pont de Nemours and Company (US) | 2011-02-16 | — | — | EP | disclosed |
| US-20100314988-A1 | RESINATES CONTAINING ACQUEOUS DEVELOPABLE PHOTOIMAGEABLE CARBON NANOTUBE PASTES WITH ENHANCED PERFORMANCE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-12-16 | — | — | US | disclosed |
| US-7846639-B2 | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-12-07 | — | — | US | disclosed |
| US-20100209843-A1 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-08-19 | — | — | US | disclosed |
| WO-2010094017-A1 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-08-19 | — | — | WO | disclosed |
| CN-1660598-B | Ink jet printable thick film ink compositions and processes | DU PONT | 2010-08-04 | — | — | CN | disclosed |
| US-20100178520-A1 | ADHESIVE BONDING SYSTEM HAVING ADHERENCE TO LOW ENERGY SURFACES | LOCTITE (R&D) LIMITED (IE) | 2010-07-15 | — | — | US | disclosed |
| US-7741013-B2 | Process for thick film circuit patterning | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-22 | — | — | US | disclosed |
| CN-1660597-B | Method for depositing ink jet printable composition on basis material | DU PONT | 2010-06-16 | — | — | CN | disclosed |
| US-20100136483-A1 | IMAGING ELEMENT HAVING A PHOTOLUMINESCENT TAG AND PROCESS OF USING THE IMAGING ELEMENT TO FORM A RECORDING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-06-03 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| US-20100112484-A1 | METHOD FOR PREPARING A PRINTING FORM FROM A PHOTOPOLYMERIZABLE ELEMENT | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-05-06 | — | — | US | disclosed |
| EP-2182411-A1 | Method for preparing a printing form from a photopolymerizable element | E. I. du Pont de Nemours and Company (US) | 2010-05-05 | — | — | EP | disclosed |
| US-20100104829-A1 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | E.I.DU PONT DE NEMOURS AND COMPANY (US) | 2010-04-29 | — | — | US | disclosed |
| US-20100086751-A1 | IMAGING ELEMENT FOR USE AS A RECORDING ELEMENT AND PROCESS OF USING THE IMAGING ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-04-08 | — | — | US | disclosed |
| US-7683107-B2 | Ink jet printable thick film compositions and processes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-03-23 | — | — | US | disclosed |
| US-7666328-B2 | Comprising finely divided particles selected from noble metals, alloys of noble metals, refractory glass compositions, organic medium comprising ethyl cellulose, additional inorganic binder selected from metal oxides, non-oxide borides, non-oxide silicides | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-02-23 | — | — | US | disclosed |
| CN-100587888-C | Black conductive thick film compositions, black electrodes, and methods of forming same | DU PONT | 2010-02-03 | — | — | CN | disclosed |
| US-7645564-B2 | Photoimageable thick films for electrodes in flat panel display; photopolymerization; sheets | E. I. DU PONT DE NEMOURS AND COMPANY | 2010-01-12 | — | — | US | disclosed |
| EP-1435020-B1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS | DU PONT (US) | 2009-12-30 | — | — | EP | disclosed |
| WO-2009143094-A2 | CO-PROCESSABLE PHOTOIMAGEABLE SILVER AND CARBON NANOTUBE COMPOSITIONS AND METHOD FOR FIELD EMISSION DEVICES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-11-26 | — | — | WO | disclosed |
| US-20090292038-A1 | Flame Retardant Photoimagable Coverlay Compositions and Methods Relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-11-26 | — | — | US | disclosed |
| US-20090284122-A1 | Co-processable Photoimageable Silver and Corbon Nanotube Compositions and Method for Field Emission Devices | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-11-19 | — | — | US | disclosed |
| US-7618766-B2 | Flame retardant photoimagable coverlay compositions and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-11-17 | — | — | US | disclosed |
| US-7588863-B2 | Hologram recording method and hologram recording material | FUJIFILM CORPORATION (JP) | 2009-09-15 | — | — | US | disclosed |
| US-7582390-B2 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJIFILM CORPORATION (JP) | 2009-09-01 | — | — | US | disclosed |
| US-20090202813-A1 | POROUS MEMBRANES AND RECORDING MEDIA COMPRISING SAME | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2009-08-13 | — | — | US | disclosed |
| US-7569165-B2 | Gold, silver, platinum, palladium, and/or copper conductive particles; RuO2 or ruthenium polyoxide; organic polymer binder; organic solvent; lead-free bismuth glass binders with softening point of 400-600 degrees C.; single layer bus electrode; paste suitable for screen-printing | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-08-04 | — | — | US | disclosed |
| WO-2009086117-A1 | RESINATES CONTAINING ACQUEOUS DEVELOPABLE PHOTOIMAGEABLE CARBON NANOTUBE PASTES WITH ENHANCED PERFORMANCE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-07-09 | — | — | WO | disclosed |
| EP-1510318-B1 | Process for manufacturing polymers | ROHM & HAAS (US) | 2009-07-01 | — | — | EP | disclosed |
| EP-1076071-B1 | Photosensitive ceramic compositions containing polycarbonate polymers | DU PONT (US) | 2009-06-10 | — | — | EP | disclosed |
| US-7541003-B2 | Latex based adsorbent chip | BIO-RAD LABORATORIES, INC. (US) | 2009-06-02 | — | — | US | disclosed |
| EP-1529796-B1 | Photosensitive ceramic compositions containing polycarbonate polymers | DU PONT (US) | 2009-05-13 | — | — | EP | disclosed |
| US-7527915-B2 | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-05-05 | — | — | US | disclosed |
| US-20090111907-A1 | SCREEN PRINTABLE HYDROGEL FOR MEDICAL APPLICATIONS | YANG HAIXIN | 2009-04-30 | — | — | US | disclosed |
| EP-2051860-A1 | POROUS MEMBRANES AND RECORDING MEDIA COMPRISING SAME | Fuji Film Manufacturing Europe B.V. (NL) | 2009-04-29 | — | — | EP | disclosed |
| US-7517496-B2 | Latex based adsorbent chip | BIO-RAD LABORATORIES, INC. (US) | 2009-04-14 | — | — | US | disclosed |
| EP-2045660-A1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E. I. Du Pont de Nemours and Company (US) | 2009-04-08 | — | — | EP | disclosed |
| US-20090075199-A1 | Photosensitive element having reinforcing particles and method for preparing a printing form from the element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-03-19 | — | — | US | disclosed |
| US-7494604-B2 | Zeolite, metal sulfate, metal chloride, or metal bromide desiccant dispersed in a curable organic polymeric binder, monomer, and a photoinitiator; for use with moisture sensitive electronic devices such as organic light emitting diodes and electroluminescent devices | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2009-02-24 | — | — | US | disclosed |
| CN-101370909-A | Ignition resistant polycarbonate polyester composition | GEN ELECTRIC (US) | 2009-02-18 | — | — | CN | disclosed |
| WO-2008144822-A1 | HOLOGRAPHIC RECORDING MEDIUM | ADVANCED POLYMERIK PTY LTD (AU) | 2008-12-04 | — | — | WO | disclosed |
| EP-1058697-B1 | POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR | DU PONT (US) | 2008-11-26 | — | — | EP | disclosed |
| EP-1987100-A2 | FLAME RETARDANT RESIN COMPOSITION | Sabic Innovative Plastics IP B.V. (NL) | 2008-11-05 | — | — | EP | disclosed |
| EP-1435022-B1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS WITH PHOTOSPEED ENHANCER | DU PONT (US) | 2008-10-29 | — | — | EP | disclosed |
| EP-1973990-A2 | IGNITION RESISTANT POLYCARBONATE POLYESTER COMPOSITION | GENERAL ELECTRIC COMPANY (US) | 2008-10-01 | — | — | EP | disclosed |
| EP-0487086-B2 | Method of preparing volume type phase hologram member using a photosensitive recording medium | CANON KK (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-7408012-B1 | Adhesive bonding systems having adherence to low energy surfaces | LOCTITE (R&D) LIMITED (IE) | 2008-08-05 | — | — | US | disclosed |
| US-20080171801-A1 | Zeolite, metal sulfate, metal chloride, or metal bromide desiccant dispersed in a curable organic polymeric binder, monomer, and a photoinitiator; for use with moisture sensitive electronic devices such as organic light emitting diodes and electroluminescent devices | CHO YONG | 2008-07-17 | — | — | US | disclosed |
| EP-1295518-B1 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | DU PONT (US) | 2008-07-02 | — | — | EP | disclosed |
| US-7393895-B2 | Forming concentrate of poly(arylene ether), thermosetting resin and compatibilizer | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2008-07-01 | — | — | US | disclosed |
| US-7371335-B2 | Curable thick film compositions for use in moisture control | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2008-05-13 | — | — | US | disclosed |
| US-7344970-B2 | Plating method | SHIPLEY COMPANY, L.L.C. (US) | 2008-03-18 | — | — | US | disclosed |
| US-20080063980-A1 | Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-03-13 | — | — | US | disclosed |
| US-20080038518-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2008-02-14 | — | — | US | disclosed |
| WO-2008016301-A1 | POROUS MEMBRANES AND RECORDING MEDIA COMPRISING SAME | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2008-02-07 | — | — | WO | disclosed |
| US-20080033090-A1 | Flame retardant multi-layer photoimagable coverlay compositions and methods relating thereto | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2008-02-07 | — | — | US | disclosed |
| EP-1873588-A2 | Imaging element having a photoluminescent tag, apparatus containing said imaging element and method to form a recording element using it | E.I.Du pont de nemours and company (US) | 2008-01-02 | — | — | EP | disclosed |
| US-7312259-B2 | combining polymers with surfactants having hydrophilic-lipophilic balance values between 10 and 25 via spray drying, to lower or reduce the dusting levels, raise the minimum ignition energy and lower explosion strength during handling, conveying and storage | ROHM AND HAAS COMPANY (US) | 2007-12-25 | — | — | US | disclosed |
| US-20070287801-A1 | MOLDABLE POLY(ARYLENE ETHER) THERMOSETTING COMPOSITIONS, METHODS, AND ARTICLES | CITIBANK, N.A., AS COLLATERAL AGENT | 2007-12-13 | — | — | US | disclosed |
| US-7303854-B2 | Electrode-forming composition for field emission type of display device, and method using such a composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-04 | — | — | US | disclosed |
| CN-100351702-C | UV curable powder suitable for use as a photoresist | DSM NV (NL) | 2007-11-28 | — | — | CN | disclosed |
| CN-100350327-C | Process for continuous liquid processing of photosensitive compositions having reduced levels of residues | DU PONT (US) | 2007-11-21 | — | — | CN | disclosed |
| EP-1526144-B1 | Screen printable hydrogel for medical applications | DU PONT (US) | 2007-10-31 | — | — | EP | disclosed |
| US-7276381-B2 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | BIO-RAD LABORATORIES, INC. (US) | 2007-10-02 | — | — | US | disclosed |
| US-7276325-B2 | Using photosensitive copper conductive mixture of copper powder in binder; controlling particle sizes | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2007-10-02 | — | — | US | disclosed |
| EP-1832611-A1 | Processes for making polymer solutions and thick film compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2007-09-12 | — | — | EP | disclosed |
| US-20070208111-A1 | Polymer solutions, aqueous developable thick film compositions processes of making and electrodes formed thereof | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-09-06 | — | — | US | disclosed |
| WO-2007097866-A2 | FLAME RETARDANT RESIN COMPOSITION | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2007-08-30 | — | — | WO | disclosed |
| US-20070197696-A1 | Flame retardant resin composition | GENERAL ELECTRIC COMPANY | 2007-08-23 | — | — | US | disclosed |
| US-20070187947-A1 | Binder-free photopolymerizable compositions | XETOS AG (DE) | 2007-08-16 | — | — | US | disclosed |
| US-7256127-B2 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2007-08-14 | — | — | US | disclosed |
| WO-2007084538-A2 | IGNITION RESISTANT POLYCARBONATE POLYESTER COMPOSITION | GENERAL ELECTRIC COMPANY (A NEW YORK CORPORATION) (US) | 2007-07-26 | — | — | WO | disclosed |
| US-20070167544-A1 | Ignition resistant polycarbonate polyester composition | GENERAL ELECTRIC COMPANY | 2007-07-19 | — | — | US | disclosed |
| CN-1325571-C | Oil absorbing composition and process | ROHM & HAAS INC (US) | 2007-07-11 | — | — | CN | disclosed |
| WO-2007073498-A2 | FLAME RETARDANT PHOTOIMAGABLE COVERLAY COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-06-28 | — | — | WO | disclosed |
| US-20070149635-A1 | Flame retardant photoimagable coverlay compositions and methods relating thereto | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2007-06-28 | — | — | US | disclosed |
| US-20070113952-A1 | Comprising finely divided particles selected from noble metals, alloys of noble metals, refractory glass compositions, organic medium comprising ethyl cellulose, additional inorganic binder selected from metal oxides, non-oxide borides, non-oxide silicides | MICROMAX (US) HOLDINGS LLC | 2007-05-24 | — | — | US | disclosed |
| EP-1788616-A2 | Thick film conductor compositions and processing technology thereof for use in multilayer electronic circuits and devices | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2007-05-23 | — | — | EP | disclosed |
| US-20070105046-A1 | Photosensitive composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-05-10 | — | — | US | disclosed |
| EP-1783548-A2 | Photosensitive composition | Rohm and Haas Electronic Materials LLC (US) | 2007-05-09 | — | — | EP | disclosed |
| EP-1779195-A2 | AQUEOUS DEVELOPABLE PHOTO-IMAGEABLE COMPOSITION PRECURSORS FOR USE IN PHOTO-PATTERNING METHODS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2007-05-02 | — | — | EP | disclosed |
| EP-1779196-A1 | BINDER-FREE PHOTOPOLYMERIZABLE COMPOSITIONS | Heeschen, Andreas (GB) | 2007-05-02 | — | — | EP | disclosed |
| EP-1777272-A1 | Ink jet printable hydrogel for sensor electrode applications | E.I. du Pont de Nemours and Company (US) | 2007-04-25 | — | — | EP | disclosed |
| CN-1312754-C | FOrmation of air-gap | SHIPLEY CO LLC (US) | 2007-04-25 | — | — | CN | disclosed |
| US-20070077596-A1 | TRACE INCORPORATION OF FLUORESCENT MONOMER FACILITATING QUALITY CONTROL OF POLYMERIZATION REACTIONS | CIPHERGEN BIOSYSTEMS, INC. | 2007-04-05 | — | — | US | disclosed |
| EP-1093020-B1 | Wound storage roll of composite photosensitive element | DU PONT (US) | 2007-04-04 | — | — | EP | disclosed |
| EP-1092421-B1 | Method for preparing ultraviolet radiation absorbing compositions | ROHM & HAAS (US) | 2007-03-21 | — | — | EP | disclosed |
| US-7192542-B2 | Oil absorbing composition and process | ROHM AND HAAS COMPANY (US) | 2007-03-20 | — | — | US | disclosed |
| US-20070059459-A1 | Ink jet printable hydrogel for sensor electrode applications | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-03-15 | — | — | US | disclosed |
| EP-1750286-A1 | Conductor composition for use in LTCC photosensitive tape on substrate applications | E.I.Du pont de nemours and company (US) | 2007-02-07 | — | — | EP | disclosed |
| US-20070023388-A1 | Conductor composition for use in LTCC photosensitive tape on substrate applications | E. I. DU PONT DE NEMOURS AND COMPANY | 2007-02-01 | — | — | US | disclosed |
| CN-1881482-A | Black conductive thick film compositions, black electrodes, and methods of forming thereof | DU PONT (US) | 2006-12-20 | — | — | CN | disclosed |
| CN-1289057-C | Method for preparing ultra-violet absorption composition | ROHM & HAAS (US) | 2006-12-13 | — | — | CN | disclosed |
| US-7135267-B2 | Aqueous developable photoimageable compositions for use in photo-patterning methods | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2006-11-14 | — | — | US | disclosed |
| CN-1848303-A | Black conductive compositions, black electrodes, and methods of forming thereof | DU PONT (US) | 2006-10-18 | — | — | CN | disclosed |
| CN-1848355-A | Black conductive thick film compositions, black electrodes, and methods of forming thereof | DU PONT (US) | 2006-10-18 | — | — | CN | disclosed |
| US-20060223690-A1 | Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-10-05 | — | — | US | disclosed |
| EP-1708024-A2 | Photosensitive thick-film dielectric paste composition and method for making an insulating layer using same | E.I.Du pont de nemours and company (US) | 2006-10-04 | — | — | EP | disclosed |
| US-20060205866-A1 | Screen printable hydrogel for medical applications | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-09-14 | — | — | US | disclosed |
| US-20060202174-A1 | Black conductive compositions, black electrodes, and methods of forming thereof | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-09-14 | — | — | US | disclosed |
| EP-1701212-A2 | Black conductive compositions, black electrodes, and methods of forming thereof | E.I.Du pont de nemours and company (US) | 2006-09-13 | — | — | EP | disclosed |
| US-7105588-B2 | Screen printable hydrogel for medical applications | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2006-09-12 | — | — | US | disclosed |
| US-20060199096-A1 | Process for thick film circuit patterning | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-09-07 | — | — | US | disclosed |
| US-7098279-B2 | Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces | LOCTITE (R&D) LIMITED (IE) | 2006-08-29 | — | — | US | disclosed |
| US-7090920-B2 | Poly(arylene ether) adhesive compositions | GENERAL ELECTRIC COMPANY (US) | 2006-08-15 | — | — | US | disclosed |
| US-20060160018-A1 | Electrode-forming composition for field emission type of display device, and method using such a composition | HAYAKAWA KEIICHIRO | 2006-07-20 | — | — | US | disclosed |
| US-20060154180-A1 | Imaging element for use as a recording element and process of using the imaging element | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-07-13 | — | — | US | disclosed |
| EP-1679549-A2 | Imaging element for use as a recording element and process of using the imaging element | E.I.Du pont de nemours and company (US) | 2006-07-12 | — | — | EP | disclosed |
| US-20060135706-A1 | Moldable poly(arylene ether) thermosetting compositions, methods, and articles | CITIBANK, N.A., AS COLLATERAL AGENT | 2006-06-22 | — | — | US | disclosed |
| EP-0863534-B1 | Plasma display panel device and method of fabricating the same | DU PONT (US) | 2006-06-21 | — | — | EP | disclosed |
| US-20060122319-A1 | Adhesive bonding systems having adherence to low energy surfaces | LOCTITE (R&D) LIMITED | 2006-06-08 | — | — | US | disclosed |
| US-7052824-B2 | Process for thick film circuit patterning | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2006-05-30 | — | — | US | disclosed |
| EP-1483794-A4 | LATEX BASED ADSORBENT CHIP | CIPHERGEN BIOSYSTEMS INC (US) | 2006-05-03 | — | — | EP | disclosed |
| EP-1652581-A1 | Curable thick film paste compositions for use in moisture control | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-05-03 | — | — | EP | disclosed |
| US-20060088663-A1 | Zeolite, metal sulfate, metal chloride, or metal bromide desiccant dispersed in a curable organic polymeric binder, monomer, and a photoinitiator; for use with moisture sensitive electronic devices such as organic light emitting diodes and electroluminescent devices | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-04-27 | — | — | US | disclosed |
| US-20060073423-A1 | Electronic device manufacture | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-04-06 | — | — | US | disclosed |
| US-7022777-B2 | Moldable poly(arylene ether) thermosetting compositions, methods, and articles | GENERAL ELECTRIC (US) | 2006-04-04 | — | — | US | disclosed |
| EP-1632281-A1 | Process for absorbing hydrophobic substances in polymers having an hollow structure | ROHM AND HAAS COMPANY (US) | 2006-03-08 | — | — | EP | disclosed |
| WO-2006017791-A2 | AQUEOUS DEVELOPABLE PHOTO-IMAGEABLE COMPOSITION PRECURSORS FOR USE IN PHOTO-PATTERNING METHODS | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-02-16 | — | — | WO | disclosed |
| US-20060027307-A1 | Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-02-09 | — | — | US | disclosed |
| US-20060029888-A1 | Method of application of a dielectric sheet and photosensitive dielectric composition(s) and tape(s) used therein | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-02-09 | — | — | US | disclosed |
| US-20060029882-A1 | Aqueous developable photoimageable compositions for use in photo-patterning methods | MICROMAX (US) HOLDINGS LLC | 2006-02-09 | — | — | US | disclosed |
| EP-1624339-A1 | Photosensitive dielectric compositions, tapes, and method of application of a dielectric sheet using the same | E.I.Du pont de nemours and company (US) | 2006-02-08 | — | — | EP | disclosed |
| US-6994948-B2 | Aqueous developable photoimageable thick film compositions | E.I. DU PONT DE NEMOURS AND COMPANY, INC. (US) | 2006-02-07 | — | — | US | disclosed |
| WO-2005124460-A1 | BINDER-FREE PHOTOPOLYMERIZABLE COMPOSITIONS | HEESCHEN ANDREAS (GB) | 2005-12-29 | — | — | WO | disclosed |
| CN-1690136-A | Ink jet printable thick film ink compositions and processes | DU PONT (US) | 2005-11-02 | — | — | CN | disclosed |
| EP-0858392-B2 | PROCESSES FOR PREPARING AND USING MOULDS | HUNTSMAN ADVANCED MATERIALS UK (GB) | 2005-10-12 | — | — | EP | disclosed |
| EP-0889363-B1 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes | DU PONT (US) | 2005-10-05 | — | — | EP | disclosed |
| US-20050203215-A1 | Polymer carriers and process | UGAZIO STEPHEN P J (FR) | 2005-09-15 | — | — | US | disclosed |
| EP-1574534-A1 | Polymer carriers and process | ROHM AND HAAS COMPANY (US) | 2005-09-14 | — | — | EP | disclosed |
| CN-1660598-A | Ink jet printable thick film ink compositions and processes | DU PONT (US) | 2005-08-31 | — | — | CN | disclosed |
| CN-1660597-A | Ink jet printable thick film ink compositions and processes | DU PONT (US) | 2005-08-31 | — | — | CN | disclosed |
| EP-1564265-A1 | Ink jet printable thick film ink compositions and processes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-08-17 | — | — | EP | disclosed |
| US-20050173680-A1 | Ink jet printable thick film ink compositions and processes | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-08-11 | — | — | US | disclosed |
| US-20050176849-A1 | Ink jet printable thick film compositions and processes | CELANESE MERCURY HOLDINGS INC. | 2005-08-11 | — | — | US | disclosed |
| US-20050176246-A1 | Ink jet printable thick film ink compositions and processes | E.I. DU PONT DE NEMOURS AND COMPANY | 2005-08-11 | — | — | US | disclosed |
| EP-1562410-A2 | Ink jet printable thick film ink compositions and processes | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-08-10 | — | — | EP | disclosed |
| EP-1561789-A1 | Ink jet printable thick film ink compositions and processes | E.I. du Pont de Nemours and Company (US) | 2005-08-10 | — | — | EP | disclosed |
| US-20050158552-A1 | Poly(arylene ether) adhesive compositions | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2005-07-21 | — | — | US | disclosed |
| CN-1637076-A | Oil absorbing composition and process | ROHM & HAAS (US) | 2005-07-13 | — | — | CN | disclosed |
| CN-1208406-C | Radiation curable water-based cationic inks and coatings | SUN CHEMICAL CORP (US) | 2005-06-29 | — | — | CN | disclosed |
| US-20050131143-A1 | Oil absorbing composition and process | ROHM AND HAAS FRANCE, S.A.S. (FR) | 2005-06-16 | — | — | US | disclosed |
| EP-1435021-B1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS FOR MAKING PHOTOIMAGEABLE BLACK ELECTRODES | DU PONT (US) | 2005-06-15 | — | — | EP | disclosed |
| US-6906120-B1 | Poly(arylene ether) adhesive compositions | GENERAL ELECTRIC (US) | 2005-06-14 | — | — | US | disclosed |
| EP-1529796-A1 | Photosensitive ceramic compositions containing polycarbonate polymers | E.I. du Pont de Nemours and Company (US) | 2005-05-11 | — | — | EP | disclosed |
