⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13464406 | 0.82 | LMNA (0.33) | — | |
| SCHEMBL22259090 | 0.73 | LMNA (0.32) | — | |
| SCHEMBL12499532 | 0.73 | — | — | |
| SCHEMBL15778806 | 0.69 | LMNA (0.37) | — | |
| SCHEMBL12216087 | 0.66 | — | — | |
| SCHEMBL13464474 | 0.65 | — | — | |
| SCHEMBL12216097 | 0.64 | — | — | |
| SCHEMBL11312423 | 0.64 | LMNA (0.33) | — | |
| SCHEMBL18544646 | 0.63 | — | — | |
| SCHEMBL1442056 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090054465-A1 | N-HYDROXYACRYLAMIDE COMPOUNDS | ASTELLA PHARMA INC. (JP) | 2009-02-26 | — | — | US | claimed |
| US-20250092331-A1 | COMPOSITIONS COMPRISING 4-ISOPROPYL-1-METHYL-7-OXABICYCLO[2.2.1]HEPTAN-2-OL OR ESTERS OR ETHERS THEREOF AND THEIR USE AS AROMA CHEMICALS | BASF SE (DE) | 2025-03-20 | — | — | US | disclosed |
| US-11912708-B2 | Macrocyclic heterocycles and uses thereof | KUMQUAT BIOSCIENCES INC. (US) | 2024-02-27 | — | — | US | disclosed |
| US-20230339952-A1 | MACROCYCLIC HETEROCYCLES AND USES THEREOF | KUMQUAT BIOSCIENCES INC. | 2023-10-26 | — | — | US | disclosed |
| EP-3672977-B1 | BORONIC ACID DERIVATIVES | MERCK PATENT GMBH (DE) | 2022-06-22 | — | — | EP | disclosed |
| WO-2022081912-A2 | HETEROCYCLES AND USES THEREOF | KUMQUAT BIOSCIENCES INC. (US) | 2022-04-21 | — | — | WO | disclosed |
| US-11274109-B2 | Boronic acid derivatives | MERCK PATENT GMBH (DE) | 2022-03-15 | — | — | US | disclosed |
| WO-2021113492-A1 | CYCLIC COMPOUNDS AND METHODS OF USING SAME | SCHRÖDINGER, INC. (US) | 2021-06-10 | — | — | WO | disclosed |
| US-20200354382-A1 | Boronic Acid Derivatives | MERCK PATENT GMBH (DE) | 2020-11-12 | — | — | US | disclosed |
| WO-2019038250-A1 | BORONIC ACID DERIVATIVES | MERCK PATENT GMBH (DE) | 2019-02-28 | — | — | WO | disclosed |
| US-20150266824-A1 | Pyrazole Amide Derivative | TEIJIN LIMITED (JP) | 2015-09-24 | — | — | US | disclosed |
| WO-2015129926-A1 | PYRAZOLE AMIDE DERIVATIVE | TEIJIN PHARMA LIMITED (JP) | 2015-09-03 | — | — | WO | disclosed |
| US-20150185610-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8778593-B2 | Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8778593-B2 | Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition | FUJIFILM CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130029254-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-7750155-B2 | Pyrazinyl hydroxyacrylamide compounds having an inhibitory effect on the activity of histone deacetylase | ASTELLAS PHARMA INC. (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20090054465-A1 | N-HYDROXYACRYLAMIDE COMPOUNDS | ASTELLA PHARMA INC. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-7175976-B2 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-7175976-B2 | Silver halide photographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |