SCHEMBL3551324

SCHEMBL3551324

[AsH2]Oc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL158272 0.71 LTA4H (0.53)
SCHEMBL3098534 0.71
SCHEMBL14905 0.69 LTA4H (0.60)
Diphenylether SCHEMBL4950525 0.69 LTA4H (1.00)
Diphenylether SCHEMBL12286 0.69 LTA4H (1.00)
Diphenylether SCHEMBL9061108 0.69 LTA4H (1.00)
Diphenylether SCHEMBL2461810 0.69 LTA4H (1.00)
SCHEMBL28481871 0.69
SCHEMBL13211615 0.69 LTA4H (0.50)
SCHEMBL29017381 0.69 LTA4H (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5629342-A PHENOXYARSINE, ALCOHOL AKZO NOBEL CHEMICALS INC. (US) 1997-05-13 US claimed
EP-0526646-B1 SEMICONDUCTOR DEVICE HAVING AN ISOLATION REGION ENRICHED IN OXYGEN AND A FABRICATION PROCESS THEREOF FUJITSU LTD (JP) 1997-04-23 EP claimed
EP-0144726-B2 Anti-microbial compositions AKZO NOBEL NV (NL) 1995-05-24 EP claimed
EP-0144726-B1 ANTI-MICROBIAL COMPOSITIONS Akzo Nobel N.V. (NL) 1989-05-31 EP claimed
EP-0144726-A2 Anti-microbial compositions Akzo Nobel N.V. (NL) 1985-06-19 EP claimed
EP-0049367-B1 BIOCIDAL COMBINATION AND ITS USE IN SHAPED ARTICLES OF PLASTICS HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) 1985-01-02 EP claimed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
CN-112526822-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2025-02-28 CN disclosed
CN-112286000-B Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-12-03 CN disclosed
CN-118620392-A Composition for forming silicon-containing resist underlayer film and pattern forming method 信越化学工业株式会社 2024-09-10 CN disclosed
EP-0144726-B2 Anti-microbial compositions AKZO NOBEL NV (NL) 1995-05-24 EP disclosed
US-4842932-A MIXTURE OF FILAMENTS, A PORTION OF WHICH CONTAINS ANTIMICROBIAL AGENT BASF CORPORATION (US) 1989-06-27 US disclosed
EP-0144726-B1 ANTI-MICROBIAL COMPOSITIONS Akzo Nobel N.V. (NL) 1989-05-31 EP disclosed
EP-0144726-B1 ANTI-MICROBIAL COMPOSITIONS Akzo Nobel N.V. (NL) 1989-05-31 EP disclosed
EP-0144726-A2 Anti-microbial compositions Akzo Nobel N.V. (NL) 1985-06-19 EP disclosed
EP-0144726-A2 Anti-microbial compositions Akzo Nobel N.V. (NL) 1985-06-19 EP disclosed
US-3939346-A Gain photo-current enhancement method XEROX CORPORATION (US) 1976-02-17 US disclosed