SCHEMBL3481795

SCHEMBL3481795

Cc1ccc(C(C)O[SiH3])cc1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CHRNA7 P36544 1/20 0.41
ACHE P22303 6/20 0.40
TDP1 Q9NUW8 1/20 0.40
ALOX5 P09917 1/20 0.35
STAT3 P40763 1/20 0.32
CYP19A1 P11511 1/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
CA7 P43166 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MEN1 O00255 1/20 0.31
GAA P10253 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10670145 0.79 ACHE (0.44) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL8750364 0.79 CHRNA7 (0.50) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL2804400 0.78 MAPT (0.38) ACHETDP1ALDH1A1MEN1GAA
SCHEMBL523682 0.77 HCAR2 (0.42) ALDH1A1
SCHEMBL14615251 0.77 CHRNA7 (0.42) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL5168139 0.77 CHRNA7 (0.42) CHRNA7ACHETDP1CYP19A1CA1
SCHEMBL7615009 0.77 CHRNA7 (0.42) CHRNA7ACHETDP1ALOX5STAT3
SCHEMBL29058810 0.76 CA1 (0.50) ACHETDP1CA1CA2CA9
SCHEMBL6684539 0.76 HTT (0.31) CA1CA2CA9CA7
SCHEMBL406972 0.75 CHRNA7 (0.41) CHRNA7ACHETDP1ALOX5STAT3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116655680-A Organic alkenyl silicone ether compound and synthetic method thereof 广东万木新材料科技有限公司 2023-08-29 CN disclosed
CN-112996841-B Crosslinkable organosiloxane compositions 瓦克化学股份公司 2022-12-27 CN disclosed
CN-112996841-A Crosslinkable organosiloxane compositions 瓦克化学股份公司 2021-06-18 CN disclosed
EP-1972437-B1 FILTER COMPRISING A COMPOSITE MATERIAL HAVING ANTIFOULING PROPERTY NBC MESHTEC INC (JP) 2016-05-11 EP disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-8349447-B2 Antifouling composite material NBC MESHTEC, INC. (JP) 2013-01-08 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20090094954-A1 Antifouling Composite Material NBC, INC 2009-04-16 US disclosed
EP-1972437-A1 COMPOSITE MATERIAL HAVING ANTIFOULING PROPERTY NBC inc. (JP) 2008-09-24 EP disclosed
US-6936399-B2 Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2005-08-30 US disclosed
US-20030118849-A1 Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate FUJI PHOTO FILM CO., LTD. 2003-06-26 US disclosed
EP-1304229-A2 Hydrophilic member, hydrophilic graft polymer, and support of planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-04-23 EP disclosed