| US-6890399-B2 | (Meth)acrylate compositions having a self-indicator of cure and methods of detecting cure | HENKEL CORPORATION (US) | 2005-05-10 | — | — | US | disclosed |
| EP-1526144-A1 | Screen printable hydrogel for medical applications | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-27 | — | — | EP | disclosed |
| CN-1608231-A | UV curable powder suitable for use as a photoresist | DSM NV (NL) | 2005-04-20 | — | — | CN | disclosed |
| US-20050080186-A1 | Screen printable hydrogel for medical applications | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-04-14 | — | — | US | disclosed |
| US-20050079442-A1 | Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating thereto | DUEBER THOMAS E (US) | 2005-04-14 | — | — | US | disclosed |
| US-20050058910-A1 | Hologram recording method and hologram recording material | FUJI PHOTO FILM CO., LTD. | 2005-03-17 | — | — | US | disclosed |
| EP-1514658-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY (US) | 2005-03-16 | — | — | EP | disclosed |
| US-6867271-B1 | Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces | HENKEL CORPORATION (US) | 2005-03-15 | — | — | US | disclosed |
| EP-1510318-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY (US) | 2005-03-02 | — | — | EP | disclosed |
| EP-1510862-A2 | Hologram recording method and hologram recording material | Fuji Photo Film Co., Ltd. (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-6861201-B2 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2005-03-01 | — | — | US | disclosed |
| US-20050043458-A1 | Process for manufacturing polymers | ROHM AND HAAS COMPANY | 2005-02-24 | — | — | US | disclosed |
| US-20050043453-A1 | Process for manufacturing polymers | CHANG CHING-JEN (US) | 2005-02-24 | — | — | US | disclosed |
| US-20050014091-A1 | Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes | E. I. DU PONT DE NEMOURS AND COMPANY | 2005-01-20 | — | — | US | disclosed |
| US-20050013733-A1 | Trace incorporation of fluorescent monomer facilitating quality control of polymerization reactions | CIPHERGEN BIOSYSTEMS, INC. (US) | 2005-01-20 | — | — | US | disclosed |
| US-20040245432-A1 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJI PHOTO FILM CO., LTD. | 2004-12-09 | — | — | US | disclosed |
| WO-2004106890-A2 | TRACE INCORPORATION OF FLUORESCENT MONOMER FACILITATING QUALITY CONTROL OF POLYMERIZATION REACTIONS | CIPHERGEN BIOSYSTEMS, INC. (US) | 2004-12-09 | — | — | WO | disclosed |
| EP-1483794-A2 | LATEX BASED ADSORBENT CHIP | Ciphergen Biosystems, Inc. (US) | 2004-12-08 | — | — | EP | disclosed |
| EP-1481244-A2 | MONOMERS AND POLYMERS HAVING ENERGY ABSORBING MOIETIES OF USE IN DESORPTION/IONIZATION OF ANALYTES | Ciphergen Biosystems, Inc. (US) | 2004-12-01 | — | — | EP | disclosed |
| CN-1175460-C | Plasma display panel device and method for manufacturing the same | ��Ļ���Ű˾ | 2004-11-10 | — | — | CN | disclosed |
| US-20040191690-A1 | Electrode-forming composition for field emission type of display device, and method using such a composition | E.I. DU PONT DE NEMOURS AND COMPANY | 2004-09-30 | — | — | US | disclosed |
| US-20040191681-A1 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes | WEED GREGORY C | 2004-09-30 | — | — | US | disclosed |
| EP-1447713-A1 | Electrode-forming composition for field emission type of display device and method using such a composition | E.I. du Pont de Nemours and Company (US) | 2004-08-18 | — | — | EP | disclosed |
| EP-1440348-A1 | UV CURABLE POWDER SUITABLE FOR USE AS PHOTORESIST | DSM IP Assets B.V. (NL) | 2004-07-28 | — | — | EP | disclosed |
| US-20040137728-A1 | Air gap formation | SHIPLEY COMPANY, L.L.C. (US) | 2004-07-15 | — | — | US | disclosed |
| US-6762009-B2 | FINE RESOLUTION OF LINES AND SPACES AND INCREASED SPEED OF THE MANUFACTURING PROCESSES BY INCLUDING STEARIC ACID, PALMITIC ACID, A STEARIC SALT AND/OR A PALMITIC SALT ALONG WITH PARTICLES, PHOTOINITIATOR AND CROSSLINKABLE POLYCRYLATE | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-07-13 | — | — | US | disclosed |
| EP-1435022-A1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS WITH PHOTOSPEED ENHANCER | E. I. du Pont de Nemours and Company (US) | 2004-07-07 | — | — | EP | disclosed |
| EP-1435021-A1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS FOR MAKING PHOTOIMAGEABLE BLACK ELECTRODES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-07-07 | — | — | EP | disclosed |
| EP-1435020-A2 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-07-07 | — | — | EP | disclosed |
| CN-1495877-A | FOrmation of air-gap | ϣ | 2004-05-12 | — | — | CN | disclosed |
| US-20040077783-A1 | Non-flammable and non-combustible adhesive bonding systems having adherence to low energy surfaces | HENKEL LOCTITE CORPORATION | 2004-04-22 | — | — | US | disclosed |
| EP-1409588-A2 | MOLDABLE POLY(ARYLENE ETHER) THERMOSETTING COMPOSITIONS, METHODS, AND ARTICLES | GENERAL ELECTRIC COMPANY (US) | 2004-04-21 | — | — | EP | disclosed |
| US-20040058276-A1 | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto | E. I. DU PONT DE NEMOURS AND COMPANY | 2004-03-25 | — | — | US | disclosed |
| EP-1400545-A2 | Halo resistant photoimagable coverlay compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-03-24 | — | — | EP | disclosed |
| EP-1398831-A2 | Air gaps formation | Shipley Co. L.L.C. (US) | 2004-03-17 | — | — | EP | disclosed |
| US-20040018724-A1 | Plating method | SHIPLEY COMPANY, L.L.C (US) | 2004-01-29 | — | — | US | disclosed |
| US-20030211406-A1 | Process for thick film circuit patterning | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-11-13 | — | — | US | disclosed |
| US-20030207462-A1 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | CIPHERGEN BIOSYSTEMS, INC. | 2003-11-06 | — | — | US | disclosed |
| US-20030207460-A1 | Monomers and polymers having energy absorbing moieties of use in desorption/ionization of analytes | CIPHERGEN BIOSYSTEMS, INC. | 2003-11-06 | — | — | US | disclosed |
| EP-1353228-A1 | Method for depositing a very thick photoresist layer on a substrate and metal plating method | Shipley Co. L.L.C. (US) | 2003-10-15 | — | — | EP | disclosed |
| US-6632908-B1 | Includes a (meth)acrylate component and an initiator system including an organometallic compound, a peroxy compound, an aziridine functionalized compound, and a compound having an acid functional group | HENKEL LOCTITE CORPORATION | 2003-10-14 | — | — | US | disclosed |
| WO-2003079402-A2 | LATEX BASED ADSORBENT CHIP | CIPHERGEN BIOSYSTEMS, INC. (US) | 2003-09-25 | — | — | WO | disclosed |
| US-20030170568-A1 | UV curable powder suitable for use as a photoresist | DSM IP ASSETS B.V. (NL) | 2003-09-11 | — | — | US | disclosed |
| EP-1008909-B1 | Composition for a photosensitive silver conductor tape and tape comprising the same | DU PONT (US) | 2003-08-13 | — | — | EP | disclosed |
| WO-2003064594-A2 | MONOMERS AND POLYMERS HAVING ENERGY ABSORBING MOIETIES OF USE IN DESORPTION/IONIZATION OF ANALYTES | CIPHERGEN BIOSYSTEMS, INC. (US) | 2003-08-07 | — | — | WO | disclosed |
| WO-2003062287-A1 | (METH)ACRYLATE COMPOSITIONS HAVING A SELF-INDICATOR OF CURE AND METHODS OF DETECTING CURE | HENKEL CORPORATION (US) | 2003-07-31 | — | — | WO | disclosed |
| US-20030138708-A1 | Aqueous developable photoimageable thick film compositions with photospeed enhancer | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-24 | — | — | US | disclosed |
| US-20030139488-A1 | (Meth) Acrylate compositions having a self-indicator of cure and methods of detecting cure | LOCTITE CORPORATION | 2003-07-24 | — | — | US | disclosed |
| EP-0913444-B1 | Adhesive compositions | VANTICO AG (CH) | 2003-07-09 | — | — | EP | disclosed |
| US-20030124461-A1 | Aqueous developable photoimageable thick film compositions for making photoimageable black electrodes | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-07-03 | — | — | US | disclosed |
| US-6583248-B1 | Methacrylate groups; dental cement | AMERICAN DENTAL ASSOCIATION HEALTH FOUNDATION | 2003-06-24 | — | — | US | disclosed |
| EP-1012200-B1 | EPOXY RESIN COMPOSITIONS | VANTICO AG (CH) | 2003-05-14 | — | — | EP | disclosed |
| WO-2003038527-A1 | UV CURABLE POWDER SUITABLE FOR USE AS PHOTORESIST | DSM IP ASSETS B.V. (NL) | 2003-05-08 | — | — | WO | disclosed |
| US-20030087170-A1 | Aqueous developable photoimageable thick film compositions | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-05-08 | — | — | US | disclosed |
| US-6558874-B2 | For forming an electrode arrangement for a plasma display panel device | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-05-06 | — | — | US | disclosed |
| WO-2003035703-A1 | NON-FLAMMABLE AND NON-COMBUSTIBLE ADHESIVE BONDING SYSTEMS HAVING ADHERENCE TO LOW ENERGY SURFACES | HENKEL CORPORATION (US) | 2003-05-01 | — | — | WO | disclosed |
| WO-2003034150-A1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS WITH PHOTOSPEED ENHANCER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-04-24 | — | — | WO | disclosed |
| WO-2003032087-A2 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-04-17 | — | — | WO | disclosed |
| WO-2003032088-A1 | AQUEOUS DEVELOPABLE PHOTOIMAGEABLE THICK FILM COMPOSITIONS FOR MAKING PHOTOIMAGEABLE BLACK ELECTRODES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2003-04-17 | — | — | WO | disclosed |
| US-6548602-B2 | Photosensitive film blend including comb polymer capable of hydrogen bonding, also containing an unsaturated monomer and photoinitiator system; use as photoresists or solder masks in printed circuit | E. I. DU PONT DE NEMOURS AND COMPANY | 2003-04-15 | — | — | US | disclosed |
| EP-1295518-A2 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | E. I. du Pont de Nemours and Company (US) | 2003-03-26 | — | — | EP | disclosed |
| US-20030032043-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-02-13 | — | — | US | disclosed |
| US-20030017464-A1 | Latex based adsorbent chip | CIPHERGEN BIOSYSTEMS, INC. | 2003-01-23 | — | — | US | disclosed |
| US-20030018131-A1 | Moldable poly(arylene ether) thermosetting compositions, methods, and articles | CITIBANK, N.A., AS COLLATERAL AGENT | 2003-01-23 | — | — | US | disclosed |
| WO-2003002667-A2 | MOLDABLE POLY(ARYLENE ETHER) THERMOSETTING COMPOSITIONS, METHODS, AND ARTICLES | GENERAL ELECTRIC COMPANY (US) | 2003-01-09 | — | — | WO | disclosed |
| US-20020182540-A1 | Photosensitive silver conductor tape and composition thereof | DROZDYK LORRI P (US) | 2002-12-05 | — | — | US | disclosed |
| EP-0854783-B1 | PROCESS FOR PRODUCING POLYMERIC LAYERS HAVING SELECTIVELY COLOURED REGIONS | VANTICO LTD (GB) | 2002-10-23 | — | — | EP | disclosed |
| EP-1058697-A4 | POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR | DU PONT (US) | 2002-10-16 | — | — | EP | disclosed |
| EP-0909990-B1 | Photopolymerizable compositions having improved sidewall geometry and development latitude | DU PONT (US) | 2002-10-16 | — | — | EP | disclosed |
| US-20020069777-A1 | Printing sleeves and cylinders applied with a photopolymer composition | ERMINIO ROSSINI S.P.A. | 2002-06-13 | — | — | US | disclosed |
| US-20020064728-A1 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes | E.I. DU PONT DE NEMOURS AND COMPANY | 2002-05-30 | — | — | US | disclosed |
| CN-1085628-C | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | IBM (US) | 2002-05-29 | — | — | CN | disclosed |
| US-6384104-B1 | PROVIDING STORAGE STABILITY TO ULTRAVIOLET RADIATION ABSORPTION COMPOSITIONS BY ADDING LATEX POLYMER PARTICLES TO INCREASE ABSORPTION, WHEREIN PARTICLES CONTAIN VOID, HAVE SPECIFIED PARTICLE SIZE AND COMPRISE CROSSLINKED SHELL PORTION | ROHM AND HAAS COMPANY | 2002-05-07 | — | — | US | disclosed |
| EP-0593806-B1 | Method for the preparation of a screen mesh for screen printing | SCHABLONENTECHNIK KUFSTEIN AG (AT) | 2002-04-17 | — | — | EP | disclosed |
| CN-1344302-A | Radiation curable water based cationic inks and coatings | SUN CHEMICAL CORP (US) | 2002-04-10 | — | — | CN | disclosed |
