⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2120546 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL2018010 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL3482208 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL2119929 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL27148820 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL661577 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL1614341 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL17100561 | 0.97 | OPRM1 (0.44) | — | |
| SCHEMBL703267 | 0.92 | — | — | |
| SCHEMBL27646898 | 0.81 | OPRM1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4018015-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | Versum Materials US, LLC (US) | 2022-06-29 | — | — | EP | claimed |
| WO-2021050798-A1 | MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM | VERSUM MATERIALS US, LLC (US) | 2021-03-18 | — | — | WO | claimed |
| EP-4069797-A1 | MICHAEL REACTION-CURING SYNTHETIC RESIN FOR USE IN CHEMICAL FASTENING TECHNOLOGY | fischerwerke GmbH & Co. KG (DE) | 2022-10-12 | — | — | EP | disclosed |
| WO-2021110622-A1 | MICHAEL REACTION-CURING SYNTHETIC RESIN FOR USE IN CHEMICAL FASTENING TECHNOLOGY | FISCHERWERKE GMBH & CO. KG (DE) | 2021-06-10 | — | — | WO | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| CN-100354319-C | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2007-12-12 | — | — | CN | disclosed |
| CN-1781955-A | Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer | TAIWAN RUBBER CO LTD (CN) | 2006-06-07 | — | — | CN | disclosed |
| EP-0360497-A2 | Olefin polymerization catalyst, component thereof and process for polymerizing olefins with the catalyst, the film and injection-molded article from the obtained polyolefin | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-03-28 | — | — | EP | disclosed |
| EP-0350170-A2 | Process for polymerising olefins and polymerisation catalyst therefor | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1990-01-10 | — | — | EP | disclosed |