⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2269691 | 0.93 | — | — | |
| SCHEMBL2272086 | 0.88 | TSHR (0.32) | — | |
| SCHEMBL197126 | 0.85 | — | — | |
| SCHEMBL705270 | 0.81 | — | — | |
| SCHEMBL2270148 | 0.80 | TSHR (0.35) | — | |
| SCHEMBL6459585 | 0.79 | — | — | |
| SCHEMBL704335 | 0.79 | — | — | |
| SCHEMBL707254 | 0.77 | — | — | |
| SCHEMBL25704 | 0.76 | — | — | |
| SCHEMBL20873157 | 0.76 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115605530-A | Polycarbosilazanes, compositions comprising the same, and methods of making silicon-containing films using the same | 默克专利有限公司（DE） | 2023-01-13 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7344235-B2 | Ink composition for ink jet recording, ink cartridge, nozzle plate for ink jet recording, ink jet head, and recording apparatus | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |