Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMO | O15229 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.30 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.30 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL683462 | 0.90 | KMO (0.38) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL2758386 | 0.90 | KMO (0.38) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL2758385 | 0.90 | KMO (0.38) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL2317192 | 0.88 | KMO (0.37) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL2758387 | 0.88 | HDAC8 (0.36) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL2758390 | 0.88 | FABP3 (0.31) | — | |
| SCHEMBL2758389 | 0.84 | HDAC8 (0.33) | LMNAHTTKMOACMSD | |
| SCHEMBL19140888 | 0.84 | ESR2 (0.38) | LMNAHTTKMOSMN1; SMN2ACMSD | |
| SCHEMBL19853088 | 0.82 | — | — | |
| SCHEMBL10149888 | 0.82 | KMO (0.35) | LMNAHTTKMOSMN1; SMN2ACMSD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8808965-B2 | Pattern forming method, pattern, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20120322007-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-12-20 | — | — | US | disclosed |
| US-20120094235-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |