SCHEMBL351563

SCHEMBL351563

C=CCOCOC(=O)C(=C)c1cccc(C)c1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 3/20 0.41
CYP2D6 P10635 1/20 0.39
ALDH1A1 P00352 4/20 0.37
TSHR P16473 2/20 0.37
HSD17B10 Q99714 1/20 0.37
MEN1 O00255 4/20 0.36
KMT2A Q03164 4/20 0.36
CXCR5 P32302 1/20 0.35
GAA P10253 3/20 0.35
DHODH Q02127 1/20 0.35
MAPT P10636 2/20 0.34
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
TAS1R3 Q7RTX0 1/20 0.33
TAS1R1 Q7RTX1 1/20 0.33
TAS1R2 Q8TE23 1/20 0.33
LIG1 P18858 1/20 0.33
ATM Q13315 1/20 0.32
TP53 P04637 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352677 0.89 CYP3A4 (0.46) CYP3A4ALDH1A1TSHRHSD17B10MEN1
SCHEMBL352348 0.89 CYP3A4 (0.36) CYP3A4CYP2D6ALDH1A1TSHRHSD17B10
SCHEMBL352597 0.79 CYP3A4 (0.44) CYP3A4CYP2D6ALDH1A1TSHRHSD17B10
SCHEMBL9422015 0.76 CYP3A4 (0.67) CYP3A4CYP2D6ALDH1A1TSHRHSD17B10
SCHEMBL351043 0.75 CYP3A4 (0.44) CYP3A4ALDH1A1TSHRHSD17B10KMT2A
SCHEMBL350183 0.70 CYP3A4 (0.41) CYP3A4CYP2D6ALDH1A1TSHRHSD17B10
SCHEMBL19837874 0.69 POLB (0.42) CYP3A4ALDH1A1MEN1KMT2AGAA
SCHEMBL352553 0.69 ALDH1A1 (0.38) ALDH1A1HSD17B10MEN1KMT2AMAPT
SCHEMBL36393 0.68 THRB (0.46) CYP3A4ALDH1A1TSHRMEN1KMT2A
SCHEMBL9349886 0.68 HSD17B10 (0.47) CYP3A4ALDH1A1TSHRHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed