SCHEMBL352988

SCHEMBL352988

C=CCOCC(=C)C(=O)OCCOCCOCC

nearest known ligand 0.53

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.53
TSHR P16473 6/20 0.42
ALDH1A1 P00352 3/20 0.42
HSD17B10 Q99714 3/20 0.38
TP53 P04637 2/20 0.38
HIF1A Q16665 2/20 0.38
TDP1 Q9NUW8 1/20 0.36
MEN1 O00255 1/20 0.32
POLB P06746 1/20 0.32
KMT2A Q03164 1/20 0.32
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352472 0.98 THRB (0.54) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL25803012 0.92 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL25803015 0.92 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL25803009 0.92 ALDH1A1 (0.44) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL353371 0.88 TSHR (0.38) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL351803 0.88 TSHR (0.38) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL31302844 0.88 TSHR (0.38) THRBTSHRALDH1A1HSD17B10TP53
SCHEMBL353022 0.85 TDP1 (0.38) THRBTSHRALDH1A1TDP1MEN1
SCHEMBL350219 0.85 ALDH1A1 (0.40) THRBTSHRALDH1A1HSD17B10TDP1
SCHEMBL28903556 0.84 TDP1 (0.41) THRBTSHRALDH1A1HSD17B10TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023248976-A1 POLYMER AND METHOD FOR PRODUCING SAME, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND MONOMER COMPOUND AND METHOD FOR PRODUCING SAME 株式会社日本触媒 2023-12-28 WO disclosed
WO-2023127300-A1 NON-AQUEOUS SECONDARY BATTERY BINDER POLYMER, NON-AQUEOUS SECONDARY BATTERY BINDER COMPOSITION, AND NON-AQUEOUS SECONDARY BATTERY ELECTRODE 株式会社レゾナック 2023-07-06 WO disclosed
WO-2020162475-A1 CURABLE RESIN COMPOSITION キヤノン株式会社 2020-08-13 WO disclosed
US-20180037758-A1 Ink Composition For Three-Dimensional Modeling, Ink Set, And Method For Producing Three-Dimensional Model Konica Minolta, Inc. (JP) 2018-02-08 US disclosed
EP-2415751-B1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON CATALYTIC CHEM IND (JP) 2014-11-26 EP disclosed
US-8796492-B2 α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-08-05 US disclosed
EP-2415751-A1 ALPHA-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2012-02-08 EP disclosed
US-20120016095-A1 a-(UNSATURATED ALKOXYALKYL) ACRYLATE COMPOSITION AND PROCESS FOR PRODUCTION THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2012-01-19 US disclosed