SCHEMBL349312

SCHEMBL349312

Cc1ccc(C(C)C(=O)O)cc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 12/20 0.63
PTGS1 P23219 8/20 0.59
AKR1C3 P42330 8/20 0.59
AKR1C2 P52895 7/20 0.59
CYP2C9 P11712 4/20 0.59
LMNA P02545 3/20 0.59
CXCR1 P25024 2/20 0.59
CXCR2 P25025 2/20 0.59
SLC22A6 Q4U2R8 2/20 0.59
TSHR P16473 2/20 0.59
ALB P02768 1/20 0.59
ESR1 P03372 1/20 0.59
ALOX5 P09917 1/20 0.59
RARB P10826 1/20 0.59
ADRB3 P13945 1/20 0.59
NFKB1 P19838 1/20 0.59
HTR2A P28223 1/20 0.59
NR1I3 Q14994 1/20 0.59
CXCL8 P10145 1/20 0.59
BLM P54132 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL597882 1.00 PTGS2 (0.63) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL3093415 1.00 PTGS2 (0.63) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
Water SCHEMBL30850045 0.98 PTGS2 (0.61) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL18205083 0.98 PTGS2 (0.61) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
Hydrochloric Acid SCHEMBL5846561 0.98 PTGS2 (0.61) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL22228509 0.94 PTGS2 (0.68) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
Formic Acid SCHEMBL30236894 0.92 PTGS2 (0.55) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
SCHEMBL59197 0.90 PTGS2 (0.74) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
Water SCHEMBL30850051 0.88 PTGS2 (0.52) PTGS2PTGS1AKR1C3AKR1C2CYP2C9
Trifluoroacetic Acid SCHEMBL30237172 0.88 AKR1C3 (0.57) PTGS2PTGS1AKR1C3AKR1C2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 296 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113929577-B Synthesis method of 2- (4-methylphenyl) -propionate 安徽美致诚药业有限公司 2023-09-29 CN claimed
EP-3692101-B1 BRILLIANT BLUE (BBG) DYE DERIVATIVES AND STAINING COMPOSITIONS COMPRISING THE SAME FOR SELECTIVELY STAINING BIOLOGICAL SUBSTRATES ALFA INSTR S R L (IT) 2022-01-12 EP claimed
CN-108642119-B Method for resolution of 2- (4-methylphenyl) propionic acid enantiomer by stereoselective enzyme catalytic esterification 湖南理工学院 2021-09-07 CN claimed
CN-107473960-B Method and device for preparing 2- (4-bromomethylphenyl) propionic acid in pipeline manner 浙江工业大学 2021-01-05 CN claimed
EP-3692101-A1 BRILLIANT BLUE (BBG) DYE DERIVATIVES AND STAINING COMPOSITIONS COMPRISING THE SAME FOR SELECTIVELY STAINING BIOLOGICAL SUBSTRATES Alfa Instruments S.r.l. (IT) 2020-08-12 EP claimed
CN-111349681-A Method for splitting 2- (4-methylphenyl) propionic acid enantiomer by using immobilized lipase to catalyze ester hydrolysis kinetics 湖南理工学院 2020-06-30 CN claimed
CN-110790662-A Production method of 2- (4-bromomethylphenyl) propionic acid 怀化泰通新材料科技有限公司 2020-02-14 CN claimed
WO-2019068935-A1 BRILLIANT BLUE (BBG) DYE DERIVATIVES AND STAINING COMPOSITIONS COMPRISING THE SAME FOR SELECTIVELY STAINING BIOLOGICAL SUBSTRATES ALFA INSTRUMENTS S.R.L. (IT) 2019-04-11 WO claimed
CN-103193620-B A kind of loxoprofen's key intermediate 2-for preparing is to the method for chloromethyl phenyl propionic acid ANHUI HERYI CHEMICALS CO., LTD. (CN) 2015-11-11 CN claimed
CN-104447284-A Synthetic method of 2-(4-bromomethyl phenyl) propionic acid CHEER FINE PHARMACEUTICAL ANHUI CO LTD 2015-03-25 CN claimed
US-7951765-B2 Photoresist stripper composition for semiconductor manufacturing TECHNO SEMICHEM CO., LTD. (KR) 2011-05-31 US claimed
EP-1913448-B1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO LTD (KR) 2010-10-13 EP claimed
US-20090312216-A1 Photoresist Stripper Composition for Semiconductor Manufacturing TECHNO SEMICHEM CO., LTD. (KR) 2009-12-17 US claimed
EP-1913448-A4 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO LTD (KR) 2008-11-05 EP claimed
EP-1913448-A1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING Techno Semichem Co., Ltd. (KR) 2008-04-23 EP claimed
WO-2007021085-A1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO., LTD. (KR) 2007-02-22 WO claimed
US-7012138-B1 Chiral polysaccharide esters, one of the methods for preparing them and their uses for obtaining optically enriched acids or for chiral chromatography UNIVERSITE DE DROIT D'ECONOMIE ET DES SCIENCES D'AIZ-MARSEILLE (FR) 2006-03-14 US claimed
EP-1135417-B1 POLYSACCHARIDE CHIRAL ESTERS, ONE OF THE METHODS FOR PREPARING THEM AND THEIR USES FOR OBTAINING OPTICALLY ENRICHED ACIDS OR CHIRAL CHROMATOGRAPHY UNIV DROIT D ECONOMIE ET DES S (FR) 2003-06-25 EP claimed
US-6398857-B1 ACCUSTIC PIEZOELECTRIC; HOT MELT INK JET PRINTING; BENZOIC ACID VEHICLE; ALKYL OR PHENYL CARBOXYLIC ACID VISCOSITY MODIFIER; RETAINS DESIRED HARDNESS XEROX CORPORATION 2002-06-04 US claimed
US-5006433-A Printing plate precursors for electrophotographic plate-making purposes FUJI PHOTO FILM CO., LTD. (JP) 1991-04-09 US claimed