Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | ACHE | P22303 | 2/20 | 0.33 |
| ▸ | TPMT | P51580 | 1/20 | 0.32 |
| ▸ | NOS3 | P29474 | 1/20 | 0.31 |
| ▸ | NOS1 | P29475 | 1/20 | 0.31 |
| ▸ | NOS2 | P35228 | 1/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.31 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.31 |
| ▸ | C1S | P09871 | 1/20 | 0.31 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.31 |
| ▸ | SELL | P14151 | 1/20 | 0.30 |
| ▸ | SELP | P16109 | 1/20 | 0.30 |
| ▸ | SELE | P16581 | 1/20 | 0.30 |
| ▸ | HMBS | P08397 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1314841 | 0.81 | ALDH1A1 (0.40) | ALDH1A1TSHRACHETPMTNOS3 | |
| SCHEMBL3482179 | 0.79 | ALDH1A1 (0.43) | ALDH1A1TSHRACHETPMTNOTUM | |
| SCHEMBL1316127 | 0.79 | ALDH1A1 (0.38) | ALDH1A1TSHRACHETPMTNOTUM | |
| SCHEMBL1317229 | 0.79 | ALDH1A1 (0.38) | ALDH1A1TSHRACHETPMTNOTUM | |
| SCHEMBL16714015 | 0.75 | — | — | |
| SCHEMBL12814786 | 0.73 | ALDH1A1 (0.33) | ALDH1A1TSHRNOS3NOS1NOS2 | |
| SCHEMBL3894474 | 0.73 | ACHE (0.52) | ALDH1A1TSHRACHEMAPT | |
| SCHEMBL12816246 | 0.73 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL12816490 | 0.73 | ALDH1A1 (0.33) | ALDH1A1TSHRNOS3NOS2 | |
| SCHEMBL12816429 | 0.73 | ALDH1A1 (0.33) | ALDH1A1TSHRNOS3NOS1NOS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115196899-B | High-activity composite ultrafine powder and preparation method thereof | 盐城市鼎力新材料有限公司 | 2023-03-31 | — | — | CN | claimed |
| CN-115196899-A | High-activity composite ultrafine powder and preparation method thereof | 盐城市鼎力新材料有限公司 | 2022-10-18 | — | — | CN | claimed |
| CN-115196899-B | High-activity composite ultrafine powder and preparation method thereof | 盐城市鼎力新材料有限公司 | 2023-03-31 | — | — | CN | disclosed |
| CN-115196899-A | High-activity composite ultrafine powder and preparation method thereof | 盐城市鼎力新材料有限公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-107266514-A | Method for producing E4 intermediate | 埃斯特拉私人有限责任公司 | 2017-10-20 | — | — | CN | disclosed |
| CN-103619867-B | For generation of the method for oestetrol intermediate | ESTETRA S.A. (BE) | 2015-12-23 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| CN-103703014-A | Process for producing estetrol intermediates | ESTETRA S A | 2014-04-02 | — | — | CN | disclosed |
| CN-103619867-A | Process for the production of estetrol intermediates | ESTETRA S A | 2014-03-05 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-1999167-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | Novolen Technology Holdings, C.V. (NL) | 2008-12-10 | — | — | EP | disclosed |
| WO-2007106348-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) | 2007-09-20 | — | — | WO | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |