SCHEMBL3519645

SCHEMBL3519645

COC(=O)C(=Cc1ccc(O)cc1)C(=O)OC

nearest known ligand 0.71

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.62
ALDH1A1 P00352 2/20 0.62
CA12 O43570 1/20 0.52
CA1 P00915 1/20 0.52
CA2 P00918 1/20 0.52
TYR P14679 1/20 0.52
CA7 P43166 1/20 0.52
CA9 Q16790 1/20 0.52
CA14 Q9ULX7 1/20 0.52
ABCG2 Q9UNQ0 2/20 0.50
MAPT P10636 2/20 0.50
HPGD P15428 1/20 0.50
POLB P06746 1/20 0.48
SNCA P37840 1/20 0.48
MIF P14174 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13552273 0.92 MAPT (0.56) MAPTHPGD
SCHEMBL15426941 0.91 KDM4E (0.56) KDM4EALDH1A1CA12CA1CA2
SCHEMBL6508831 0.91 ALDH1A1 (0.72) KDM4EALDH1A1CA12CA1CA2
SCHEMBL6508829 0.91 ALDH1A1 (0.72) KDM4EALDH1A1CA12CA1CA2
SCHEMBL6505926 0.86 KDM4E (0.51) KDM4EALDH1A1CA12CA1CA2
SCHEMBL8138421 0.84 MAPT (0.50) KDM4EALDH1A1MAPTHPGD
SCHEMBL77732 0.83 MEN1 (0.63) MAPTHPGD
SCHEMBL2414235 0.82 MAPT (0.49) MAPTHPGD
SCHEMBL2812581 0.82 MAPT (0.67) MAPTHPGD
SCHEMBL3921874 0.82 MAPT (0.67) MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4735958-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2026-05-06 EP claimed
EP-4630153-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2025-10-15 EP claimed
EP-4506422-A1 ECO-EFFECTIVE ROAD MARKING COMPOSITION SUITABLE FOR THE BIOSPHERE Triflex GmbH & Co. KG (DE) 2025-02-12 EP claimed
US-20250010291-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. 2025-01-09 US claimed
WO-2025006431-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2025-01-02 WO claimed
US-20240219835-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. 2024-07-04 US claimed
WO-2024123748-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2024-06-13 WO claimed
EP-4735958-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2026-05-06 EP disclosed
EP-4630153-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2025-10-15 EP disclosed
EP-4506422-A1 ECO-EFFECTIVE ROAD MARKING COMPOSITION SUITABLE FOR THE BIOSPHERE Triflex GmbH & Co. KG (DE) 2025-02-12 EP disclosed
US-20250010291-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. 2025-01-09 US disclosed
WO-2025006431-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2025-01-02 WO disclosed
US-20240219835-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. 2024-07-04 US disclosed
WO-1994013650-A1 HETEROCYCLIC DERIVATIVES AND THEIR USE IN PHARMACEUTICALS SMITHKLINE BEECHAM PLC (GB) 1994-06-23 WO disclosed
EP-0141140-B1 BENZYLIDENE MALONIC ACID POLYESTERS, PROCESS FOR THEIR PREPARATION AND THE USE OF SUCH POLYESTERS IN THE STABILISATION OF THERMOPLASTIC RESINS AGAINST U.V. BAYER AG (DE) 1987-01-21 EP disclosed
US-4588807-A ANTIASTHMA, ANTIULCERE, ANTICOAGULANT BAYER AKTIENGESELLSCHAFT (DE) 1986-05-13 US disclosed
EP-0141140-A1 Benzylidene malonic acid polyesters, process for their preparation and the use of such polyesters in the stabilisation of thermoplastic resins against U.V. BAYER AG (DE) 1985-05-15 EP disclosed
US-4158658-A Bichromophoric benzoxazole-styrene ultraviolet stabilizers and their use in organic compositions EASTMAN KODAK COMPANY (US) 1979-06-19 US disclosed
US-4075162-A BICHROMOPHORIC BENZOXAZOLE-STYRENE ULTRAVIOLET STABILIZERS AND THEIR USE IN ORGANIC COMPOSITIONS EASTMAN KODAK COMPANY (US) 1978-02-21 US disclosed
US-3943094-A Polymers and copolymers based on alkenoyl-oxybenzylidene-malonic esters as UV-absorbers and polymers stabilized therewith BAYER AKTIENGESELLSCHAFT (DT) 1976-03-09 US disclosed