SCHEMBL3476417

SCHEMBL3476417

O=S(=O)(S)S.[Au]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL793593 0.93
SCHEMBL17422749 0.86
SCHEMBL29071784 0.86
Thiosulfuric Acid SCHEMBL5145687 0.76 CA5A (0.50)
Thiosulfuric Acid SCHEMBL924453 0.76
Thiosulfuric Acid SCHEMBL145198 0.72
Thiosulfuric Acid SCHEMBL7156517 0.72
Thiosulfuric Acid SCHEMBL829132 0.72
Thiosulfuric Acid SCHEMBL9501847 0.72 CA5A (0.46)
Thiosulfuric Acid SCHEMBL3697395 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7674575-B2 Silver halide photosensitive material for color-photography and image formation method using the same FUJIFILM CORPORATION (JP) 2010-03-09 US disclosed
US-6830880-B2 Is subjected to a color development within nine seconds of being imagewise exposed; contains at least one specific metal complex. FUJI PHOTO FILM CO., LTD. (JP) 2004-12-14 US disclosed
US-20040234907-A1 Silver halide photosensitive material for color-photography and image formation method using the same FUJI PHOTO FILM CO., LTD. 2004-11-25 US disclosed
US-20040023165-A1 Silver halide photosensitive material for color-photography and image formation method using the same FUJI PHOTO FILM CO., LTD. 2004-02-05 US disclosed