SCHEMBL3477264

SCHEMBL3477264

[CH2]CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(C)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18787351 1.00
SCHEMBL9513952 1.00
SCHEMBL15404998 0.91
SCHEMBL476544 0.81 TSHR (0.36)
SCHEMBL476526 0.81 TSHR (0.36)
SCHEMBL476596 0.81 TSHR (0.36)
SCHEMBL717488 0.81 TSHR (0.36)
SCHEMBL2488959 0.80
SCHEMBL15403706 0.80
SCHEMBL7102626 0.78 TSHR (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110621711-A Photocurable composition containing fluorine-based polymer 捷恩智株式会社 2019-12-27 CN disclosed
US-8293442-B2 Resin particle, toner, and image forming method and process cartridge using the same RICOH COMPANY, LTD. (JP) 2012-10-23 US disclosed
US-20100075245-A1 RESIN PARTICLE, TONER, AND IMAGE FORMING METHOD AND PROCESS CARTRIDGE USING THE SAME RICOH COMPANY, LTD. (JP) 2010-03-25 US disclosed