⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24859823 | 0.92 | KDM4E (0.30) | — | |
| SCHEMBL19849825 | 0.84 | ESR1 (0.31) | — | |
| SCHEMBL3529059 | 0.82 | LMNA (0.33) | — | |
| SCHEMBL2758391 | 0.82 | HSP90AA1 (0.38) | — | |
| SCHEMBL18133725 | 0.82 | HSP90AA1 (0.38) | — | |
| SCHEMBL18031578 | 0.81 | ESR1 (0.37) | — | |
| SCHEMBL2758386 | 0.79 | KMO (0.38) | — | |
| SCHEMBL683462 | 0.79 | KMO (0.38) | — | |
| SCHEMBL2758385 | 0.79 | KMO (0.38) | — | |
| SCHEMBL22005483 | 0.78 | DEGS1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11124477-B2 | Sulfonium compound, positive resist composition, and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-21 | — | — | US | disclosed |
| US-10725377-B2 | Chemically amplified negative resist composition and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20200071268-A1 | SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| US-10416558-B2 | Positive resist composition, resist pattern forming process, and photomask blank | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-20180180998-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180039177-A1 | POSITIVE RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK BLANK | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-08 | — | — | US | disclosed |