Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.72 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.72 |
| ▸ | MEN1 | O00255 | 2/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.62 |
| ▸ | RAB9A | P51151 | 1/20 | 0.62 |
| ▸ | HTT | P42858 | 1/20 | 0.60 |
| ▸ | MAPT | P10636 | 6/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.58 |
| ▸ | HPGD | P15428 | 3/20 | 0.58 |
| ▸ | RECQL | P46063 | 3/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.54 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.53 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29670589 | 1.00 | SLC22A6 (0.72) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL19003423 | 0.87 | HDAC1 (0.72) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL19003376 | 0.86 | HDAC1 (0.60) | SLC22A6SLC22A8MAPTKDM4EHSD17B10 | |
| SCHEMBL15814046 | 0.84 | SLC22A6 (1.00) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL18127697 | 0.83 | ALDH1A1 (0.69) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL29215760 | 0.80 | CYP3A4 (0.60) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL93601 | 0.80 | MAPT (0.69) | MEN1KMT2ARAB9AHTTMAPT | |
| SCHEMBL9639006 | 0.80 | MAPT (0.65) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL7369813 | 0.80 | SLC22A6 (0.89) | SLC22A6SLC22A8MEN1KMT2ARAB9A | |
| SCHEMBL5703332 | 0.79 | HDAC1 (0.75) | MEN1KMT2AMAPTKDM4EHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101355056-B | Method for manufacturing thin film transistor substrate and photosensitive composition used in the substrate | SAMSUNG DISPLAY CO LTD | 2014-02-26 | — | — | CN | claimed |
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| EP-4131622-B1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12424705-B2 | Separator for lithium secondary battery, method for manufacturing same, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-20230098650-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION, LTD. (KR) | 2023-03-30 | — | — | US | disclosed |
| EP-4131622-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG Energy Solution, Ltd. (KR) | 2023-02-08 | — | — | EP | disclosed |
| WO-2023007972-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| WO-2023007941-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SPECIFIC COPOLYMER | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| EP-0633499-A1 | Radiation sensitive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |
| EP-0365318-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-03-16 | — | — | EP | disclosed |
| US-5238775-A | Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-24 | — | — | US | disclosed |
| EP-0554101-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-08-04 | — | — | EP | disclosed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0443820-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-08-28 | — | — | EP | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |