SCHEMBL3482029

SCHEMBL3482029

C[Si](C)(OC(F)(F)C(F)(F)F)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 7/20 0.46
NR1H3 Q13133 7/20 0.46
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
TSHR P16473 2/20 0.33
ALDH1A1 P00352 1/20 0.33
ACHE P22303 1/20 0.32
MAPK1 P28482 1/20 0.30
ELANE P08246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3481991 0.79 NR1H2 (0.37) NR1H2NR1H3ESR1ESR2
SCHEMBL705274 0.79 ESR1 (0.41) NR1H2NR1H3ESR1ESR2TSHR
SCHEMBL15798449 0.78 NR1H2 (0.32) NR1H2NR1H3
SCHEMBL15734029 0.78 NR1H2 (0.37) NR1H2NR1H3ESR1ESR2TSHR
SCHEMBL7710874 0.76 NR1H2 (0.40) NR1H2NR1H3ESR1ESR2TSHR
SCHEMBL231690 0.75 NR1H2 (0.34) NR1H2NR1H3
SCHEMBL3724083 0.74 NR1H2 (0.35) NR1H2NR1H3TSHRALDH1A1ELANE
SCHEMBL15733545 0.74 NR1H2 (0.45) NR1H2NR1H3TSHRALDH1A1
SCHEMBL3140546 0.73 NR1H2 (0.33) NR1H2NR1H3
SCHEMBL15309958 0.72 ESR1 (0.36) NR1H2NR1H3ESR1ESR2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117049856-A Foamed polylactic acid building insulation board containing mesoporous material 常州优纳新材料科技有限公司 2023-11-14 CN claimed
CN-118871296-A Member for inkjet head, method for manufacturing member for inkjet head, and inkjet head 柯尼卡美能达株式会社 2024-10-29 CN disclosed
CN-117049856-A Foamed polylactic acid building insulation board containing mesoporous material 常州优纳新材料科技有限公司 2023-11-14 CN disclosed
CN-114206620-B Nozzle plate, method for manufacturing nozzle plate, and inkjet head 柯尼卡美能达株式会社 2023-11-10 CN disclosed
CN-116096578-A Ink jet head 柯尼卡美能达株式会社 2023-05-09 CN disclosed
US-11498043-B2 Methods for producing wet gel and xerogel AGC Inc. (JP) 2022-11-15 US disclosed
US-10727410-B2 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
EP-3677618-A1 METHODS FOR PRODUCING WET GEL AND XEROGEL AGC Inc. (JP) 2020-07-08 EP disclosed
US-20200139328-A1 METHODS FOR PRODUCING WET GEL AND XEROGEL AGC Inc. (JP) 2020-05-07 US disclosed
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME UBE INDUSTRIES, LTD. (JP) 2018-08-02 US disclosed
US-9947871-B2 Surface modifier for metal electrode, surface-modified metal electrode, and method for producing surface-modified metal electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-04-17 US disclosed
EP-3181569-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK CONTAINING SAME, AND ORGANIC ELECTRONIC DEVICE USING SAME UBE Industries, Ltd. (JP) 2017-06-21 EP disclosed
US-20150295176-A1 SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-15 US disclosed
EP-2927936-A1 SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE Shin-Etsu Chemical Co., Ltd. (JP) 2015-10-07 EP disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
EP-2738230-A1 Surface modifier for transparent oxide electrode, surface-modified transparent oxide electrode, and method for producing surface-modified transparent oxide electrode Shin-Etsu Chemical Co., Ltd. (JP) 2014-06-04 EP disclosed
US-20140147628-A1 Surface Modifier For Transparent Oxide Electrode, Surface-Modified Transparent Oxide Electrode, And Method For Producing Surface-Modified Transparent Oxide Electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-29 US disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180219160-A1 BENZOBIS(THIADIAZOLE) DERIVATIVE, INK COMPRISING THE SAME, AND ORGANIC ELECTRONIC DEVICE USING THE SAME IKZF3, HELZ, TEC NR1H2 4335/4885NR1H3 4373/4885ESR1 398/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.