SCHEMBL3486966

SCHEMBL3486966

O[Si](O)(O)O.O[Si](O)(O)O.[Ti]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL42404 1.00
SCHEMBL1369276 0.91
SCHEMBL916134 0.91
SCHEMBL8367455 0.91
SCHEMBL7615290 0.91
SCHEMBL8936993 0.91
Phosphine SCHEMBL22273599 0.91
SCHEMBL2547490 0.91
SCHEMBL914633 0.91
SCHEMBL16469635 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8078361-A None JP disclosed
EP-4613817-A1 ANTIOXIDANT COATINGS FOR CARBON COMPONENTS Honeywell International Inc. (US) 2025-09-10 EP disclosed
US-20250277516-A1 ANTIOXIDANT COATINGS FOR CARBON COMPONENTS HONEYWELL INTERNATIONAL INC. 2025-09-04 US disclosed
US-20250253203-A1 METAL CERAMIC SUBSTRATE AND METHOD FOR PRODUCING THE SAME TONG HSING ELECTRONIC INDUSTRIES, LTD. (TW) 2025-08-07 US disclosed
US-20250249523-A1 METHOD FOR PRODUCING ACTIVE METAL CERAMIC SUBSTRATE TONG HSING ELECTRONIC INDUSTRIES, LTD. (TW) 2025-08-07 US disclosed
US-12024476-B2 Carbon-carbon composite including antioxidant coating HONEYWELL INTERNATIONAL INC. (US) 2024-07-02 US disclosed
US-11313040-B2 Plasma-assisted process of ceramization of polymer precursor on surface, surface comprising ceramic polymer EMBRACO INDÚSTRIA DE COMPRESSORES E SOLUÇÔES EM REFRIGERAÇÂO LTDA. (BR) 2022-04-26 US disclosed
CN-113372140-A Carbon-carbon composite comprising an antioxidant coating 霍尼韦尔国际公司 2021-09-10 CN disclosed
US-20180272381-A1 Plasma-Assisted Process of Ceramization of Polymer Precursor on Surface, Surface Comprising Ceramic Polymer WHIRLPOOL S.A. 2018-09-27 US disclosed
US-7754383-B2 Non-aqueous electrolyte secondary battery, negative electrode material therefor, and method of manufacturing the negative electrode material PANASONIC CORPORATION (JP) 2010-07-13 US disclosed
US-20080081260-A1 Non-Aqueous Electrolyte Secondary Battery, Negative Electrode Material Therefor, and Method of Manufacturing the Negative Electrode Material PANASONIC CORPORATION (JP) 2008-04-03 US disclosed
JP-H0878361-A MANUFACTURE OF SEMICONDUCTOR DEVICE NEC CORP 1996-03-22 JP disclosed
US-5138432-A Selective deposition of tungsten on TiSi2 CORNELL RESEARCH FOUNDATION, INC. (US) 1992-08-11 US disclosed
US-5023201-A Selective deposition of tungsten on TiSi2 CORNELL RESEARCH FOUNDATION, INC. (US) 1991-06-11 US disclosed