| US-6364465-B1 | PRIOR TO IMAGING TO FORM SAID INK PASSAGEWAYS, COMPRISES AN UNSATURATED COMPOUND, A PHOTOINITIATOR, AND THE POLY(AMIC ACID) PREPARED FROM AT LEAST ONE DIANHYDRIDE AND AT LEAST ONE ALIPHATIC DIAMINE. | E. I. DU PONT DE NEMOURS AND COMPANY | 2002-04-02 | — | — | US | disclosed |
| WO-2002003766-A2 | PROCESS FOR THICK FILM CIRCUIT PATTERNING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-01-10 | — | — | WO | disclosed |
| EP-1167484-A2 | Poly(arylene ether) adhesive compositions | GENERAL ELECTRIC COMPANY (US) | 2002-01-02 | — | — | EP | disclosed |
| US-20010051689-A1 | Polymeric films having controlled viscosity response to temperature and shear | FOREMAN THOMAS KEVIN (US) | 2001-12-13 | — | — | US | disclosed |
| EP-1154322-A1 | Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. | ERMINIO ROSSINI S.P.A. (IT) | 2001-11-14 | — | — | EP | disclosed |
| US-6297294-B1 | ADDING AN ADHESION PROMOTER, WHICH CONSISTS ESSENTIALLY OF A POLYCARBOXYLIC ACID HAVING THREE TO SIX CARBON ATOMS, TO THE PHOTOPOLYMERIZABLE COMPOSITION. | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-10-02 | — | — | US | disclosed |
| US-6268109-B1 | MULTILAYER; PHOTOSENSITIVE COMPOUND AND OVERCOATING | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-07-31 | — | — | US | disclosed |
| EP-1117006-A1 | Photoresist having increased photospeed | Shipley Company LLC (US) | 2001-07-18 | — | — | EP | disclosed |
| US-6228919-B1 | Solvent dispersible interpenetrating polymer networks | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-05-08 | — | — | US | disclosed |
| CN-1293032-A | Method for preparing ultra-violet absorption composition | ROHM & HAAS (US) | 2001-05-02 | — | — | CN | disclosed |
| CN-1292892-A | Continuous liquid processing of photosensitive compositions with reduced residue content | DU PONT (US) | 2001-04-25 | — | — | CN | disclosed |
| EP-1093020-A2 | Composite photosensitive element | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| EP-1092421-A2 | Method for preparing ultraviolet radiation absorbing compositions | ROHM AND HAAS COMPANY (US) | 2001-04-18 | — | — | EP | disclosed |
| US-6218074-B1 | BLEND OF BROMOPOLYMER AND OTHER ADDITION POLYMER | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-04-17 | — | — | US | disclosed |
| EP-0860742-B1 | Flexible, flame-retardant, photoimageable composition for coating printing circuits | DU PONT (US) | 2001-04-04 | — | — | EP | disclosed |
| US-6194124-B1 | Photosensitive ceramic compositions containing polycarbonate polymers | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-02-27 | — | — | US | disclosed |
| EP-1076071-A2 | Photosensitive ceramic compositions containing polycarbonate polymers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-02-14 | — | — | EP | disclosed |
| US-6187965-B1 | Process for recovering high boiling solvents from a photolithographic waste stream comprising at least 10 percent by weight of monomeric units | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-02-13 | — | — | US | disclosed |
| US-6180319-B1 | APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | disclosed |
| US-6180739-B1 | CYCLODEXTRINS WITH ACRYLATE AND ANHYDRIDES | AMERICAN DENTAL ASSOCIATION HEALTH FOUNDATION | 2001-01-30 | — | — | US | disclosed |
| US-6180323-B1 | PREPARING PHOTOPOLYMERIZABLE ELEMENT COMPRISING SUPPORT AND PHOTOPOLYMERIZABLE FORMULATION; APPLYING TO COPPER CLAD SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION; DEVELOPING TO FORM RESIST IMAGE ON COPPER CLAD SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | disclosed |
| EP-1062546-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2000-12-27 | — | — | EP | disclosed |
| EP-0858392-B1 | PROCESSES FOR PREPARING AND USING MOULDS | AVECIA LTD (GB) | 2000-12-20 | — | — | EP | disclosed |
| EP-1058697-A1 | POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-12-13 | — | — | EP | disclosed |
| EP-0822448-B1 | Flexible, flame-retardant, photoimageable composition for coating printed circuits | DU PONT (US) | 2000-11-02 | — | — | EP | disclosed |
| US-6133336-A | FORMING A SELECTIVELY COLORED POLYMERIC LAYER, OR A THREE-DIMENSIONAL ARTICLE MADE OF POLYMERIC LAYERS, WHEREIN A PHOTOCURABLE PHOTOCOLORABLE COMPOSITION IS IRRADIATED WITH A LOW DOSE OF LIGHT TO CURE AND A HIGHER DOSE OF LIGHT TO COLOR | ZENECA LIMITED (GB) | 2000-10-17 | — | — | US | disclosed |
| EP-0582538-B1 | Propylene carbonate recovery process | IBM (US) | 2000-10-11 | — | — | EP | disclosed |
| EP-0740210-B1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-10-04 | — | — | EP | disclosed |
| US-6127097-A | EXPOSING PHOTORESIST FILM ON SUBSTRATE TO RADIATION TO CROSSLINK, DEVELOPING IN BENZYL ALCOHOL, FORMING COPPER CIRCUIT PATTERN, STRIPPING PHOTORESIST IN SOLUTION OF BENZYL ALCOHOL AND ADDITIONAL SOLVENT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-10-03 | — | — | US | disclosed |
| EP-0740212-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 2000-09-13 | — | — | EP | disclosed |
| US-6086795-A | PHOTOCURABLE | CIBA SPECIALTY CHEMICALS CORP. (US) | 2000-07-11 | — | — | US | disclosed |
| EP-1012200-A1 | EPOXY RESIN COMPOSITIONS | Ciba Specialty Chemicals Holding Inc. (CH) | 2000-06-28 | — | — | EP | disclosed |
| WO-2000036625-A1 | BARRIER RIB FORMATION FOR PLASMA DISPLAY PANELS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-06-22 | — | — | WO | disclosed |
| EP-1008909-A1 | Composition for a photosensitive silver conductor tape and tape comprising the same | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2000-06-14 | — | — | EP | disclosed |
| US-6075319-A | Plasma display panel device and method of fabricating the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-06-13 | — | — | US | disclosed |
| US-6054536-A | ACRYLATED RESIN; CURABLE COATINGS | CIBA SPECIALTY CHEMICALS CORP. (US) | 2000-04-25 | — | — | US | disclosed |
| EP-0624580-B1 | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KK (JP) | 2000-02-09 | — | — | EP | disclosed |
| US-6001298-A | Method for making a mould | ZENECA LIMITED (GB) | 1999-12-14 | — | — | US | disclosed |
| US-5994597-A | Process for recovering high boiling solvents from a photolithographic waste stream comprising less than 10 percent by weight monomeric units | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-11-30 | — | — | US | disclosed |
| US-5985998-A | POLYMERS AND CROSSLINKING IN SOLVENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-11-16 | — | — | US | disclosed |
| US-5981740-A | Polymerizable cyclodextrin derivatives for use in dental applications | AMERICAN DENTAL ASSOCIATION HEALTH (US) | 1999-11-09 | — | — | US | disclosed |
| US-5962190-A | BINDER OF C4-10 ALKYL METHACRYLATE, C4-10 ALKYL ACRYLATE, METHYL METHACRYLATE OR ETHYL METHACRYLATE, METHACRYLIC ACID OR ACRYLIC ACID, AND STYRENE; UNSATURATED CROSSLINKING AGENT; PHOTOINITIATOR; RELIEF IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-10-05 | — | — | US | disclosed |
| WO-1999046644-A1 | PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-09-16 | — | — | WO | disclosed |
| WO-1999045045-A1 | POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-09-10 | — | — | WO | disclosed |
| EP-0740211-B1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-08-18 | — | — | EP | disclosed |
| US-5929131-A | Polymerizable cyclodextrin derivatives | AMERICAN DENTAL ASSOCIATION HEALTH FOUNDATION (US) | 1999-07-27 | — | — | US | disclosed |
| US-5910551-A | Polymerizable cyclodextrin derivatives | AMERICAN DENTAL ASSOCIATION HEALTH FOUNDATION (US) | 1999-06-08 | — | — | US | disclosed |
| EP-0913444-A2 | Adhesive compositions | Ciba SC Holding AG (CH) | 1999-05-06 | — | — | EP | disclosed |
| EP-0589241-B1 | Photosensitive dielectric sheet composition and multilayer interconnect circuits | DU PONT (US) | 1999-04-28 | — | — | EP | disclosed |
| EP-0487086-B1 | Volume phase hologram comprising a photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KK (JP) | 1999-04-21 | — | — | EP | disclosed |
| EP-0600262-B1 | Aqueous processable, multilayer photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-04-21 | — | — | EP | disclosed |
| EP-0909990-A2 | Photopolymerizable compositions having improved sidewall geometry and development latitude | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-04-21 | — | — | EP | disclosed |
| US-5886101-A | TWO INTERPENETRATING CROSSLINKED POLYMERS, AT LEAST ONE OF WHICH IS FORMED BY SOLVENT POLYMERIZATION; PHOTOSENSITIVE BINDERS OR SOLDER MASKS; PHOTORESISTS; PROTECTIVE AND DECORATIVE COATINGS; TOUGHNESS; FLEXIBILITY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-03-23 | — | — | US | disclosed |
| WO-1999011691-A1 | EPOXY RESIN COMPOSITIONS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 1999-03-11 | — | — | WO | disclosed |
| US-5879837-A | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1999-03-09 | — | — | US | disclosed |
| US-5869210-A | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1999-02-09 | — | — | US | disclosed |
| EP-0889363-A1 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-01-07 | — | — | EP | disclosed |
| US-5851732-A | Plasma display panel device fabrication utilizing black electrode between substrate and conductor electrode | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-12-22 | — | — | US | disclosed |
| EP-0499485-B1 | Method of forming solid objects | DU PONT (US) | 1998-10-28 | — | — | EP | disclosed |
| CN-1197281-A | Plasma display panel device and method for producing the same | DU PONT (US) | 1998-10-28 | — | — | CN | disclosed |
| EP-0628180-B1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | DU PONT (US) | 1998-09-16 | — | — | EP | disclosed |
| EP-0863534-A2 | Plasma display panel device and method of fabricating the same | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-09-09 | — | — | EP | disclosed |
| EP-0860742-A1 | Flexible, flame-retardant, photoimageable composition for coating printing circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-08-26 | — | — | EP | disclosed |
| EP-0858392-A2 | PROCESSES FOR PREPARING AND USING MOULDS | ZENECA LIMITED (GB) | 1998-08-19 | — | — | EP | disclosed |
| US-5792821-A | Polymerizable cyclodextrin derivatives | AMERICAN DENTAL ASSOCIATION HEALTH FOUNDATION (US) | 1998-08-11 | — | — | US | disclosed |
| EP-0568853-B1 | Photoenhanced diffusion patterning for organic polymer films | DU PONT (US) | 1998-08-05 | — | — | EP | disclosed |
| EP-0854783-A1 | PROCESS FOR PRODUCING POLYMERIC LAYERS HAVING SELECTIVELY COLOURED REGIONS | ZENECA LIMITED (GB) | 1998-07-29 | — | — | EP | disclosed |
| US-5776634-A | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1998-07-07 | — | — | US | disclosed |
| EP-0666504-B1 | Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture | DU PONT (US) | 1998-06-03 | — | — | EP | disclosed |
| US-5741621-A | PHOTORESISTS, SOLDER MASKS, PRINTING PLATES, PROOFING FILM PRODUCTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-04-21 | — | — | US | disclosed |
| CN-1038069-C | Solid imaging system | JEIJIN LTD (JP) | 1998-04-15 | — | — | CN | disclosed |
| US-5728505-A | FLEXIBLE PHOTOPOLYMERIZABLE COATING WITH ALKALINE DEVELOPERS FOR PROTECTIVE COATINGS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-17 | — | — | US | disclosed |
| EP-0822448-A1 | Flexible, flame-retardant, photoimageable composition for coating printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-02-04 | — | — | EP | disclosed |
| CN-1037212-C | Photosensitive aqueous developable ceramic coating composition | E I DU PONT NEMOUS AND CO (US) | 1998-01-28 | — | — | CN | disclosed |
| US-5643657-A | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1997-07-01 | — | — | US | disclosed |
| EP-0676669-B1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | DU PONT (US) | 1997-06-18 | — | — | EP | disclosed |
| US-5637442-A | REMOVING THE FUMES THROUGH AQUEOUS ALKALINE LIQUID | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-06-10 | — | — | US | disclosed |
| WO-1997017190-A2 | PROCESSES FOR PREPARING AND USING MOULDS | ZENECA LIMITED (GB) | 1997-05-15 | — | — | WO | disclosed |
| EP-0501433-B1 | Photosensitive compositions using solvent dispersible interpenetrating polymer networks | DU PONT (US) | 1997-05-07 | — | — | EP | disclosed |
| EP-0499486-B1 | Investment casting method and pattern material | DU PONT (US) | 1997-05-02 | — | — | EP | disclosed |
| EP-0584030-B1 | Process for the abatement of propylene carbonate emissions | IBM (US) | 1997-03-19 | — | — | EP | disclosed |
| WO-1997009168-A1 | PROCESS FOR PRODUCING POLYMERIC LAYERS HAVING SELECTIVELY COLOURED REGIONS | ZENECA LIMITED (GB) | 1997-03-13 | — | — | WO | disclosed |
| CN-1033955-C | Solid imaging system using incremental photoforming | TEIJIN MACHINE MFG KK (US) | 1997-02-05 | — | — | CN | disclosed |
| EP-0747769-A2 | Process for producing photoimageable films prepared from aqueous photoimageable liquid emulsions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-12-11 | — | — | EP | disclosed |
| US-5571417-A | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-11-05 | — | — | US | disclosed |
| EP-0740211-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740212-A1 | Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| EP-0740210-A1 | Flexible, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-10-30 | — | — | EP | disclosed |
| CN-1132359-A | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | IBM (US) | 1996-10-02 | — | — | CN | disclosed |
| US-5557308-A | ORGANOPHOSPHITE, PHOSPHINE, PHOSPHATE, PHOSPHORUS OXIDE, ORPHOSPHORUS SULFIDE COMPOUNDS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-09-17 | — | — | US | disclosed |
| US-5552009-A | STAMPERS | U.S. PHILIPS CORPORATION (US) | 1996-09-03 | — | — | US | disclosed |
| US-5536620-A | ACRYLIC, POLYURETHANE ACRYLATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-07-16 | — | — | US | disclosed |
| EP-0720059-A2 | Method for treating photolithography developer and stripper waste streams containing resist and gamma butyrolactone or benzyl alcohol | International Business Machines Corporation (US) | 1996-07-03 | — | — | EP | disclosed |
| EP-0439050-B1 | Method for making optically readable media containing embossed information | DU PONT (US) | 1996-04-03 | — | — | EP | disclosed |
| CN-1031114-C | Method and apparatus for making three-dimensional objects from a photoformable precursor sheet | TEIJIN SEIKI CO LTD (JP) | 1996-02-28 | — | — | CN | disclosed |
| EP-0691206-A2 | Ink jet printhead photoresist layer having improved adhesion characteristics | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1996-01-10 | — | — | EP | disclosed |
| EP-0405568-B1 | Direct effect master/stamper for optical recording | PHILIPS ELECTRONICS NV (NL) | 1995-12-27 | — | — | EP | disclosed |
| EP-0400578-B1 | Method and apparatus for maintaining desired exposure levels | DU PONT (US) | 1995-12-13 | — | — | EP | disclosed |
| US-5474719-A | Coating surface with layer of viscosity reduced photoformable material, allowing viscosity to increase, imagewise exposing to radiation, repeating until three-dimensional object is formed | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-12-12 | — | — | US | disclosed |
| EP-0606402-B1 | LAMINATION OF A PHOTOPOLYMERIZABLE SOLDER MASK LAYER TO A SUBSTRATE CONTAINING HOLES USING AN INTERMEDIATE PHOTOPOLYMERIZABLE LIQUID LAYER | DU PONT (US) | 1995-12-06 | — | — | EP | disclosed |
| US-5466319-A | Method for making optically readable media containing embossed information | U.S. PHILIPS CORPORATION (US) | 1995-11-14 | — | — | US | disclosed |
| EP-0414169-B1 | Photosensitive semi-aqueous developable gold conductor composition | DU PONT (US) | 1995-11-08 | — | — | EP | disclosed |
| EP-0676669-A1 | Pliable, aqueous processable, photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-10-11 | — | — | EP | disclosed |
| EP-0467097-B1 | Method and apparatus for fabricating three dimensional objects from photoformed precursor sheets | DU PONT (US) | 1995-09-27 | — | — | EP | disclosed |
| EP-0393677-B1 | Solid imaging system | DU PONT (US) | 1995-09-13 | — | — | EP | disclosed |
| US-5443677-A | Apparatus for manufacturing a screen printing stencil | SCHABLONENTECHNIK KUFSTEIN GES. M.B.H. (AT) | 1995-08-22 | — | — | US | disclosed |
| EP-0666504-A1 | Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-08-09 | — | — | EP | disclosed |
| EP-0414168-B1 | Photosensitive semi-aqueous developable copper conductor composition | DU PONT (US) | 1995-08-09 | — | — | EP | disclosed |
| EP-0393675-B1 | Solid imaging method using photohardenable materials of self limiting thickness | DU PONT (US) | 1995-08-02 | — | — | EP | disclosed |
| EP-0393674-B1 | Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation | DU PONT (US) | 1995-08-02 | — | — | EP | disclosed |
| EP-0393676-B1 | Solid imaging method using photohardenable compositions containing hollow spheres | DU PONT (US) | 1995-08-02 | — | — | EP | disclosed |
| EP-0393672-B1 | Additives imparting reduction of shrinkage to photohardenable compositions | DU PONT (US) | 1995-07-26 | — | — | EP | disclosed |
| EP-0393673-B1 | Solid imaging method using multiphasic photohardenable compositions | DU PONT (US) | 1995-07-12 | — | — | EP | disclosed |
| EP-0403758-B1 | Solid imaging method using compositions containing core-shell polymers | DU PONT (US) | 1995-07-05 | — | — | EP | disclosed |
| EP-0658812-A1 | Process for the preparation of a printing screen | Schablonentechnik Kufstein Aktiengesellschaft (AT) | 1995-06-21 | — | — | EP | disclosed |
| EP-0465273-B1 | Solid imaging system using inhibition of photohardening | DU PONT (US) | 1995-06-07 | — | — | EP | disclosed |
| EP-0414166-B1 | Photosensitive aqueous developable gold conductor composition | DU PONT (US) | 1995-05-10 | — | — | EP | disclosed |
| EP-0435564-B1 | Solid imaging system | DU PONT (US) | 1995-04-26 | — | — | EP | disclosed |
| EP-0414167-B1 | Photosensitive aqueous developable copper conductor composition | DU PONT (US) | 1995-04-19 | — | — | EP | disclosed |
| US-5407783-A | Thermostability, shelf life | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-04-18 | — | — | US | disclosed |
| US-5405731-A | Hydrophobic binder and addition polymer in protective layer with photoimageable coating containing carboxylic and unsaturated comonomers, photoinitiator and thermal crosslinking agent, for resistance to molten solder | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-04-11 | — | — | US | disclosed |
| EP-0414215-B1 | Solid imaging method utilizing compositions comprising thermally coalescible materials | DU PONT (US) | 1995-03-01 | — | — | EP | disclosed |
| EP-0467100-B1 | Solid imaging system using incremental photoforming | DU PONT (US) | 1995-02-22 | — | — | EP | disclosed |
| US-5384007-A | Process for manufacturing a screen printing stencil | SCHABLONENTECHNIK KUESTEIN GES. M.B.H. (AT) | 1995-01-24 | — | — | US | disclosed |
| EP-0628180-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-12-14 | — | — | EP | disclosed |
| EP-0624580-A1 | Styrylcoumarin compound, photosensitive resin composition, and hologram recording medium | CANON KABUSHIKI KAISHA (JP) | 1994-11-17 | — | — | EP | disclosed |
| US-5364889-A | Investment casting pattern material comprising thermally-collapsible expanded microspheres | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-11-15 | — | — | US | disclosed |
| EP-0436352-B1 | Solid imaging method and apparatus | DU PONT (US) | 1994-08-10 | — | — | EP | disclosed |
| EP-0606402-A1 | LAMINATION OF A PHOTOPOLYMERIZABLE SOLDER MASK LAYER TO A SUBSTRATE CONTAINING HOLES USING AN INTERMEDIATE PHOTOPOLYMERIZABLE LIQUID LAYER. | DU PONT (US) | 1994-07-20 | — | — | EP | disclosed |
| EP-0605350-A1 | Solvent stabilization process and method of recovering solvent | International Business Machines Corporation (US) | 1994-07-06 | — | — | EP | disclosed |
| EP-0600262-A2 | Aqueous processable, multilayer photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-06-08 | — | — | EP | disclosed |
| US-5310428-A | Adding quinone thermal polymerization inhibitor | INERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-05-10 | — | — | US | disclosed |
| WO-1994009013-A1 | DUAL CURING CONFORMAL COATINGS | CASCHEM, INC. (US) | 1994-04-28 | — | — | WO | disclosed |
| EP-0593806-A1 | Method for the preparation of a screen mesh for screen printing | Schablonentechnik Kufstein Aktiengesellschaft (AT) | 1994-04-27 | — | — | EP | disclosed |
| EP-0324480-B1 | Photopolymerizable compositions and elements for refractive index imaging | DU PONT (US) | 1994-04-13 | — | — | EP | disclosed |
| EP-0589241-A2 | Photosensitive dielectric sheet composition and multilayer interconnect circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-03-30 | — | — | EP | disclosed |
| EP-0584030-A1 | Process for the abatement of propylene carbonate emissions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-23 | — | — | EP | disclosed |
| US-5288589-A | Storage stability | E.I. DU PONT DE NEMOURS AND COMPANY | 1994-02-22 | — | — | US | disclosed |
| EP-0347615-B1 | Photosensitive semi-aqueous developable ceramic coating composition | DU PONT (US) | 1994-02-16 | — | — | EP | disclosed |
| EP-0582538-A2 | Propylene carbonate recovery process | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-09 | — | — | EP | disclosed |
| EP-0582539-A1 | Chemical pre-treatment and biological destruction of propylene carbonate waste effluent streams to reduce the biological oxygen demand thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-02-09 | — | — | EP | disclosed |
| US-5281723-A | Propylene carbonate recovery process | INTERNATIONAL BUSINESS MACHINES (US) | 1994-01-25 | — | — | US | disclosed |
| US-5279689-A | Laminating film to dimensionally stable transparent substrate; embossing in relief image; applying actinic radiation | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-01-18 | — | — | US | disclosed |
| EP-0347616-B1 | Photosensitive aqueous developable ceramic coating composition | DU PONT (US) | 1994-01-12 | — | — | EP | disclosed |
| US-5275734-A | Chemical pre-treatment and biological destruction of propylene carbonate waste streams effluent streams to reduce the biological oxygen demand thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-01-04 | — | — | US | disclosed |
| EP-0573609-A1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-12-15 | — | — | EP | disclosed |
| EP-0260590-B1 | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | DU PONT (US) | 1993-12-15 | — | — | EP | disclosed |
| US-5268260-A | Free radical initiated addition polymerizable acrylate monomer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-12-07 | — | — | US | disclosed |
| EP-0569762-A1 | Pattern formation in photohardenable dielectric layers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-18 | — | — | EP | disclosed |
| EP-0568853-A1 | Photoenhanced diffusion patterning for organic polymer films | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-10 | — | — | EP | disclosed |
| US-5260163-A | Photoenhanced diffusion patterning for organic polymer films | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| US-5260149-A | Exposing first to a modulated coherent radiation to form hologram, and then to actinic radiation to fix it | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-09 | — | — | US | disclosed |
| WO-1993017368-A1 | PLIABLE, AQUEOUS PROCESSABLE, PHOTOIMAGEABLE PERMANENT COATINGS FOR PRINTED CIRCUITS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-09-02 | — | — | WO | disclosed |
| US-5240817-A | Using unsaturated monomer and photoinitiator | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-31 | — | — | US | disclosed |
| US-5236812-A | Solid imaging method and apparatus | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-17 | — | — | US | disclosed |
