⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL28213257 | 0.95 | — | — | |
| Diethylamine SCHEMBL15105159 | 0.82 | TP53 (0.53) | — | |
| SCHEMBL1047729 | 0.79 | — | — | |
| SCHEMBL18991387 | 0.76 | — | — | |
| SCHEMBL2876580 | 0.74 | — | — | |
| SCHEMBL3978918 | 0.71 | — | — | |
| SCHEMBL2269522 | 0.71 | — | — | |
| SCHEMBL4861233 | 0.71 | — | — | |
| SCHEMBL3129601 | 0.70 | — | — | |
| SCHEMBL35656 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1186 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | claimed |
| US-12628578-B2 | Substrate processing method | ASM IP HOLDING B.V. (NL) | 2026-05-12 | — | — | US | claimed |
| US-12546000-B2 | Substrate processing method | ASM IP HOLDING B.V. (NL) | 2026-02-10 | — | — | US | claimed |
| US-20260035783-A1 | SIN FILM EMBEDDING METHOD AND FILM FORMATION APPARATUS | TOKYO ELECTRON LTD (JP) | 2026-02-05 | — | — | US | claimed |
| US-12540387-B2 | Simultaneous selective deposition of two different materials on two different surfaces | ASM IP HOLDING B.V. (NL) | 2026-02-03 | — | — | US | claimed |
| US-20260028712-A1 | SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES | ASM IP HOLDING BV (NL) | 2026-01-29 | — | — | US | claimed |
| US-20260002264-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING BV (NL) | 2026-01-01 | — | — | US | claimed |
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250297360-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-09-25 | — | — | US | claimed |
| US-12392038-B2 | Thin-film deposition method and system | ASM IP HOLDING B.V. (NL) | 2025-08-19 | — | — | US | claimed |
| EP-2144279-A2 | Aminosilanes for shallow trench isolation films | Air Products and Chemicals, Inc. (US) | 2010-01-13 | — | — | EP | claimed |
| CN-101472931-A | Organometallic compounds | PRAXAIR TECHNOLOGY INC (US) | 2009-07-01 | — | — | CN | claimed |
| US-7442822-B2 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-28 | — | — | US | claimed |
| EP-1967609-A2 | Plasma enhanced cyclic chemical vapor deposition of silicon-containing films | Air Products and Chemicals, Inc. (US) | 2008-09-10 | — | — | EP | claimed |
| US-20080207007-A1 | Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-28 | — | — | US | claimed |
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | claimed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | claimed |
| CN-101171366-A | Method of forming silicon oxide containing films | AIR LIQUIDE (FR) | 2008-04-30 | — | — | CN | claimed |
| US-20080058541-A1 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins | VERSUM MATERIALS US, LLC | 2008-03-06 | — | — | US | claimed |
| EP-1894934-A1 | Stabilization of Nitrogen-Containing and Oxygen-Containing Organosilanes Using Weakly Basic Ion-Exchange Resins | Air Products and Chemicals, Inc. (US) | 2008-03-05 | — | — | EP | claimed |