Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.94 |
| ▸ | PPARG | P37231 | 7/20 | 0.94 |
| ▸ | PPARD | Q03181 | 7/20 | 0.94 |
| ▸ | PPARA | Q07869 | 7/20 | 0.94 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.94 |
| ▸ | TSHR | P16473 | 4/20 | 0.94 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.94 |
| ▸ | FABP4 | P15090 | 3/20 | 0.94 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.94 |
| ▸ | TLR2 | O60603 | 2/20 | 0.94 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.94 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.94 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.94 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.94 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.94 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.94 |
| ▸ | MEN1 | O00255 | 1/20 | 0.94 |
| ▸ | ESR1 | P03372 | 1/20 | 0.94 |
| ▸ | PDE4A | P27815 | 1/20 | 0.94 |
| ▸ | PDE3A | Q14432 | 1/20 | 0.94 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Stearic Acid SCHEMBL7208276 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Undecanoate SCHEMBL358302 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Arachidic Acid SCHEMBL6138833 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Nonanoate SCHEMBL21391850 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Octanoic Acid SCHEMBL21391852 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Stearic Acid SCHEMBL7208286 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Stearic Acid SCHEMBL7208279 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Octanoic Acid SCHEMBL3964568 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Palmitic Acid SCHEMBL324624 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 | |
| Dodecanoate SCHEMBL324541 | 1.00 | GPR84 (0.94) | GPR84PPARGPPARDPPARAHDAC11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11649367-B2 | Aqueous pigment dispersions | LANDA LABS (2012) LTD. (IL) | 2023-05-16 | — | — | US | disclosed |
| US-20230049112-A1 | AQUEOUS PIGMENT DISPERSIONS | LANDA CORPORATION LTD. (IL) | 2023-02-16 | — | — | US | disclosed |
| US-11479687-B2 | Aqueous pigment dispersions | LANDA LABS (2012) LTD. | 2022-10-25 | — | — | US | disclosed |
| CN-109312176-B | Improved aqueous pigment dispersions | 兰达拉伯斯（2012）有限公司 | 2022-06-03 | — | — | CN | disclosed |
| EP-3464489-B1 | IMPROVED AQUEOUS PIGMENT DISPERSIONS | LANDA LABS 2012 LTD (IL) | 2021-07-21 | — | — | EP | disclosed |
| US-20200190351-A1 | IMPROVED AQUEOUS PIGMENT DISPERSIONS | LANDA CORPORATION LTD. (IL) | 2020-06-18 | — | — | US | disclosed |
| EP-3464489-A1 | IMPROVED AQUEOUS PIGMENT DISPERSIONS | Landa Labs (2012) Ltd. (IL) | 2019-04-10 | — | — | EP | disclosed |
| EP-1621927-B1 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| EP-1566693-B1 | Use of a Resist Composition for Immersion Exposure and Pattern Formation Method Using the Composition | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| WO-2017208139-A1 | IMPROVED AQUEOUS PIGMENT DISPERSIONS | LANDA LABS (2012) LTD. (IL) | 2017-12-07 | — | — | WO | disclosed |
| US-20060008736-A1 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJI PHOTO FILM CO., LTD. | 2006-01-12 | — | — | US | disclosed |
| EP-1612602-A2 | Photosensitive composition and method for forming pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-01-04 | — | — | EP | disclosed |
| US-20050287473-A1 | Photosensitive composition and method for forming pattern using the same | FUJI PHOTO FILM CO., LTD. | 2005-12-29 | — | — | US | disclosed |
| EP-1580598-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | Fuji Photo Film Co. Ltd. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-20050208419-A1 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| US-20050186505-A1 | Positive resist composition for immersion exposure and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| US-20050186503-A1 | Resist composition for immersion exposure and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-08-25 | — | — | US | disclosed |
| EP-1566693-A2 | Resist composition for immersion exposure and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-4253886-A | Corrosion resistant ferromagnetic metal powders and method of preparing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-03 | — | — | US | disclosed |
| US-4197347-A | High density magnetic recording media | FUJI PHOTO FILM CO., LTD. (JP) | 1980-04-08 | — | — | US | disclosed |