⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3481857 | 0.84 | LMNA (0.39) | — | |
| SCHEMBL3481469 | 0.80 | — | — | |
| SCHEMBL6699124 | 0.80 | — | — | |
| SCHEMBL3482137 | 0.77 | LMNA (0.41) | — | |
| SCHEMBL8376082 | 0.77 | — | — | |
| SCHEMBL9458370 | 0.75 | — | — | |
| SCHEMBL13103975 | 0.73 | TSHR (0.38) | — | |
| SCHEMBL704083 | 0.73 | SMPD1 (0.32) | — | |
| SCHEMBL13354370 | 0.71 | — | — | |
| SCHEMBL423646 | 0.71 | THRB (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111138865-A | Preparation method of novel liquid foaming silica gel for new energy automobile | 佛山职业技术学院 | 2020-05-12 | — | — | CN | claimed |
| WO-2010082710-A1 | METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2010-07-22 | — | — | WO | claimed |
| US-6410770-B2 | REDUCTION OF ALKOXYSILANE IN PRESENCE OF ALKALI METAL HYDRIDE AND HIGH BOILING SOLVENTS | GELEST, INC. | 2002-06-25 | — | — | US | claimed |
| US-20020002299-A1 | Chloride-free process for the production of alkylsilanes suitable for microelectronic applications | GELEST, INC. | 2002-01-03 | — | — | US | claimed |
| WO-2001058908-A2 | CHLORIDE-FREE PROCESS FOR THE PRODUCTION OF ALKYLSILANES SUITABLE FOR MICROELECTRONIC APPLICATIONS | GELEST, INC. (US) | 2001-08-16 | — | — | WO | claimed |
| EP-3812428-B1 | COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE | PANASONIC IP MAN CO LTD (JP) | 2025-12-03 | — | — | EP | disclosed |
| CN-119998691-A | Antireflection film, liquid composition set, and method for producing antireflection film | 日本板硝子株式会社 | 2025-05-13 | — | — | CN | disclosed |
| WO-2024080149-A1 | ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM | 日本板硝子株式会社 | 2024-04-18 | — | — | WO | disclosed |
| CN-112424290-B | Colloid structure, colloid multiple structure, and method for producing colloid structure | 松下知识产权经营株式会社 | 2023-08-22 | — | — | CN | disclosed |
| US-11353642-B2 | Optical filter, multiplex optical filter, and light emitting device and illumination system using the same | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2022-06-07 | — | — | US | disclosed |
| US-20210246330-A1 | COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2021-08-12 | — | — | US | disclosed |
| US-20210199865-A1 | OPTICAL FILTER, MULTIPLEX OPTICAL FILTER, AND LIGHT EMITTING DEVICE AND ILLUMINATION SYSTEM USING THE SAME | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7604866-B2 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2009-10-20 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |
| US-6410770-B2 | REDUCTION OF ALKOXYSILANE IN PRESENCE OF ALKALI METAL HYDRIDE AND HIGH BOILING SOLVENTS | GELEST, INC. | 2002-06-25 | — | — | US | disclosed |
| US-20020002299-A1 | Chloride-free process for the production of alkylsilanes suitable for microelectronic applications | GELEST, INC. | 2002-01-03 | — | — | US | disclosed |
| WO-2001058908-A2 | CHLORIDE-FREE PROCESS FOR THE PRODUCTION OF ALKYLSILANES SUITABLE FOR MICROELECTRONIC APPLICATIONS | GELEST, INC. (US) | 2001-08-16 | — | — | WO | disclosed |