Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 9/20 | 0.72 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.72 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.52 |
| ▸ | AR | P10275 | 1/20 | 0.52 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.52 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.52 |
| ▸ | HTR6 | P50406 | 1/20 | 0.52 |
| ▸ | ESRRG | P62508 | 1/20 | 0.52 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.52 |
| ▸ | CNR1 | P21554 | 3/20 | 0.42 |
| ▸ | CNR2 | P34972 | 3/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.42 |
| ▸ | TYR | P14679 | 2/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.37 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29670387 | 1.00 | ESR1 (0.72) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL686940 | 0.91 | ESR1 (0.62) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL13609974 | 0.85 | ESR1 (0.65) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL26968 | 0.85 | ESR1 (1.00) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL22271986 | 0.84 | ESR1 (0.63) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL7550596 | 0.83 | ESR1 (0.73) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL10905122 | 0.83 | ESR1 (0.54) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL1448894 | 0.81 | ESR1 (0.60) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL29599541 | 0.81 | ESR1 (0.60) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 | |
| SCHEMBL18635220 | 0.81 | ESR1 (0.69) | ESR1ESR2CYP3A4ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117751327-A | Positive photosensitive resin composition containing specific copolymer | 日产化学株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-108333869-B | Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element | JSR株式会社 | 2023-07-18 | — | — | CN | disclosed |
| WO-2023007941-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SPECIFIC COPOLYMER | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| WO-2023007972-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| CN-108732831-B | Resin composition, substrate and element comprising same, and method for producing same | JSR株式会社 | 2022-08-16 | — | — | CN | disclosed |
| CN-114488688-A | Liquid crystal display element, method for producing same, and radiation-sensitive resin composition | JSR株式会社 | 2022-05-13 | — | — | CN | disclosed |
| CN-111352301-A | Radiation-sensitive resin composition and method for forming microlens | JSR株式会社 | 2020-06-30 | — | — | CN | disclosed |
| CN-104871089-B | Photosensitive resin composition, method for producing cured film, organic EL display device, and liquid crystal display device | 富士胶片株式会社 | 2020-01-14 | — | — | CN | disclosed |
| CN-103543607-B | Organic EL element, radiation sensitive linear resin composition and cured film | JSR株式会社 | 2019-11-29 | — | — | CN | disclosed |
| CN-104820340-A | Manufacturing method for hardened film of display element, photoreceptive and radioactive resin composition, applications and heating device | JSR KK | 2015-08-05 | — | — | CN | disclosed |
| CN-102566278-B | Siloxane polymer composition, cured film and method for forming the cured film | JSR CORP | 2015-01-21 | — | — | CN | disclosed |
| CN-102870045-B | Positive Radiation-sensitive Composition For Discharge Nozzle Coating Method, Interlayer Insulating Film For Display Element, And Formation Method For Same | JSR CORP | 2014-11-19 | — | — | CN | disclosed |
| CN-102213918-B | Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-103923426-A | Resin Composition, Cured Film, Forming Method Thereof, Semiconductor Element And Display Element | JSR CORP | 2014-07-16 | — | — | CN | disclosed |
| CN-103543607-A | Organic EL element, radiation-sensitive resin composition, and cured film | JSR CORP | 2014-01-29 | — | — | CN | disclosed |
| US-20140014928-A1 | ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM | JSR CORPORATION (JP) | 2014-01-16 | — | — | US | disclosed |
| US-8535873-B2 | Photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20120015300-A1 | PHOTOSENSITIVE RESIN COMPOSITION | RESONAC CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110281040-A1 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF | JSR CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |