Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 5/20 | 0.40 |
| ▸ | TET3 | O43151 | 1/20 | 0.40 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.40 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.39 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.39 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.39 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | PEPD | P12955 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CTH | P32929 | 1/20 | 0.30 |
| ▸ | CBS | P35520 | 1/20 | 0.30 |
| ▸ | THPO | P40225 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15136484 | 0.87 | TET2 (0.35) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL19611128 | 0.86 | — | — | |
| SCHEMBL632280 | 0.84 | — | — | |
| SCHEMBL29167702 | 0.84 | — | — | |
| SCHEMBL28329018 | 0.83 | TSHR (0.32) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL353003 | 0.83 | ALDH1A1 (0.41) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL277984 | 0.82 | TSHR (0.41) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL1870176 | 0.82 | TET2 (0.36) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL1870174 | 0.82 | TET2 (0.36) | TET2TET3TET1GRIK1GRIK2 | |
| SCHEMBL195104 | 0.82 | GRIK1 (0.35) | TET2TET3TET1GRIK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-1996015667-A2 | ANTIDOTE COMPOSITION AND METHOD FOR USE OF THE COMPOSITION | Nitrokémia Rt. (HU) | 1996-05-30 | — | — | WO | claimed |
| EP-0561230-B1 | Polymethacrylimide with high heat distortion resistance | BASF AG (DE) | 1996-05-29 | — | — | EP | claimed |
| EP-0548737-B1 | Process for preparing oxadimethyl acrylic acid | BASF AG (DE) | 1996-03-27 | — | — | EP | claimed |
| US-5442109-A | Preparation of oxadimethacrylic acid | BASF AKTIENGESELLSCHAFT (DE) | 1995-08-15 | — | — | US | claimed |
| EP-0548737-A2 | Process for preparing oxadimethyl acrylic acid | BASF Aktiengesellschaft (DE) | 1993-06-30 | — | — | EP | claimed |
| US-20250277073-A1 | CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | FUJIFILM CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| WO-2025005182-A1 | CURABLE COMPOSITION, CURED PRODUCT THEREOF, AND ARTICLE | 株式会社日本触媒 | 2025-01-02 | — | — | WO | disclosed |
| WO-2024203854-A1 | METHOD FOR STORING ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, ETHER GROUP-CONTAINING POLYVALENT UNSATURATED COMPOUND COMPOSITION, MONOMER COMPOSITION, TETRAHYDROPYRAN RING POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, MEMBER FOR DISPLAY DEVICE, AND METHOD FOR PRODUCING SAME | 株式会社日本触媒 | 2024-10-03 | — | — | WO | disclosed |
| US-20240287231-A1 | CURABLE RESIN COMPOSITION AND METHOD OF MANUFACTURING ARTICLE | CANON KK (JP) | 2024-08-29 | — | — | US | disclosed |
| WO-2024128086-A1 | CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | 富士フイルム株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-11987658-B2 | Curable resin composition and method of manufacturing article | CANON KABUSHIKI KAISHA (JP) | 2024-05-21 | — | — | US | disclosed |
| WO-2023248976-A1 | POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME | 株式会社日本触媒 | 2023-12-28 | — | — | WO | disclosed |
| EP-0548737-A2 | Process for preparing oxadimethyl acrylic acid | BASF Aktiengesellschaft (DE) | 1993-06-30 | — | — | EP | disclosed |
| EP-0548737-A2 | Process for preparing oxadimethyl acrylic acid | BASF Aktiengesellschaft (DE) | 1993-06-30 | — | — | EP | disclosed |
| EP-0031593-B1 | RADIATION-POLYMERIZABLE COMPOSITION AND RADIATION-SENSIBLE COPYING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-07-25 | — | — | EP | disclosed |
| EP-0031592-B1 | PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOPOLYMERIZABLE COPYING MATERIAL PRODUCED THEREWITH | HOECHST AKTIENGESELLSCHAFT (DE) | 1983-12-07 | — | — | EP | disclosed |
| US-4327170-A | Photopolymerizable unsaturated polyesters and copying material prepared therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-04-27 | — | — | US | disclosed |
| US-4322491-A | BINDER, PHOTOINITIATOR, AND AN UNSATURATED COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1982-03-30 | — | — | US | disclosed |
| EP-0031593-A1 | Radiation-polymerizable composition and radiation-sensible copying material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-07-08 | — | — | EP | disclosed |
| EP-0031592-A1 | Photopolymerizable composition and photopolymerizable copying material produced therewith | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-07-08 | — | — | EP | disclosed |