Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 3/20 | 0.61 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.55 |
| ▸ | TTR | P02766 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | ALB | P02768 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.44 |
| ▸ | CASP1 | P29466 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 3/20 | 0.43 |
| ▸ | CA2 | P00918 | 3/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16319843 | 0.87 | PTPN1 (0.55) | PTPN1CYP3A4TSHRTDP1MEN1 | |
| SCHEMBL6947008 | 0.86 | PTPN1 (0.55) | PTPN1MEN1KMT2ACRHBPCRHR2 | |
| SCHEMBL31169642 | 0.83 | SHBG (0.55) | PTPN1CYP3A4TSHRTDP1HSD17B10 | |
| SCHEMBL69899 | 0.83 | SHBG (0.55) | PTPN1CYP3A4TSHRTDP1HSD17B10 | |
| SCHEMBL8822860 | 0.83 | PTPN1 (0.52) | PTPN1CYP3A4TSHRTDP1TTR | |
| SCHEMBL7873997 | 0.82 | CYP3A4 (0.55) | PTPN1CYP3A4TSHRTDP1TTR | |
| SCHEMBL719722 | 0.80 | TSHR (0.52) | PTPN1CYP3A4TSHRTDP1TTR | |
| SCHEMBL9800750 | 0.80 | TSHR (0.52) | PTPN1CYP3A4TSHRTDP1TTR | |
| Water SCHEMBL31169652 | 0.79 | SHBG (0.52) | PTPN1CYP3A4TSHRTDP1HSD17B10 | |
| SCHEMBL14760237 | 0.78 | CYP3A4 (0.54) | PTPN1CYP3A4TSHRHSD17B10MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 770 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116144029-B | Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-03-18 | — | — | CN | claimed |
| CN-116144029-A | Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device | 阜阳欣奕华材料科技有限公司 | 2023-05-23 | — | — | CN | claimed |
| EP-1757634-B2 | POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER USING SAME | IDEMITSU KOSAN CO (JP) | 2022-05-25 | — | — | EP | claimed |
| CN-104603176-B | The co- phosphonate ester of polyester | FRX聚合物股份有限公司 | 2018-12-28 | — | — | CN | claimed |
| US-9695278-B2 | Polyester co-phosphonates | FRX POLYMERS, INC. (US) | 2017-07-04 | — | — | US | claimed |
| EP-2867272-A1 | POLYESTER CO-PHOSPHONATES | FRX Polymers, Inc. (US) | 2015-05-06 | — | — | EP | claimed |
| WO-2014005136-A1 | POLYESTER CO-PHOSPHONATES | FRX POLYMERS, INC. (US) | 2014-01-03 | — | — | WO | claimed |
| US-20140000751-A1 | POLYESTER CO-PHOSPHONATES | DOSKOCIL MANUFACTURING COMPANY, INC. | 2014-01-02 | — | — | US | claimed |
| US-5357027-A | Fireproof, heat resistant, impact resistant molding materials | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 1994-10-18 | — | — | US | claimed |
| EP-0333002-B1 | Heat-resistant resin composition | IDEMITSU PETROCHEMICAL CO (JP) | 1994-04-27 | — | — | EP | claimed |
| EP-0333002-A2 | Heat-resistant resin composition | IDEMITSU PETROCHEMICAL CO. LTD. (JP) | 1989-09-20 | — | — | EP | claimed |
| US-4599397-A | MELT-MOLDABLE | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1986-07-08 | — | — | US | claimed |
| US-4520208-A | AND ISOPHTHALIC ACID UNITS | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1985-05-28 | — | — | US | claimed |
| US-4206100-A | AROMATIC COPOLYESTER OF A BISPHENOL, POLYAMIDE, METAL OXIDE OR SALT ALKYLENE | UNITIKA LTD. (JP) | 1980-06-03 | — | — | US | claimed |
| US-4187358-A | AROMATIC POLYESTER, ACYCLIC POLYAMIDE, IONOMER | UNITIKA LTD. (JP) | 1980-02-05 | — | — | US | claimed |
| JP-7118517-A | — | — | None | — | — | JP | disclosed |
| CN-122072433-A | Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device | 日铁化学材料株式会社 | 2026-05-22 | — | — | CN | disclosed |
| US-4051106-A | High molecular weight copolyester resins having a high degree of alternating structure | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1977-09-27 | — | — | US | disclosed |
| US-4049629-A | PREPARING POLYESTERS BY REACTING A DIACID HALIDE AND A SUBSTITUTED BISPHENOL AND A GLYCOL | HOOKER CHEMICALS & PLASTICS CORPORATION (US) | 1977-09-20 | — | — | US | disclosed |
| US-3957905-A | HALOGENATED BISPHENYL COMPOUND, ANTIMONY COMPOUND | TOYO BOSEKI KABUSHIKI KAISHA (JA) | 1976-05-18 | — | — | US | disclosed |