Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | ALOX12 | P18054 | 3/20 | 0.41 |
| ▸ | ESR1 | P03372 | 3/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | TTR | P02766 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | SLCO2B1 | O94956 | 1/20 | 0.36 |
| ▸ | SHBG | P04278 | 1/20 | 0.36 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30497725 | 1.00 | LMNA (0.47) | LMNASMN1; SMN2KDM4ETDP1L3MBTL1 | |
| SCHEMBL24299405 | 0.75 | FTO (0.55) | LMNAKDM4ETDP1MAPTMEN1 | |
| SCHEMBL30717253 | 0.75 | FTO (0.55) | LMNAKDM4ETDP1MAPTMEN1 | |
| SCHEMBL772979 | 0.75 | FTO (0.55) | LMNAKDM4ETDP1MAPTMEN1 | |
| SCHEMBL11357106 | 0.74 | KDM4E (0.50) | LMNASMN1; SMN2KDM4ETDP1L3MBTL1 | |
| SCHEMBL13615616 | 0.73 | FTO (0.43) | LMNAKDM4ETDP1MAPTMEN1 | |
| SCHEMBL11370996 | 0.72 | LMNA (0.45) | LMNASMN1; SMN2KDM4ETDP1L3MBTL1 | |
| SCHEMBL674309 | 0.71 | ESR2 (0.41) | LMNAMAPTMEN1KMT2ATHRB | |
| SCHEMBL29374049 | 0.71 | ESR2 (0.41) | LMNAMAPTMEN1KMT2ATHRB | |
| SCHEMBL11476249 | 0.69 | MAPT (0.46) | LMNASMN1; SMN2KDM4ETDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117751327-A | Positive photosensitive resin composition containing specific copolymer | 日产化学株式会社 | 2024-03-22 | — | — | CN | disclosed |
| CN-117677901-A | Positive photosensitive resin composition | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117590689-A | Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition | JSR株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-108333869-B | Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element | JSR株式会社 | 2023-07-18 | — | — | CN | disclosed |
| CN-113589647-A | Radiation-sensitive composition, method for producing cured film, semiconductor element, and display element | JSR株式会社 | 2021-11-02 | — | — | CN | disclosed |
| WO-2020240993-A1 | RESIN COMPOSITION AND RESIN FILM | 昭和電工株式会社 | 2020-12-03 | — | — | WO | disclosed |
| CN-104871089-B | Photosensitive resin composition, method for producing cured film, organic EL display device, and liquid crystal display device | 富士胶片株式会社 | 2020-01-14 | — | — | CN | disclosed |
| CN-103543607-B | Organic EL element, radiation sensitive linear resin composition and cured film | JSR株式会社 | 2019-11-29 | — | — | CN | disclosed |
| CN-110286561-A | Radiation sensitive compositions, cured film and display element | JSR株式会社 | 2019-09-27 | — | — | CN | disclosed |
| CN-102859439-B | Positive radiation-sensitive composition, display element interlayer dielectric and forming method thereof | JSR株式会社 | 2017-06-30 | — | — | CN | disclosed |
| US-8535873-B2 | Photosensitive resin composition | SHOWA DENKO K.K. (JP) | 2013-09-17 | — | — | US | disclosed |
| CN-101515113-B | Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same | JSR CORP | 2012-07-18 | — | — | CN | disclosed |
| US-20120015300-A1 | PHOTOSENSITIVE RESIN COMPOSITION | RESONAC CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| CN-101025567-B | Radiation-sensitive resin composition, method for forming spacer and spacer | JSR CO., LTD. (JP) | 2011-12-14 | — | — | CN | disclosed |
| US-20110281040-A1 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF | JSR CORPORATION (JP) | 2011-11-17 | — | — | US | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| EP-0735423-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 1999-03-03 | — | — | EP | disclosed |
| US-5672459-A | PHOTORESISTS, INTEGRATED CIRCUITS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-30 | — | — | US | disclosed |
| EP-0735423-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-10-02 | — | — | EP | disclosed |