SCHEMBL357103

SCHEMBL357103

CC(C)(c1cccc2sc3ccccc3c(=O)c12)C(N)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.43
ALDH1A1 P00352 5/20 0.43
POLB P06746 4/20 0.43
MEN1 O00255 4/20 0.43
KMT2A Q03164 4/20 0.43
NPC1 O15118 3/20 0.43
RAB9A P51151 3/20 0.43
GAA P10253 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
HPGD P15428 1/20 0.43
CYP2C19 P33261 1/20 0.43
MAOA P21397 3/20 0.43
MAOB P27338 3/20 0.43
KDM4E B2RXH2 3/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
LMNA P02545 2/20 0.36
NPSR1 Q6W5P4 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16243459 0.81 MAPT (0.50) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL5527348 0.75 MAPT (0.47) MAPTALDH1A1POLBMEN1KMT2A
Isopropyl Alcohol SCHEMBL4622858 0.74 MAPT (0.47) MAPTALDH1A1POLBMEN1KMT2A
Hydrochloric Acid SCHEMBL28289368 0.74 MAPT (0.46) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL2384194 0.73 GPR3 (0.43) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL27927423 0.73 MAPT (0.48) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL23057024 0.71 GPR3 (0.48) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL28096180 0.70 MAPT (0.49) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL9128466 0.70 MAPT (0.50) MAPTALDH1A1POLBMEN1KMT2A
SCHEMBL425780 0.70 MAPT (0.58) MAPTALDH1A1POLBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2418543-B1 PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING HAVING EXCELLENT SOLVENT RESISTANCE NIPPON SODA CO (JP) 2014-04-30 EP disclosed
US-8703382-B2 Photosensitive resin composition for flexographic printing having excellent solvent resistance NIPPON SODA CO., LTD. (JP) 2014-04-22 US disclosed
EP-2418543-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING HAVING EXCELLENT SOLVENT RESISTANCE Nippon Soda Co., Ltd. (JP) 2012-02-15 EP disclosed
US-20120015296-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING HAVING EXCELLENT SOLVENT RESISTANCE NIPPON SODA CO., LTD. (JP) 2012-01-19 US disclosed