SCHEMBL3482445

SCHEMBL3482445

CCCC[Si](C)(C)OCCC

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ADRB2 P07550 1/20 0.32
ADRB1 P08588 1/20 0.32
ADRB3 P13945 1/20 0.32
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6427760 0.93 THRB (0.36) LMNATSHR
SCHEMBL704380 0.92
SCHEMBL706737 0.92
SCHEMBL5572085 0.90 THRB (0.38) LMNATSHR
SCHEMBL27598690 0.90 THRB (0.38) LMNATSHR
SCHEMBL5575089 0.90 THRB (0.38) LMNATSHR
SCHEMBL15292867 0.90 ADRB2 (0.38) ADRB2ADRB1ADRB3LMNATSHR
SCHEMBL8161878 0.87 CA1 (0.33) TSHR
Fluoride SCHEMBL28805747 0.87 ADRB2 (0.36) ADRB2ADRB1ADRB3TSHR
SCHEMBL706740 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220301862-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2022-09-22 US claimed
EP-4018013-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2022-06-29 EP claimed
CN-114616652-A Monoalkoxysilanes and dense organosilica films prepared therefrom 弗萨姆材料美国有限责任公司 2022-06-10 CN claimed
WO-2021050659-A1 MONOALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2021-03-18 WO claimed
EP-3080167-A2 METHOD FOR PRODUCING POLYMERIC COMPOSITIONS INCLUDING FUNCTIONALIZED POLYMERS Firestone Polymers, LLC (US) 2016-10-19 EP disclosed
WO-2015089356-A2 METHOD FOR PRODUCING POLYMERIC COMPOSITIONS INCLUDING FUNCTIONALIZED POLYMERS FIRESTONE POLYMERS, LLC (US) 2015-06-18 WO disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
EP-2844678-A1 POLYDIENES AND DIENE COPOLYMERS HAVING ORGANOPHOSPHINE FUNCTIONALITY Bridgestone Corporation (JP) 2015-03-11 EP disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
EP-2699606-A2 POLYMERS FUNCTIONALIZED WITH A CARBOXYLIC OR THIOCARBOXYLIC ESTER CONTAINING A SILYLATED AMINO GROUP Bridgestone Corporation (JP) 2014-02-26 EP disclosed
WO-2013166124-A1 POLYDIENES AND DIENE COPOLYMERS HAVING ORGANOPHOSPHINE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-11-07 WO disclosed
EP-2658877-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY Bridgestone Corporation (JP) 2013-11-06 EP disclosed
US-20020016401-A1 Inorganic particle-containing composition, transfer film comprising the same and plasma display panel production process JSR CORPORATION (JP) 2002-02-07 US disclosed
US-6339118-B1 FOR FORMING BARRIER, ELECTRODE, RESISTOR, DIELECTRIC LAYER, PHOSPHOR, COLOR FILTER OR BLACK MATRIX OF PLASMA DISPLAY PANEL JSR CORPORATION (JP) 2002-01-15 US disclosed
EP-1023333-A1 PROCESSES FOR IMPROVING STABILITY OF LIVING POLYMERIZATION CHAIN ENDS FMC CORPORATION (US) 2000-08-02 EP disclosed
EP-1003199-A2 Inorganic particle-containing composition, transfer film comprising the same and plasma display panel production process JSR Corporation (JP) 2000-05-24 EP disclosed
US-6046121-A MIXTURE COMPRISING GLASS POWDER, HYDROPHILIC ACRYLATE POLYMER BINDER RESIN IN A NONAQUEOUS SOLVENT HAVING BOILING POINT BETWEEN 100 AND 200 DEGREES C., AND A LOW VAPOR PRESSURE JSR CORPORATION (JP) 2000-04-04 US disclosed
EP-0987228-A2 Glass paste composition, and transfer film and plasma display panel comprising the same JSR Corporation (JP) 2000-03-22 EP disclosed
WO-1999012979-A1 PROCESSES FOR IMPROVING STABILITY OF LIVING POLYMERIZATION CHAIN ENDS FMC CORPORATION (US) 1999-03-18 WO disclosed
EP-0877003-A2 Glass paste composition JSR Corporation (JP) 1998-11-11 EP disclosed