| US-5236326-A | Exposure to actiinic radiation to form hardned layer and create an inhibition layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-08-17 | — | — | US | disclosed |
| WO-1993013638-A1 | LAMINATION OF A PHOTOPOLYMERIZABLE SOLDER MASK LAYER TO A SUBSTRATE CONTAINING HOLES USING AN INTERMEDIATE PHOTOPOLYMERIZABLE LIQUID LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-07-08 | — | — | WO | disclosed |
| CN-1021448-C | PHOTOPOLYMERIZABLE COMPOSITION HAVING SUPERIOR ADHESION | DU PONT (US) | 1993-06-30 | — | — | CN | disclosed |
| EP-0237985-B1 | IMPROVED SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION AND PROCESS OF USE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-06-09 | — | — | EP | disclosed |
| EP-0324481-B1 | STORAGE STABLE PHOTOPOLYMERIZABLE COMPOSITION FOR REFRACTIVE INDEX IMAGING | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-05-05 | — | — | EP | disclosed |
| EP-0324482-B1 | PROCESS OF FORMING REFLECTION HOLOGRAMS IN PHOTOPOLYMERIZABLE LAYERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-31 | — | — | EP | disclosed |
| US-5194365-A | Method for forming images | CIBA-GEIGY CORPORATION (US) | 1993-03-16 | — | — | US | disclosed |
| US-5188863-A | Direct effect master/stamper for optical recording | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-02-23 | — | — | US | disclosed |
| US-5176188-A | INVESTMENT CASTING METHOD AND PATTERN MATERIAL COMPRISING THERMALLY-COLLAPSIBLE EXPANDED MICROSPHERES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-05 | — | — | US | disclosed |
| US-5175077-A | Prevention adhesion at interface of radiation transparent barrier | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-12-29 | — | — | US | disclosed |
| CN-1067319-A | Form the method for the stable hologram of light | DU PONT (US) | 1992-12-23 | — | — | CN | disclosed |
| CN-1065468-A | Can be scattered in the interpenetrating polymer networks of solvent | DU PONT (US) | 1992-10-21 | — | — | CN | disclosed |
| WO-1992015628-A1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-17 | — | — | WO | disclosed |
| EP-0501433-A1 | Solvent dispersible interpenetrating polymer networks | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-02 | — | — | EP | disclosed |
| US-5143817-A | SOLID IMAGING SYSTEM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-01 | — | — | US | disclosed |
| EP-0499486-A2 | Investment casting method and pattern material | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-08-19 | — | — | EP | disclosed |
| EP-0499485-A2 | Method and apparatus for forming solid objects | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-08-19 | — | — | EP | disclosed |
| US-5128235-A | METHOD OF FORMING A THREE-DIMENSIONAL OBJECT COMPRISING ADDITIVES IMPARTING REDUCTION OF SHRINKAGE TO PHOTOHARDENABLE COMPOSITIONS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-07-07 | — | — | US | disclosed |
| EP-0243933-B1 | PHOTOHARDENABLE MIXTURE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-24 | — | — | EP | disclosed |
| EP-0236950-B1 | ADHESION PROMOTION IN PHOTORESIST LAMINATION AND PROCESSING | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-06-03 | — | — | EP | disclosed |
| EP-0487086-A1 | Photosensitive recording medium and method of preparing volume type phase hologram member using same | CANON KABUSHIKI KAISHA (JP) | 1992-05-27 | — | — | EP | disclosed |
| EP-0217137-B1 | PHOTOPOLYMERIZABLE COMPOSITION OF ACRYLIC COPOLYMER CONTAINING DICYCLOPENTENYL ACRYLATE OR METHACRYLATE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-04-08 | — | — | EP | disclosed |
| US-5098803-A | Photopolymerization of a composition for holographic multilayer element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-03-24 | — | — | US | disclosed |
| US-5094935-A | METHOD AND APPARATUS FOR FABRICATING THREE DIMENSIONAL OBJECTS FROM PHOTOFORMED PRECURSOR SHEETS | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1992-03-10 | — | — | US | disclosed |
| EP-0467100-A1 | Solid imaging system using incremental photoforming | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-01-22 | — | — | EP | disclosed |
| EP-0467097-A1 | Method and apparatus for fabricating three dimensional objects from photoformed precursor sheets | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-01-22 | — | — | EP | disclosed |
| EP-0186163-B1 | PHOTOSENSITIVE CERAMIC COATING COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-01-15 | — | — | EP | disclosed |
| EP-0465273-A2 | Solid imaging system using inhibition of photohardening | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-01-08 | — | — | EP | disclosed |
| CN-1057724-A | Utilize the solid imaging system of incremental photoforming | DU PONT (US) | 1992-01-08 | — | — | CN | disclosed |
| CN-1057723-A | Make the method and apparatus of three-dimensional object from Seterolithography precursor sheet material | DU PONT (US) | 1992-01-08 | — | — | CN | disclosed |
| US-5073462-A | Half acryloyl ester of bisphenol a, initiator, elastomeric bin der | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-17 | — | — | US | disclosed |
| EP-0247549-B1 | PHOTOPOLYMERIZABLE COMPOSITION CONTAINING CARBOXY BENZOTRIAZOLE | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-11-27 | — | — | EP | disclosed |
| EP-0186114-B1 | PHOTOSENSITIVE CONDUCTIVE METAL COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-16 | — | — | EP | disclosed |
| CN-1054840-A | The method for production that contains the optically-readable media of embossed information | DU PONT (US) | 1991-09-25 | — | — | CN | disclosed |
| US-5051334-A | Forming a layer of a photohardenable liquid, exposure to actinic radiation and hardening | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-09-24 | — | — | US | disclosed |
| US-5049480-A | Photopolymerizaable composition containing sodium carbonate | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-09-17 | — | — | US | disclosed |
| EP-0210637-B1 | OPTICAL COATING COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-09-11 | — | — | EP | disclosed |
| US-5047313-A | Acrylic Polymer Binder | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-09-10 | — | — | US | disclosed |
| EP-0439050-A2 | Method for making optically readable media containing embossed information | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-31 | — | — | EP | disclosed |
| US-5035980-A | Thick film pastes, screen printing, acrylic acid-acrylic ester binder | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-30 | — | — | US | disclosed |
| US-5032478-A | Resolution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-16 | — | — | US | disclosed |
| US-5032490-A | Photosensitive aqueous developable copper conductor composition | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-16 | — | — | US | disclosed |
| EP-0436352-A2 | Solid imaging method and apparatus | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-10 | — | — | EP | disclosed |
| EP-0435564-A2 | Solid imaging system | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-07-03 | — | — | EP | disclosed |
| CN-1012961-B | Photopolymerizable composition containing inorganic filler | DU PONT (US) | 1991-06-26 | — | — | CN | disclosed |
| CN-1052558-A | Can carry out the photopolymerization composition that can produce metallic ion of water treatment in the photolysis mode | DU PONT (US) | 1991-06-26 | — | — | CN | disclosed |
| EP-0427249-A2 | Aqueous processible photopolymerizable compositions capable of photolytically generating metal ions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-05-15 | — | — | EP | disclosed |
| US-5015555-A | Adhesion, flexibility | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-05-14 | — | — | US | disclosed |
| US-5014207-A | Solid imaging system | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-05-07 | — | — | US | disclosed |
| CN-1050620-A | In photopolymer, form the holographic optical elements (HOE) of reflection hologram | DU PONT (US) | 1991-04-10 | — | — | CN | disclosed |
| US-5006364-A | Accurate, three-dimensional models; cycles of applying liquid, exposure to actinic radiation | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-04-09 | — | — | US | disclosed |
| CN-1050447-A | The photosensitive copper conductor composite of aqueous developable | DU PONT (US) | 1991-04-03 | — | — | CN | disclosed |
| US-5002854-A | Radiation Deflection | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-03-26 | — | — | US | disclosed |
| US-5002855-A | Polymeaization with actinic radiation of liquid monomer containing deflector | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-03-26 | — | — | US | disclosed |
| EP-0414168-A2 | Photosensitive semi-aqueous developable copper conductor composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-02-27 | — | — | EP | disclosed |
| EP-0414215-A2 | Solid imaging method utilizing compositions comprising thermally coalescible materials | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-02-27 | — | — | EP | disclosed |
| EP-0414166-A2 | Photosensitive aqueous developable gold conductor composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-02-27 | — | — | EP | disclosed |
| US-4994347-A | Polymeric binder, n-vinyl carbazole and photoinitiator system | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-02-19 | — | — | US | disclosed |
| CN-1048932-A | Carry out the method for solid state image with heterogeneous photohardenable compositions | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| CN-1048935-A | The composition that utilization contains core-shell polymer carries out the method for solid state image | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| CN-1048934-A | Utilize the solid imaging method of the photohardenable materials of self limiting thickness | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| CN-1048933-A | Utilization contains the method for solid state image of the photohardenable compositions of hollow ball | DU PONT (US) | 1991-01-30 | — | — | CN | disclosed |
| US-4987044-A | Method and apparatus for maintaining desired exposure levels | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-22 | — | — | US | disclosed |
| CN-1048458-A | Be used to look squarely the improvement holographic optics combiner of demonstration | DU PONT (US) | 1991-01-09 | — | — | CN | disclosed |
| EP-0405568-A2 | Direct effect master/stamper for optical recording | Koninklijke Philips Electronics N.V. (NL) | 1991-01-02 | — | — | EP | disclosed |
| EP-0405582-A2 | Method for making optically readable media containing embossed information | Koninklijke Philips Electronics N.V. (NL) | 1991-01-02 | — | — | EP | disclosed |
| EP-0404099-A2 | Improved holographic optical combiners for head-up displays | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0403758-A2 | Solid imaging method using compositions containing core-shell polymers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0404098-A2 | Holographic optical elements having a reflection hologram formed in a photopolymer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-27 | — | — | EP | disclosed |
| CN-1047927-A | The method and apparatus that keeps desired exposure levels | DU PONT (US) | 1990-12-19 | — | — | CN | disclosed |
| EP-0400578-A2 | Method and apparatus for maintaining desired exposure levels | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-12-05 | — | — | EP | disclosed |
| CN-1046613-A | Utilization realizes the method for solid state image by the photohardenable compositions of the self limiting thickness that is separated | DU PONT (US) | 1990-10-31 | — | — | CN | disclosed |
| CN-1046615-A | SOLID IMAGING SYSTEM | DU PONT (US) | 1990-10-31 | — | — | CN | disclosed |
| CN-1046614-A | The adjuvant that the photohardenable compositions shrinkage factor is reduced | DU PONT (US) | 1990-10-31 | — | — | CN | disclosed |
