⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14237010 | 0.83 | CA12 (0.35) | — | |
| SCHEMBL18991299 | 0.77 | — | — | |
| SCHEMBL29771278 | 0.75 | — | — | |
| SCHEMBL35443 | 0.71 | — | — | |
| SCHEMBL9287377 | 0.71 | DNM1 (0.39) | — | |
| SCHEMBL1047729 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL28213257 | 0.68 | — | — | |
| SCHEMBL806005 | 0.67 | — | — | |
| SCHEMBL35704 | 0.67 | CYP1A2 (0.46) | — | |
| Hydrochloric Acid SCHEMBL11597307 | 0.65 | CYP1A2 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101587304-B | Pattern transferring method | SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION (CN) | 2011-11-30 | — | — | CN | claimed |
| CN-101640170-A | Photoetching method capable of reducing width of exposure pattern | SEMICONDUCTOR MFG INT SHANGHAI | 2010-02-03 | — | — | CN | claimed |
| CN-101587304-A | Pattern transferring method | SEMICONDUCTOR MFG INT BEIJING (CN) | 2009-11-25 | — | — | CN | claimed |
| CN-115216055-A | Preparation method of perfume volatilization medium graphite core rod | 浙江美之源化妆品有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-109427619-A | Substrate processing method using same and substrate board treatment | 株式会社斯库林集团 | 2019-03-05 | — | — | CN | disclosed |
| CN-101452225-B | Developing method for photoresist mask pattern | SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION (CN) | 2011-12-07 | — | — | CN | disclosed |
| CN-101587304-B | Pattern transferring method | SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION (CN) | 2011-11-30 | — | — | CN | disclosed |
| CN-101640170-A | Photoetching method capable of reducing width of exposure pattern | SEMICONDUCTOR MFG INT SHANGHAI | 2010-02-03 | — | — | CN | disclosed |
| CN-101587304-A | Pattern transferring method | SEMICONDUCTOR MFG INT BEIJING (CN) | 2009-11-25 | — | — | CN | disclosed |
| CN-101458460-A | Photoresist silicification method and method for forming photoresist mask pattern | SEMICONDUCTOR MFG INT SHANGHAI (CN) | 2009-06-17 | — | — | CN | disclosed |
| CN-101452225-A | Developing method for photoresist mask pattern | SEMICONDUCTOR MFG INT SHANGHAI (CN) | 2009-06-10 | — | — | CN | disclosed |
| US-7419763-B2 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2008-09-02 | — | — | US | disclosed |
| CN-101110348-A | Surface treatment, classification and assembly method of microelectronic element and storage structure thereof | UMC CORP (CN) | 2008-01-23 | — | — | CN | disclosed |
| US-20070141483-A1 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20060078818-A1 | Near-field exposure photoresist and fine pattern forming method using the same | CANON KABUSHIKI KAISHA (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1059314-B1 | A resist composition | WAKO PURE CHEM IND LTD (JP) | 2004-12-22 | — | — | EP | disclosed |
| US-6716573-B2 | Resist Composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20030039920-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-27 | — | — | US | disclosed |
| US-6432608-B1 | FINENESS PATTERN | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-08-13 | — | — | US | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |