SCHEMBL703267

SCHEMBL703267

CCCCC(C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482170 0.92
SCHEMBL2120546 0.90 OPRM1 (0.44)
SCHEMBL3482208 0.90 OPRM1 (0.44)
SCHEMBL27148820 0.90 OPRM1 (0.44)
SCHEMBL2119929 0.90 OPRM1 (0.44)
SCHEMBL1614341 0.90 OPRM1 (0.44)
SCHEMBL17100561 0.90 OPRM1 (0.44)
SCHEMBL661577 0.90 OPRM1 (0.44)
SCHEMBL2018010 0.90 OPRM1 (0.44)
SCHEMBL27626712 0.85 ACE2 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4018015-A1 MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2022-06-29 EP claimed
WO-2021050798-A1 MONOALKOXYSILANES AND DIALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
EP-4309006-A1 METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE Tokyo Ohka Kogyo Co., Ltd. (JP) 2024-01-24 EP disclosed
CN-110320755-A Minus white photosensitive resin composition and its application 奇美实业股份有限公司 2019-10-11 CN disclosed
CN-104423168-B Positive photosensitive resin composition and pattern forming method thereof 奇美实业股份有限公司 2018-11-30 CN disclosed
CN-103885294-B Photosensitive polysiloxane composition, protective film and element with protective film 奇美实业股份有限公司 2017-07-14 CN disclosed
CN-103901728-B Photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2017-06-06 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20110313184-A1 INSULATING FILM MATERIAL, AND FILM FORMATION METHOD UTILIZING THE MATERIAL, AND INSULATING FILM TAIYO NIPPON SANSO CORPORATION (JP) 2011-12-22 US disclosed
US-7176269-B2 Curable composition and its use MITSUI CHEMICALS, INC. (JP) 2007-02-13 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
WO-2007009935-A2 HYDROPHOBING MINERALS AND FILLER MATERIALS DOW CORNING CORPORATION (US) 2007-01-25 WO disclosed
EP-1304354-B1 CURABLE COMPOSITION AND USES THEREOF MITSUI CHEMICALS INC (JP) 2007-01-24 EP disclosed
US-20070015893-A1 Curable composition and its use MITSUI CHEMICALS, INC. 2007-01-18 US disclosed
CN-1781955-A Hydrogenation catalyst composition and method for hydrogenating conjugate diene polymer TAIWAN RUBBER CO LTD (CN) 2006-06-07 CN disclosed
US-20030096904-A1 Curable composition and its use MITSUI CHEMICALS, INC. (JP) 2003-05-22 US disclosed
EP-1304354-A1 CURABLE COMPOSITION AND USES THEREOF Mitsui Chemicals, Inc. (JP) 2003-04-23 EP disclosed
CN-1392890-A Curable composition and use thereof MITSUI CHEMICALS INC (JP) 2003-01-22 CN disclosed