| EP-0393676-A1 | Solid imaging method using photohardenable compositions containing hollow spheres | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0393675-A1 | Solid imaging method using photohardenable materials of self limiting thickness | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0393672-A2 | Additives imparting reduction of shrinkage to photohardenable compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0393673-A2 | Solid imaging method using multiphasic photohardenable compositions | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0393674-A1 | Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| EP-0230936-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING MICROGELS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-10-24 | — | — | EP | disclosed |
| US-4959295-A | ADMIXTURE OF FINE CERAMIC SOLIDS, INORGANIC AND ORGANIC POLYMERIC BINDERS, PHOTOINITIATOR, PHOTOHARDENING MONOMER, AND ORGANIC MEDIUM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-09-25 | — | — | US | disclosed |
| EP-0382936-A2 | Elimination of voids in vacuum-laminated solder mask-coated printed-circuit boards by fluid pressurizing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-08-22 | — | — | EP | disclosed |
| US-4950567-A | Holographic optical combiners for head-up displays | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-08-21 | — | — | US | disclosed |
| US-4948704-A | CROSSLINKING WITH METAL COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-08-14 | — | — | US | disclosed |
| US-4942112-A | HOLOGRAPHY, BINDERS, MONOMERS AND PHOTOINITIATORS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| US-4942060-A | THREE-DIMENSIONAL OBJECT FORMED FROM LIGHT SENSITIVE LIQUID COMPOSITION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| US-4942066-A | ACTINIC RADIATION, MULTILAYER, PHOTOINITIATORS, HARDENING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| US-4942102-A | MULTILAYER OPTICAL ELEMENT, BINDER OF POLYVINYL ACETAL, AN UNSATURATED MONOMER AND A PHOTOINITIATOR | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-17 | — | — | US | disclosed |
| CN-1043798-A | Make bubble-free, as to have applied liquid solder mask printed circuit board (PCB) by pressurized with fluid | DU PONT (US) | 1990-07-11 | — | — | CN | disclosed |
| CN-1043799-A | Do not have bubble with the pressurized with fluid manufactured, the printed circuit board (PCB) of film/liquid solder mask coating is arranged | DU PONT (US) | 1990-07-11 | — | — | CN | disclosed |
| EP-0214103-B1 | ADHESIVELY BONDED PHOTOSTRUCTURABLE POLYIMIDE FOIL | CIBA-GEIGY AG (CH) | 1990-06-27 | — | — | EP | disclosed |
| US-4937172-A | HALF ACRYLOYL ESTER OF BISPHENOL A EPOXY MONOMER, PHOTOINITIATOR, ELASTOMER BINDER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-06-26 | — | — | US | disclosed |
| US-4935320-A | Substrate, thermostable adhesive, self-supporting, photocrosslinkable polyimide film | CIBA-GEIGY CORPORATION (US) | 1990-06-19 | — | — | US | disclosed |
| US-4927733-A | Conformation of vacuum - laminated solder mask coated printed circuit boards by fluid pressurizing | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-05-22 | — | — | US | disclosed |
| US-4925771-A | USING ACRYLIC POLYMER BINDER | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1990-05-15 | — | — | US | disclosed |
| US-4912019-A | Ceramic particles in binder | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-03-27 | — | — | US | disclosed |
| US-4908296-A | Particles of ceramic solids, inorganic binder, polymeric binder comprising acrylate and ethylenically unsaturated acid, photoinitiator, photohardenable monomer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-03-13 | — | — | US | disclosed |
| CN-1039488-A | The water-soluble light sensitive ceramics clad compositions that can develop | DU PONT (US) | 1990-02-07 | — | — | CN | disclosed |
| US-4892802-A | Positive working tonable film having a photohardenable layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-09 | — | — | US | disclosed |
| EP-0096861-B1 | PROCESS AND APPARATUS FOR AUTOMATIC REPETITIVE REGISTRATION AND IMAGEWISE EXPOSURE OF SHEET SUBSTRATES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-01-03 | — | — | EP | disclosed |
| EP-0131299-B1 | CONTROLLED ROUGHENING OF PHOTOSENSITIVE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-12-13 | — | — | EP | disclosed |
| US-4877818-A | PHOTORESISTS | ROHM AND HAAS COMPANY (US) | 1989-10-31 | — | — | US | disclosed |
| CN-1036083-A | In photopolymerizable layer, form the method for reflection hologram | DU PONT (US) | 1989-10-04 | — | — | CN | disclosed |
| EP-0193621-B1 | PHOTOPOLYMERIZABLE COMPOSITIONS AND ELEMENTS CONTAINING ACID TO REDUCE SCUM AND STAIN FORMATION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-09-27 | — | — | EP | disclosed |
| CN-1035364-A | PHOTOPOLYMERIZABLE COMPOSITIONS AND ELEMENTS FOR REFRACTIVE INDEX IMAGING | DU PONT (US) | 1989-09-06 | — | — | CN | disclosed |
| CN-1035004-A | The refractive index imaging photopolymerization material of stable storage | DU PONT (US) | 1989-08-23 | — | — | CN | disclosed |
| US-4857437-A | Process for the formation of an image | CIBA-GEIGY CORPORATION (US) | 1989-08-15 | — | — | US | disclosed |
| EP-0160621-B1 | CURABLE COMPOSITIONS | CIBA-GEIGY AG (CH) | 1989-08-09 | — | — | EP | disclosed |
| EP-0324481-A2 | Storage stable photopolymerizable composition for refractive index imaging | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-19 | — | — | EP | disclosed |
| EP-0324480-A2 | Photopolymerizable compositions and elements for refractive index imaging | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-19 | — | — | EP | disclosed |
| EP-0324482-A2 | Process of forming reflection holograms in photopolymerizable layers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-19 | — | — | EP | disclosed |
| US-4849320-A | Method of forming images | CIBA-GEIGY CORPORATION (US) | 1989-07-18 | — | — | US | disclosed |
| US-4836878-A | Method of adhering two surfaces with an anaerobically polymerizable acrylic ester composition | CIBA-GEIGY CORPORATION (US) | 1989-06-06 | — | — | US | disclosed |
| US-4814257-A | PHOTOHARDENING ACRYLATE ESTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-03-21 | — | — | US | disclosed |
| EP-0096863-B1 | PROCESS OF REGISTERING AND EXPOSING SHEET SUBSTRATES USING PHOTOSENSITIVE LIQUID | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-02-22 | — | — | EP | disclosed |
| US-4786569-A | Adhesively bonded photostructurable polyimide film | CIBA-GEIGY CORPORATION (US) | 1988-11-22 | — | — | US | disclosed |
| EP-0176356-B1 | PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES | ROHM AND HAAS COMPANY (US) | 1988-11-02 | — | — | EP | disclosed |
| US-4776992-A | Process for production of molded composites | CIBA-GEIGY CORPORATION (US) | 1988-10-11 | — | — | US | disclosed |
| EP-0284642-A2 | Increased photopolymer photospeed employing yellow light preexposure | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-10-05 | — | — | EP | disclosed |
| CN-87106835-A | Photosensitive polymerization film and the laminating method that scribbles photosensitivity liquid ground | — | 1988-10-05 | — | — | CN | disclosed |
| CN-87108226-A | Photopolymerizable composition having excellent adhesive property, and article and method for preparing the same | — | 1988-08-17 | — | — | CN | disclosed |
| EP-0092782-B1 | OVERCOATED PHOTOHARDENABLE ELEMENT HAVING SURFACE PROTUBERANCES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-07-27 | — | — | EP | disclosed |
| EP-0091693-B1 | IMPROVED COVER SHEET IN A PHOTOSENSITIVE ELEMENT | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-07-27 | — | — | EP | disclosed |
| US-4755571-A | Curable compositions | CIBA-GEIGY CORPORATION (US) | 1988-07-05 | — | — | US | disclosed |
| US-4753865-A | PHOTORESISTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-06-28 | — | — | US | disclosed |
| EP-0270945-A2 | Photopolymerizable composition having superior adhesion, articles and processes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-06-15 | — | — | EP | disclosed |
| CN-87106227-A | The photopolymerizable composition that contains mineral filler | — | 1988-03-30 | — | — | CN | disclosed |
| EP-0260590-A2 | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-23 | — | — | EP | disclosed |
| EP-0259853-A2 | Lamination of photopolymerizable film onto a substrate employing an intermediate photosensitive layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-16 | — | — | EP | disclosed |
| EP-0259812-A2 | Photopolymerizable compositions containing inorganic fillers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-03-16 | — | — | EP | disclosed |
| US-4726877-A | ADDITION POLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER, INITIATING SYSTEM AND POLYMER BINDER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-02-23 | — | — | US | disclosed |
| US-4724021-A | APPLYING AND FIRING TWO DIFFERENT LAYERS OF DISPERSED DIELECTRIC SOLID AND GLASS PARTICLES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-02-09 | — | — | US | disclosed |
| EP-0254238-A2 | Porous bottom-layer dielectric composite structure | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1988-01-27 | — | — | EP | disclosed |
| US-4716097-A | TRIARYLMETHANE OR XANTHENE DYE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| US-4716093-A | IMPROVED DEVELOPMENT AND STRIPPING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| EP-0247549-A2 | Photopolymerizable composition containing carboxy benzotriazole | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-02 | — | — | EP | disclosed |
| US-4710262-A | PHOTORESIST FILM ADHESION PROMOTER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-01 | — | — | US | disclosed |
| EP-0089041-B1 | USE OF A NEGATIVE ACTING PHOTOPOLYMERIZABLE ELEMENT AS A SOLDER MASK | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-25 | — | — | EP | disclosed |
| EP-0092783-B1 | PHOTOSENSITIVE COATINGS CONTAINING CROSSLINKED BEADS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0096835-B1 | HALOGEN FINISHING OF FLEXOGRAPHIC PRINTING PLATES CONTAINING BUTADIENE/ACRYLONITRILE COPOLYMERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-11 | — | — | EP | disclosed |
| EP-0243933-A2 | Photohardenable mixture | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-04 | — | — | EP | disclosed |
| US-4698294-A | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-10-06 | — | — | US | disclosed |
| EP-0117483-B1 | LAMINATING AND TRIMMING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-30 | — | — | EP | disclosed |
| EP-0237985-A2 | Improved solvent developable photoresist composition and process of use | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-23 | — | — | EP | disclosed |
| EP-0236950-A2 | Adhesion promotion in photoresist lamination and processing | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-16 | — | — | EP | disclosed |
| US-4693959-A | INCLUDING AN AMINO RESIN OF MELAMINE OR HYDANTOIN, FORMALDEHYDE AND A TOLUENESULFONAMIDE IN THE PHOTOSENSITIVE LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-15 | — | — | US | disclosed |
| EP-0041642-B2 | INTEGRATED LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-09-02 | — | — | EP | disclosed |
| EP-0230936-A2 | Photosensitive compositions containing microgels | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-08-05 | — | — | EP | disclosed |
| US-4680249-A | Photopolymerizable composition containing carboxy benzotriazole | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-07-14 | — | — | US | disclosed |
| US-4668604-A | PHOTOSOLUBILITY, DESENSITIZATION, POLYMER BINDER, TRI- AND TETRA(METH)ACRYLATE POLYMERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-05-26 | — | — | US | disclosed |
| EP-0217137-A2 | Photopolymerizable composition of acrylic copolymer containing dicyclopentenyl acrylate or methacrylate | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-04-08 | — | — | EP | disclosed |
