⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8384931 | 0.71 | — | — | |
| SCHEMBL16990186 | 0.69 | LMNA (0.37) | — | |
| SCHEMBL8384396 | 0.69 | — | — | |
| SCHEMBL3482545 | 0.67 | — | — | |
| SCHEMBL3482285 | 0.67 | — | — | |
| SCHEMBL17024467 | 0.65 | TSHR (0.38) | — | |
| SCHEMBL15369545 | 0.65 | — | — | |
| SCHEMBL1829038 | 0.65 | — | — | |
| SCHEMBL3481866 | 0.63 | — | — | |
| SCHEMBL1006032 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114874443-B | Silicon rubber with low curing shrinkage and preparation method thereof | 中国科学院长春应用化学研究所 | 2023-10-13 | — | — | CN | claimed |
| US-11332580-B2 | Curable silicone rubber compounds | NITROCHEMIE ASCHAU GMBH (DE) | 2022-05-17 | — | — | US | disclosed |
| CN-105793327-B | Synthesis and use of metallized polyhedral oligomeric silsesquioxane catalyst compositions | 亨茨曼国际有限公司 | 2019-12-17 | — | — | CN | disclosed |
| US-20190232252-A1 | CHROMATOGRAPHIC MATERIAL AND METHODS FOR THE SYNTHESIS THEREOF | DIONEX CORPORATION | 2019-08-01 | — | — | US | disclosed |
| EP-3063209-B1 | SYNTHESIS AND USE OF METALLIZED POLYHEDRAL OLIGOMERIC SILSEQUIOXANE CATALYST COMPOSITIONS | HUNTSMAN INT LLC (US) | 2017-12-27 | — | — | EP | disclosed |
| US-9822210-B2 | Synthesis and use of metallized polyhedral oligomeric silsesquioxane catalyst compositions | HUNTSMAN INTERNATIONAL LLC (US) | 2017-11-21 | — | — | US | disclosed |
| US-20160264708-A1 | Synthesis and Use of Metallized Polyhedral Oligomeric Silsesquioxane Catalyst Compositions | HUNTSMAN INTERNATIONAL LLC | 2016-09-15 | — | — | US | disclosed |
| EP-3063209-A1 | SYNTHESIS AND USE OF METALLIZED POLYHEDRAL OLIGOMERIC SILSEQUIOXANE CATALYST COMPOSITIONS | Huntsman International LLC (US) | 2016-09-07 | — | — | EP | disclosed |
| US-20150224473-A1 | CHROMATOGRAPHIC MATERIAL AND METHODS FOR THE SYNTHESIS THEREOF | THERMO ELECTRON MANUFACTURING LIMITED (GB) | 2015-08-13 | — | — | US | disclosed |
| WO-2015062759-A1 | SYNTHESIS AND USE OF METALLIZED POLYHEDRAL OLIGOMERIC SILSEQUIOXANE CATALYST COMPOSITIONS | HUNTSMAN INTERNATIONAL LLC (US) | 2015-05-07 | — | — | WO | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| EP-2865704-A1 | Synthesis and use of metallized polyhedral oligomeric silsesquioxane catalyst compositions | HUNTSMAN INTERNATIONAL LLC (US) | 2015-04-29 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |