Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | ACLY | P53396 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.38 |
| ▸ | ACACB | O00763 | 1/20 | 0.37 |
| ▸ | ACACA | Q13085 | 1/20 | 0.37 |
| ▸ | PPARA | Q07869 | 4/20 | 0.33 |
| ▸ | HMGCR | P04035 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | GUCY1A1 | Q02108 | 1/20 | 0.30 |
| ▸ | GUCY1B1 | Q02153 | 1/20 | 0.30 |
| ▸ | GGT1 | P19440 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL533621 | 1.00 | TSHR (0.40) | TSHRALDH1A1ACLYCYP2D6CYP2C19 | |
| SCHEMBL5286263 | 0.84 | CYP2D6 (0.38) | TSHRACLYCYP2D6CYP2C19HIF1A | |
| SCHEMBL9717310 | 0.81 | ACACB (0.35) | ACACBACACA | |
| SCHEMBL31068136 | 0.77 | TSHR (0.40) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL2865876 | 0.73 | — | — | |
| SCHEMBL16312713 | 0.72 | CYP2C9 (0.33) | TSHRALDH1A1ACLYCYP2D6CYP2C19 | |
| SCHEMBL797973 | 0.71 | TSHR (0.47) | TSHRALDH1A1ACLYCYP2D6CYP2C19 | |
| SCHEMBL320771 | 0.71 | ACLY (0.54) | TSHRALDH1A1ACLYCYP2D6CYP2C19 | |
| SCHEMBL539187 | 0.70 | TSHR (0.44) | TSHRALDH1A1CYP2D6CYP2C19HIF1A | |
| SCHEMBL10929506 | 0.70 | TSHR (0.44) | TSHRALDH1A1CYP2D6CYP2C19HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023238885-A1 | METHACRYLIC RESIN, METHOD FOR PRODUCING SAME, RESIN COMPOSITION AND RESIN FILM | 株式会社カネカ | 2023-12-14 | — | — | WO | claimed |
| US-7071270-B2 | Method for obtaining polybutadiene-based aqueous dispersions | ARKEMA (FR) | 2006-07-04 | — | — | US | claimed |
| US-20040106727-A1 | Method for obtaining polybutadiene based aqueous dispersions | ARKEMA FRANCE (FR) | 2004-06-03 | — | — | US | claimed |
| WO-2024024441-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND SILICONE-CONTAINING COPOLYMER PRODUCTION METHOD | DIC株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2024024440-A1 | SILICONE-CONTAINING COPOLYMER, LEVELING AGENT, COATING COMPOSITION, RESIST COMPOSITION, COLOR FILTER, AND METHOD FOR PRODUCING SILICONE-CONTAINING COPOLYMER | DIC株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11827738-B2 | Thiol-ene-curing compositions | MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) | 2023-11-28 | — | — | US | disclosed |
| EP-3348623-B1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION, PROCESS FOR PRODUCING SAME, AND PRESSURE-SENSITIVE ADHESIVE FILM | MITSUI CHEMICALS TOHCELLO INC (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| EP-3743452-B1 | THIOL-ENE-CURING COMPOSITIONS | MOMENTIVE PERFORMANCE MAT GMBH (DE) | 2023-06-07 | — | — | EP | disclosed |
| EP-4024131-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | FUJIFILM Corporation (JP) | 2022-07-06 | — | — | EP | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6136504-A | COMPRISING A COPOLYMER, A COMPOUND WHICH GENERATES AN ACID WHEN IRRADIATED WITH ACTINIC RAYS OR RADIATION, AND A SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| US-6008296-A | CURABLE MONOMER COMPOSITION COMPRISING A POLYISOCYANATE OR POLYTHIOISOCYANATE, POLYTHIOL, AND POLYENE OF GIVEN FORMULA; NO PHASE SEPERATION, SINGLE GLASS TRANSITION TEMPERATURE, IMPACT RESISTANCE AND HIGH REFRACTIVE INDEX FOR EYEGLASSES | OPTIMA, INC. (US) | 1999-12-28 | — | — | US | disclosed |
| EP-0186494-B1 | HEAT-DEVELOPABLE COLOR PHOTO-SENSITIVE MATERIAL | KONICA CORPORATION (JP) | 1989-08-09 | — | — | EP | disclosed |
| US-4650748-A | POLYMERIC DYES | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1987-03-17 | — | — | US | disclosed |
| EP-0186494-A2 | Heat-developable color photo-sensitive material | KONICA CORPORATION (JP) | 1986-07-02 | — | — | EP | disclosed |
| US-4105858-A | Quaternary salts of methacrylic or acrylic esters and cationic quaternary polyelectrolytes and ion exchange resins thereof | CESKOSLOVENSKA AKADEMIE VED (CS) | 1978-08-08 | — | — | US | disclosed |
| US-4077963-A | Quaternary salts of methacrylic or acrylic esters | CESKOSLOVENSAK AKADEMIE VED (CS) | 1978-03-07 | — | — | US | disclosed |
| US-4011204-A | QUATERNARY SALTS OF METHACRYLIC OR ACRYLIC ESTERS AND CATIONIC QUATERNAY POLYELECTROLYTES AND ION EXCHANGE RESINS THEREOF | CESKOSLOVENSKA AKADEMIE VED (CS) | 1977-03-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | TSHR 1473/4885ALDH1A1 2433/4885ACLY 2441/4885 |
| US-11687001-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | TSHR 1473/4885ALDH1A1 2433/4885ACLY 2441/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.