Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 12/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.62 |
| ▸ | HPGD | P15428 | 2/20 | 0.62 |
| ▸ | AR | P10275 | 1/20 | 0.62 |
| ▸ | TSHR | P16473 | 1/20 | 0.62 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.62 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.62 |
| ▸ | HTR6 | P50406 | 1/20 | 0.62 |
| ▸ | ESRRG | P62508 | 1/20 | 0.62 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | TYR | P14679 | 2/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.43 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | MIF | P14174 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13609974 | 0.93 | ESR1 (0.65) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL352398 | 0.91 | ESR1 (0.72) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL29670387 | 0.91 | ESR1 (0.72) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL22271986 | 0.89 | ESR1 (0.63) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL10429639 | 0.87 | ESR1 (0.52) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL4055230 | 0.85 | ALDH1A1 (0.63) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL246193 | 0.85 | ESR1 (0.60) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL10907583 | 0.85 | ESR1 (0.47) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL29372571 | 0.85 | ESR1 (0.60) | ESR1ESR2HSD17B10CYP3A4HPGD | |
| SCHEMBL353669 | 0.85 | ESR1 (0.46) | ESR1ESR2HSD17B10CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 254 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023024783-A1 | POSITIVE PHOTORESIST AND PREPARATION METHOD, PREPARATION METHOD FOR GLASS HOUSING, AND ELECTRONIC DEVICE | OPPO广东移动通信有限公司 | 2023-03-02 | — | — | WO | claimed |
| CN-113307725-A | Preparation method of 4, 6-bis [1- (4-hydroxyphenyl) -1-methylethyl ] -1, 3-benzenediol | 辽宁靖帆新材料有限公司 | 2021-08-27 | — | — | CN | claimed |
| CN-110806677-A | Photoresist composition, pattern forming method and application thereof | 常州强力先端电子材料有限公司 | 2020-02-18 | — | — | CN | claimed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| EP-1614005-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-01-11 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088424-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| EP-0706090-B1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-03 | — | — | EP | claimed |
| JP-4364147-A | — | — | None | — | — | JP | disclosed |
| JP-7285900-A | — | — | None | — | — | JP | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| JP-H07285900-A | PRODUCTION OF 1,3-DIHYDROXY-4,6-BIS(ALPHA-METHYL-ALPHA-(4'-HYDROXYPHENYL)ETHYL)BENZENE | MITSUI TOATSU CHEM INC | 1995-10-31 | — | — | JP | disclosed |
| JP-H04364147-A | 1,3-DIHYDROXY-4,6-BIS(ALPHA-METHYL-ALPHA-(4'-HYDROXYPHENYL) ETHYL)BENZENE AND ITS PRODUCTION | MITSUI TOATSU CHEM INC | 1992-12-16 | — | — | JP | disclosed |