| US-4650743-A | PHOTOPOLYMERIZED HYDROZYALKYL ACRYLATE AND OLIGOMER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-03-17 | — | — | US | disclosed |
| EP-0214103-A2 | Adhesively bonded photostructurable polyimide foil | CIBA-GEIGY AG (CH) | 1987-03-11 | — | — | EP | disclosed |
| EP-0210638-A2 | Optical coating composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-02-04 | — | — | EP | disclosed |
| US-4634644-A | Process for the production images using sequentially gaseous polymerizing agents and photocuring | CIBA-GEIGY CORPORATION (US) | 1987-01-06 | — | — | US | disclosed |
| US-4631246-A | Uniform cover sheet with rough surface in a photosensitive element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-12-23 | — | — | US | disclosed |
| US-4621043-A | Storage stable photopolymerizable composition | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-11-04 | — | — | US | disclosed |
| EP-0198392-A1 | Partial neutralization of aqueous developable photoresist | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-10-22 | — | — | EP | disclosed |
| US-4613560-A | PHOTORESISTS, SEMICONDUCTORS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-09-23 | — | — | US | disclosed |
| EP-0041643-B1 | SELF-TRIMMING PHOTOSENSITIVE LAYER | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-09-17 | — | — | EP | disclosed |
| EP-0193621-A1 | Photopolymerizable compositions and elements containing acid to reduce scum and stain formation | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-09-10 | — | — | EP | disclosed |
| US-4604344-A | Process for the production of images using sequentially liquid polymerizing compositions and photocuring | CIBA-GEIGY CORPORATION (US) | 1986-08-05 | — | — | US | disclosed |
| US-4601970-A | Dry photosensitive film containing crosslinked beads | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-07-22 | — | — | US | disclosed |
| US-4599299-A | DISCRETE, INERT PARTICLES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-07-08 | — | — | US | disclosed |
| EP-0186163-A2 | Photosensitive ceramic coating composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-07-02 | — | — | EP | disclosed |
| US-4598037-A | FIREABLE COATING OF SMOOTH METAL AND GLASS PARTICLES IN AN ACRYLICPHOTORESIST SYSTEM;ELECTRICAL THICK FILMS;RESOLUTIUON | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-07-01 | — | — | US | disclosed |
| US-4592816-A | Forming negative images on conductive surfaces | ROHM AND HAAS COMPANY (US) | 1986-06-03 | — | — | US | disclosed |
| US-4587199-A | FLEXIBLE SUPPORT, REMOVABLE COVER SHEET; PRINTED CIRCUITS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-05-06 | — | — | US | disclosed |
| US-4584261-A | Process for etching nonphotosensitive layer under washoff photopolymer layer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-04-22 | — | — | US | disclosed |
| EP-0176356-A2 | Photosensitive polymer compositions, electrophoretic deposition processes using same, and the use of same in forming films on substrates | ROHM AND HAAS COMPANY (US) | 1986-04-02 | — | — | EP | disclosed |
| EP-0041639-B1 | LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-03-05 | — | — | EP | disclosed |
| US-4567129-A | Process for image formation utilizing chemically soluble pigments | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4567130-A | PHOTOLITHOGRAPHIC FILMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4567128-A | Cover sheet in a photosensitive element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-28 | — | — | US | disclosed |
| US-4565770-A | PHOTOLITHOGRAPHIC FILMS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-21 | — | — | US | disclosed |
| US-4552604-A | EPOXY RESINS, PHOTOPOLYMERIZATION, LAMINATION | CIBA GEIGY CORPORATION (US) | 1985-11-12 | — | — | US | disclosed |
| EP-0160621-A2 | Curable compositions | CIBA-GEIGY AG (CH) | 1985-11-06 | — | — | EP | disclosed |
| US-4551415-A | DRY FILM PHOTORESIST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-11-05 | — | — | US | disclosed |
| US-4550073-A | FOR PROOFS, PRINTING PLATES; NON-TACKY PRODUCES CLEAR IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-10-29 | — | — | US | disclosed |
| US-4548895-A | Process for the production of images using a heating step prior to imaging | CIBA GEIGY CORPORATION (US) | 1985-10-22 | — | — | US | disclosed |
| US-4548884-A | APPLYING PHOTOSENSITIVE LIQUID BETWEEN SUBSTRATE AND PHOTOMASK WHICH ARE HINGED TOGETHER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-10-22 | — | — | US | disclosed |
| EP-0041640-B1 | PHOTOPOLYMERIZABLE COMPOSITION | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-08-28 | — | — | EP | disclosed |
| US-4528261-A | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-07-09 | — | — | US | disclosed |
| US-4527890-A | Automatic repetitive registration and imagewise exposure of sheet substrates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-07-09 | — | — | US | disclosed |
| US-4518667-A | Automatic repetitive registration and image wise exposure of sheet substrates | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-21 | — | — | US | disclosed |
| US-4517281-A | UNSATURATED MONOMER, POLYMER BINDER DEVELOPERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-05-14 | — | — | US | disclosed |
| US-4510230-A | AQUEOUS PROCESSABLE RESIST ON COPPER SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-04-09 | — | — | US | disclosed |
| EP-0049504-B1 | IMPROVED AQUEOUS DEVELOPABLE PHOTOPOLYMERIZABLE ELEMENTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-03-27 | — | — | EP | disclosed |
| US-4497889-A | Release compound in negative acting photopolymerizable element | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-02-05 | — | — | US | disclosed |
| US-4495014-A | LAMINATION OF PHOTOSENSITIVE LAYER TO MOVING SHEET SUBSTRATE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-01-22 | — | — | US | disclosed |
| EP-0131299-A2 | Controlled roughening of photosensitive composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1985-01-16 | — | — | EP | disclosed |
| US-4485167-A | UNSATURATED MONOMER, BINDER, PHOTOINITIATOR AND NITROGEN CONTAINING COMPOUND | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-11-27 | — | — | US | disclosed |
| EP-0123158-A2 | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-10-31 | — | — | EP | disclosed |
| EP-0041642-B1 | INTEGRATED LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-12 | — | — | EP | disclosed |
| EP-0117483-A1 | Laminating and trimming process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-09-05 | — | — | EP | disclosed |
| EP-0115354-A2 | Storage stable photopolymerizable composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-08-08 | — | — | EP | disclosed |
| US-4460427-A | Process for the preparation of flexible circuits | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4454168-A | Printed circuits prepared from metallized photoadhesive layers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-06-12 | — | — | US | disclosed |
| US-4451553-A | Halogen finishing of flexographic printing plates containing butadiene/acrylonitrile copolymers | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-29 | — | — | US | disclosed |
| EP-0040843-B1 | LAMINATING PROCESS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-02 | — | — | EP | disclosed |
| EP-0096863-A2 | Process of registering and exposing sheet substrates using photosensitive liquid | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-28 | — | — | EP | disclosed |
| EP-0096861-A2 | Process and apparatus for automatic repetitive registration and imagewise exposure of sheet substrates | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-28 | — | — | EP | disclosed |
| EP-0096835-A2 | Halogen finishing of flexographic printing plates containing butadiene/acrylonitrile copolymers | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-12-28 | — | — | EP | disclosed |
| EP-0092782-A2 | Overcoated photohardenable element having surface protuberances | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-02 | — | — | EP | disclosed |
| EP-0092783-A2 | Photosensitive coatings containing crosslinked beads | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-11-02 | — | — | EP | disclosed |
| US-4411980-A | EXPOSE TO IMAGES, APPLYING CONDUCTIVE METAL, HEATING, THEN ELECTROLESS PLATING OR SOLDERING METAL AREAS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-10-25 | — | — | US | disclosed |
| EP-0091693-A2 | Improved cover sheet in a photosensitive element | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-10-19 | — | — | EP | disclosed |
| EP-0089041-A1 | Use of a negative acting photopolymerizable element as a solder mask | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-09-21 | — | — | EP | disclosed |
| US-4405394-A | USING A THIN FILM INTERFACE BETWEEN THE CLEANED COPPER OR ALUMINUM SUBSTRATE AND PHOTOSENSITIVE FILM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-09-20 | — | — | US | disclosed |
| EP-0075299-A2 | Process for the preparation of flexible circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-03-30 | — | — | EP | disclosed |
| US-4378264-A | FOR A PHOTOSENSITIVE POLYMERIC COMPOSITION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-03-29 | — | — | US | disclosed |
| EP-0049504-A1 | Improved aqueous developable photopolymerizable elements | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-04-14 | — | — | EP | disclosed |
| EP-0041643-A2 | Self-trimming photosensitive layer | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0041642-A2 | Integrated laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0041639-A2 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0041640-A2 | Photopolymerizable composition | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-16 | — | — | EP | disclosed |
| EP-0040843-A1 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-02 | — | — | EP | disclosed |
| EP-0040842-A1 | Laminating process | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-12-02 | — | — | EP | disclosed |
| US-4293635-A | N-ALKYLACRYLAMIDE-UNSATURATED ACID-ACRYLATE INTERPOLYMER, AMPHOTERIC | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-10-06 | — | — | US | disclosed |
| US-4278752-A | SOLDERS, MASKING | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1981-07-14 | — | — | US | disclosed |
| US-4276352-A | Reinforced composites containing unsaturated polyimide resins | CIBA-GEIGY CORPORATION (US) | 1981-06-30 | — | — | US | disclosed |
| US-4254012-A | Reinforced composites containing cyanato resins | CIBA-GEIGY CORPORATION (US) | 1981-03-03 | — | — | US | disclosed |
| US-4252593-A | Method of preparing reinforced composites | CIBA-GEIGY CORPORATION (US) | 1981-02-24 | — | — | US | disclosed |
| US-4195997-A | COLD FLOW RESISTANCE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1980-04-01 | — | — | US | disclosed |
| US-4054483-A | Additives process for producing plated holes in printed circuit elements | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-4054483-A | Additives process for producing plated holes in printed circuit elements | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
| US-4054479-A | Additive process for producing printed circuit elements using a self-supported photosensitive sheet | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230180744-A1 | PROCESS AND SOLUTION FOR PREPARING A SURFACE WITH BACTERIOSTATIC AND BACTERICIDAL ACTIVITY, SURFACE THUS PREPARED AND USES THEREOF | PCNA, LPO, CUTA | TSHR 2602/4885ALDH1A1 3216/4885TP53 3617/4885 |
| US-20090111907-A1 | SCREEN PRINTABLE HYDROGEL FOR MEDICAL APPLICATIONS | SMARCD1, SMARCD2, SMARCA4 | TSHR 4020/4885ALDH1A1 2594/4885TP53 55/4885 |
| US-12635688-B2 | Process and solution for preparing a surface with bacteriostatic and bactericidal activity, surface thus prepared and uses thereof | LPO, C9, MSR1 | TSHR 543/4885ALDH1A1 1274/4885TP53 3842/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.