SCHEMBL35636

SCHEMBL35636

CN(C)[SiH](N(C)C)N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Peroxide SCHEMBL21406638 0.89
SCHEMBL1449702 0.82 CA1 (0.33)
SCHEMBL1449707 0.76 CA1 (0.43)
SCHEMBL258875 0.62
SCHEMBL234006 0.62
Trimethylammonium SCHEMBL2260638 0.58
SCHEMBL17691299 0.56
Trimethylammonium SCHEMBL5887466 0.54
Lithium Ion SCHEMBL31432545 0.54
Lithium Ion SCHEMBL30394287 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 6672 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4204219-B1 PARTIAL COATING OF INTRAOCULAR LENSES USING SPATIAL ALD AMO GRONINGEN BV (NL) 2026-05-06 EP claimed
EP-4735662-A1 IMPROVED DEPOSITION OF HIGH QUALITY METAL OXIDE AND METAL NITRIDE LAYERS Forge Nano Inc. (US) 2026-05-06 EP claimed
US-12618145-B2 Film-forming method and film-forming apparatus TOKYO ELECTRON LIMITED (JP) 2026-05-05 US claimed
US-20260123302-A1 METHOD AND APPARATUS FOR DEPOSITING A CARBON-CONTAINING MATERIAL ASM IP HOLDING BV (NL) 2026-04-30 US claimed
US-12604651-B2 Rapid fabrication of semiconductor thin films MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2026-04-14 US claimed
US-20260090068-A1 SEMICONDUCTOR DEVICE AND METHODS OF FORMATION TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2026-03-26 US claimed
US-20260052917-A1 METHOD FOR FORMING AN INSULATING LAYER PATTERN AND SEMICONDUCTOR DEVICE DONGJIN SEMICHEM CO LTD (KR) 2026-02-19 US claimed
US-12554191-B2 Pellicle membrane and method of forming the same TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-02-17 US claimed
US-12522920-B2 Partial coating of intraocular lenses using spatial atomic layer deposition AMO GRONINGEN B.V. (NL) 2026-01-13 US claimed
US-12525451-B2 Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures ASM IP HOLDING B.V. (NL) 2026-01-13 US claimed
US-4668812-A Process for the preparation of olefinic silanes and siloxanes UNION CARBIDE CORPORATION (US) 1987-05-26 US claimed
EP-0190671-A2 Process for preparing vinylaminosilanes UNION CARBIDE CORPORATION (US) 1986-08-13 EP claimed
EP-0189839-A1 Process for preparing triacetoxysilanes form tris(amino)silanes UNION CARBIDE CORPORATION (US) 1986-08-06 EP claimed
EP-0098911-B1 IMPROVED PROCESS FOR THE PREPARATION OF OXIMATOHYDRIDOSILANES AND AMINOXYHYDRIDOSILANES UNION CARBIDE CORPORATION (US) 1986-04-16 EP claimed
US-4558146-A Process for preparing vinylaminosilanes UNION CARBIDE CORPORATION (US) 1985-12-10 US claimed
US-4556725-A Process for preparing triacetoxysilanes from tris(amino)silanes UNION CARBIDE CORPORATION (US) 1985-12-03 US claimed
EP-0098911-A1 Improved process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes UNION CARBIDE CORPORATION (US) 1984-01-25 EP claimed
US-4384131-A Process for the preparation of oximatohydridosilanes and aminoxyhydridosilanes UNION CARBIDE CORPORATION (US) 1983-05-17 US claimed
EP-0061771-A1 Alkoxyaminohydridosilanes and process for producing them UNION CARBIDE CORPORATION (US) 1982-10-06 EP claimed
US-4345088-A Preparation of alkoxyaminohydridosilanes UNION CARBIDE CORPORATION (US) 1982-08-17 US claimed