⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482664 | 0.80 | — | — | |
| SCHEMBL2834364 | 0.64 | — | — | |
| SCHEMBL10076656 | 0.62 | — | — | |
| SCHEMBL22613944 | 0.62 | — | — | |
| SCHEMBL2836928 | 0.62 | — | — | |
| SCHEMBL584025 | 0.62 | — | — | |
| SCHEMBL2833551 | 0.60 | MEN1 (0.38) | — | |
| SCHEMBL22927048 | 0.58 | THRB (0.33) | — | |
| SCHEMBL20693880 | 0.58 | — | — | |
| SCHEMBL16877540 | 0.57 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8420764-B2 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8236917-B2 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2012-08-07 | — | — | US | disclosed |
| US-20120178894-A1 | COMPOUND HAVING SILSESQUIOXANE SKELETON AND ITS POLYMER | INAGAKI JYUN-ICHI (JP) | 2012-07-12 | — | — | US | disclosed |
| US-20100240855-A1 | Compound having silsesquioxane skeleton and its polymer | JNC CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7705105-B2 | A cyclic polymer of silsesquioxane skeleton with side chains formed byhydrosilation of an unsaturated end group containing an active polymerfunctional group; polyimidesiloxane copolymers; polyestersiloxane copolymers; high molecular weight; thin films; strength; heat resistance;waterproofing; | CHISSO PETROCHEMICAL CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7507450-B2 | Varnish for forming liquid crystal alignment layer and liquid crystal display element using the same | CHISSO CORPORATION (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7373060-B2 | Optical waveguide using polymer composed of silsesquioxane derivative | CHISSO CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20070190344-A1 | Verification of translation | JNC CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |
| US-20060204192-A1 | Optical waveguide using polymer composed of silsesquioxane derivative | JNC CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| US-20060204680-A1 | Varnish for forming liquid crystal alignment layer and liquid crystal display element using the same | JNC CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| US-6949281-B1 | Varnish composition and liquid-crystal display element | CHISSO CORPORATION (JP) | 2005-09-27 | — | — | US | disclosed |
| US-20050009982-A1 | Compound having silsesquioxane skeleton and its polymer | CHISSO CORPORATION (JP) | 2005-01-13 | — | — | US | disclosed |
| US-6746730-B1 | VARNISH COMPOSITION WHICH COMPRISES POLYMER COMPONENT CONTAINING TWO DIFFERENT POLYAMIC ACIDS, SOLUBLE POLYIMIDE, AND SOLVENT FOR DISSOLVING POLYMER COMPONENT | CHISSO CORPORATION (JP) | 2004-06-08 | — | — | US | disclosed |
| US-6685997-B1 | SOLUTION CONTAINING POLYAMIC ACIDS, POLYAMIDES AND POLYIMIDES; ALIGNMENT FILM; WELL BALANCED ELECTRICAL CHARACTERISTICS; ELIMINATES IMAGE STICKING | CHISSO CORPORATION (JP) | 2004-02-03 | — | — | US | disclosed |